RU1772839C - Electron ray tube-polytron - Google Patents

Abstract

Usage: in the technique of converting electrical signals, in demodulation and signal recognition devices Summary of the invention: in the polytron, to increase the sensitivity to the microstructure of the signal, a selection electrode is additionally introduced — between the developing plates and the functional plates in the form of a frame having an independent output.

Description

The invention relates to techniques for converting electrical signals and can be used in signal demodulation and recognition devices.

Known electronic devices with variable transfer characteristic, implemented on semiconductor or electrovacuum devices 1, however, the characteristics of these devices do not provide sensitivity to the microstructure of electrical signals.

The sensitivity of the device to the microstructure of the signals can be ensured by measuring the parameters of the secondary electrons generated by the scattering of an electron beam on the surface of the electrode connected to the signal source (application Me 4403918/09 (051163) from 04/04/88, positive decision from 07/31/89) .

The closest in technical essence to the present invention is the device Polytron 2. In a polytron, an electron beam localized in a solid angle covering the base, the collector plates are deflected by the electric field of the openers

along the collector plates. The shape of the transfer characteristic is determined by the geometry of the collector plates and the potential relief created along the path of beam deflection by the functional plates. The sensitivity of the polytron to the signal microstructure arises at the moment of scattering of the electron beam on the surface of one of the scattering plates (application No. 4403918/09 (051163) of 04.04.88). To ensure sensitivity to the microstructure, it is necessary to set a negative potential on the polytron developing plates equal to 10% of the energy of the beam electrons in electron volts. You can additionally increase the sensitivity by 2-3% by applying a large (up to 200 ° C) positive potential to the extreme functional plates , which caused an additional outflow of electrons emitted by the scattering plate in the direction of the collectors. However, a significant part (40%) of the emitted electrons nevertheless falls on the part of the second anode located between the electron

s / s

cannon and developing plates, which has a positive potential for an unwanted expanding plate, which does not significantly increase the sensitivity of the polytron to the signal microstructure. In addition, it is undesirable to apply such a high potential to the extreme functional plates, since the sensitivity of the polytron with respect to the potentials of the central functional plates significantly decreases.

The purpose of the device is to increase the sensitivity of the device to the signal microstructure.

The goal is achieved in that the device is an electron beam lamp containing an indirect cathode, a modulator, an accelerating electrode, a first anode and a second anode forming an electron beam, correction plates, deployment plates, functional plates, collector plates placed inside a vacuum a cylinder whose surface is internally coated with an aquadag connected to the second anode, a selection electrode is additionally introduced in the space between the developing plates and the functional plates astinami, made in the form of a frame, a terminal that is embedded on the surface of the cylinder

The introduction of a selection electrode makes it possible to preserve the sensitivity of the polytropus r, with respect to the potentials of all functional plates, and to provide twice as high sensitivity with respect to the signal microstructure due to the outflow of all secondary electrons from the developing plates in the direction of the functional plates. The outflow of secondary electrons is ensured when a positive potential is applied to the selective spectrode relative to the second anode and the development plates.

The drawing schematically shows an electron beam lamp - polytron.

The polytron contains an indirect glow cathode 1, an accelerating electrode 2. a modulator 3, a first anode 4, a second anode 5, correction plates 6, deployment plates 7, collector plates 8 and 9, ten pairs of functional plates 10 and 11- (in FIG. .1, in order to simplify the circuit, only five pairs of functional plates are indicated), selection electrode 12., balloon 13.

Polytron works as follows. The cathode 1 (indirect glow) emits electrons accelerated by the-electrostatic field of the accelerating electrode 2. The number of accelerated electrons is limited by the field of modulator 3. In the field of the first anode 4, accelerated electrons are formed into a beam with a normal distribution

electrons in cross section. The electrodes of the second anode 5 limit the interaction of the fields of the first anode 4, the correction plates 6, the deployment plates 7, the electrostatic field

0 plates 6 provides the deflection of the electron beam in the direction of the Y axis, the field of the developing plates 7 - in the direction of the X axis. The electron beam hits the first 8 and second 9 collector plates5, the injection of electrons into which determines (forms) the current in the external circuits of the plates. The number of beam electrons incident on the collector plates 8 and 9 is determined by the shape of the beam and its deviation along the axis

0 Y. Deviation along the Y axis is also determined by the potentials of a pair of functional plates 10 and 11, between which there is a beam. Beam deflection in the field of action of any pair of functional plates

5 is defined by the potential difference of the deployment plates 7-. Electrons scattered outside the collector plates 8 and 9 and the functional plates 10 and 11 are injected into the aquadag. With increasing difference

0 potentials of the development plates 7, a mode of sliding scattering of the electron beam occurs on the surface of one of the development plates 7. As a result of scattering in the space between the development plates 7, secondary electrons are knocked out, which are directed by the field of the selection electrode 12 towards the functional plates 10 and 11 and collector plates 8 and 9. Having set the positive potential of the selecting electrode 12, all secondary electrodes can be directed or some of them can be directed to the collector plates 8 and 9. functional plates astins 10 and 11. As a result of selection

With 5 potentials on the selection electrode 12 and functional plates 10 and 11, it is possible to select electrons with a certain energy spectrum from the electron flow.

0 Compared with the prototype of the proposed electron-beam lamp, the polytron provides more than twice the sensitivity to the microstructure of the signal, due to the selection of secondary electrons

5 in energy in a vacuum space, which entails an improvement in the selectivity of signal recognition devices made on the basis of a polytron, and also reduces the probability of errors in signal recognition due to the simultaneous demodulation of the spectral and microstructural characteristics of the signal.

Claims (1)

SUMMARY OF THE INVENTION An electron beam pump is a polytron, comprising a cathode, a modulator, an accelerating electrode, a first anode and a second anode, sequentially arranged along the electron beam, forming an electron beam, correction plates, deployment plates, function plates, collector plates, times placed inside a vacuum cylinder, the surface of which inside is coated with a coupler connected to the second anode, characterized in that. what. in order to increase the sensitivity of the device to the signal microstructure, a selection electrode was additionally introduced in the space between the developing plates and the functional plates, made in the form of a frame, the terminal of which is brought to the surface of the cylinder.