PL418622A1 - Reactor for conducting chemical processes in the gliding discharge plasma - Google Patents

Reactor for conducting chemical processes in the gliding discharge plasma

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Publication number
PL418622A1
PL418622A1 PL418622A PL41862216A PL418622A1 PL 418622 A1 PL418622 A1 PL 418622A1 PL 418622 A PL418622 A PL 418622A PL 41862216 A PL41862216 A PL 41862216A PL 418622 A1 PL418622 A1 PL 418622A1
Authority
PL
Poland
Prior art keywords
reactor
chemical processes
conducting chemical
discharge plasma
ceramic
Prior art date
Application number
PL418622A
Other languages
Polish (pl)
Other versions
PL238468B1 (en
Inventor
Michał Bogusław Młotek
Krzysztof Jan Krawczyk
Bogdan Ulejczyk
Original Assignee
Politechnika Warszawska
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Politechnika Warszawska filed Critical Politechnika Warszawska
Priority to PL418622A priority Critical patent/PL238468B1/en
Publication of PL418622A1 publication Critical patent/PL418622A1/en
Publication of PL238468B1 publication Critical patent/PL238468B1/en

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Abstract

Reaktor do prowadzenia procesów chemicznych w plazmie wyładowania ślizgowego, w którym centralna, pionowa elektroda stożkowa (2) jest umieszczona wewnątrz rury ceramicznej (4) i jest połączona od dołu z ceramiczną podstawą (1), przy czym otwór wlotowy (3) gazu znajduje się w dolnej części ceramicznej rury (4) i jest usytuowany tak, aby gaz był podawany stycznie do ściany zewnętrznej reaktora, zaś elektrody wysokonapięciowe (5), w liczbie od 2 do 24, są umieszczone w szczelinach wewnętrznej ściany rury ceramicznej (4), przy czym tworząca centralnej elektrody stożkowej (2) i tworząca rury ceramicznej (4) tworzą kąt od 2,5 do 5°.The reactor for conducting chemical processes in the plasma of a sliding discharge, in which the central, vertical cone electrode (2) is placed inside the ceramic pipe (4) and is connected from below with the ceramic base (1), the gas inlet (3) being located in the bottom of the ceramic pipe (4) and is positioned so that gas is fed tangentially to the outer wall of the reactor, while high-voltage electrodes (5), from 2 to 24, are placed in the slots of the inner wall of the ceramic pipe (4), with thereby forming a central conical electrode (2) and forming a ceramic tube (4) form an angle of 2.5 to 5 °.

PL418622A 2016-09-08 2016-09-08 Reactor for conducting chemical processes in the gliding discharge plasma PL238468B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL418622A PL238468B1 (en) 2016-09-08 2016-09-08 Reactor for conducting chemical processes in the gliding discharge plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL418622A PL238468B1 (en) 2016-09-08 2016-09-08 Reactor for conducting chemical processes in the gliding discharge plasma

Publications (2)

Publication Number Publication Date
PL418622A1 true PL418622A1 (en) 2018-03-12
PL238468B1 PL238468B1 (en) 2021-08-23

Family

ID=61534570

Family Applications (1)

Application Number Title Priority Date Filing Date
PL418622A PL238468B1 (en) 2016-09-08 2016-09-08 Reactor for conducting chemical processes in the gliding discharge plasma

Country Status (1)

Country Link
PL (1) PL238468B1 (en)

Also Published As

Publication number Publication date
PL238468B1 (en) 2021-08-23

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