PL3924793T3 - System sterowania, system optyczny i sposób - Google Patents

System sterowania, system optyczny i sposób

Info

Publication number
PL3924793T3
PL3924793T3 PL20705024.6T PL20705024T PL3924793T3 PL 3924793 T3 PL3924793 T3 PL 3924793T3 PL 20705024 T PL20705024 T PL 20705024T PL 3924793 T3 PL3924793 T3 PL 3924793T3
Authority
PL
Poland
Prior art keywords
open
loop control
control system
optical system
optical
Prior art date
Application number
PL20705024.6T
Other languages
English (en)
Inventor
Malte Hoffmann
Gunther Schulz
Original Assignee
Carl Zeiss Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Smt Gmbh filed Critical Carl Zeiss Smt Gmbh
Publication of PL3924793T3 publication Critical patent/PL3924793T3/pl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0208—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterized by the configuration of the monitoring system
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2223/00—Indexing scheme associated with group G05B23/00
    • G05B2223/06—Remote monitoring

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing And Monitoring For Control Systems (AREA)
  • Optical Communication System (AREA)
  • Selective Calling Equipment (AREA)
  • Steering Control In Accordance With Driving Conditions (AREA)
PL20705024.6T 2019-02-12 2020-02-10 System sterowania, system optyczny i sposób PL3924793T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102019201810.6A DE102019201810A1 (de) 2019-02-12 2019-02-12 Steuerungssystem, optisches system und verfahren
PCT/EP2020/053324 WO2020165091A1 (de) 2019-02-12 2020-02-10 Steuerungssystem, optisches system und verfahren

Publications (1)

Publication Number Publication Date
PL3924793T3 true PL3924793T3 (pl) 2023-05-22

Family

ID=69571977

Family Applications (1)

Application Number Title Priority Date Filing Date
PL20705024.6T PL3924793T3 (pl) 2019-02-12 2020-02-10 System sterowania, system optyczny i sposób

Country Status (8)

Country Link
US (1) US11630395B2 (pl)
EP (1) EP3924793B1 (pl)
KR (1) KR20210125518A (pl)
CN (1) CN113474738A (pl)
DE (1) DE102019201810A1 (pl)
ES (1) ES2940510T3 (pl)
PL (1) PL3924793T3 (pl)
WO (1) WO2020165091A1 (pl)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021213610A1 (de) * 2021-12-01 2023-06-01 Carl Zeiss Smt Gmbh Verfahren, optisches system, testgerät und anordnung
DE102021213612A1 (de) * 2021-12-01 2023-06-01 Carl Zeiss Smt Gmbh Optisches system, testgerät, lithographieanlage, anordnung und verfahren

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4006251B2 (ja) * 2002-03-20 2007-11-14 キヤノン株式会社 ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法
EP2115535B9 (de) * 2007-02-06 2013-01-09 Carl Zeiss SMT GmbH Verfahren und vorrichtung zur überwachung von mehrfachspiegelanordnungen in einem beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage
US8332071B2 (en) * 2007-08-20 2012-12-11 David Zeltzer System and method enabling sensorless actuator
DE102008049616B4 (de) * 2008-09-30 2012-03-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie zur Herstellung von Halbleiterbauelementen
DE102013018923B4 (de) * 2013-11-13 2017-05-11 Audi Ag Verfahren zum Kontrollieren eines Aktors
DE102015205370A1 (de) * 2015-03-25 2016-09-29 Robert Bosch Gmbh Verfahren und Vorrichtung zur Bereitstellung von Daten für eine Zustandsüberwachung einer Maschine
DE102015008754B4 (de) * 2015-07-06 2018-07-05 Liebherr-Aerospace Lindenberg Gmbh Zustandsüberwachung eines Stellantriebs in einem Fluggerät
FR3051263B1 (fr) * 2016-05-10 2018-04-20 Safran Aircraft Engines Procede de commande d'un actionneur et dispositif de commande associe
DE102016213025A1 (de) * 2016-07-18 2016-09-08 Carl Zeiss Smt Gmbh Steuerung für Mikrospiegelanordnungen in Lithographiesystemen
JP7222344B2 (ja) * 2019-12-06 2023-02-15 横河電機株式会社 判定装置、判定方法、判定プログラム、学習装置、学習方法、および、学習プログラム
JP7367622B2 (ja) * 2020-06-17 2023-10-24 横河電機株式会社 データ管理システム、データ管理方法、および、データ管理プログラム

Also Published As

Publication number Publication date
EP3924793A1 (de) 2021-12-22
EP3924793B1 (de) 2023-01-25
US11630395B2 (en) 2023-04-18
WO2020165091A1 (de) 2020-08-20
ES2940510T3 (es) 2023-05-08
DE102019201810A1 (de) 2020-08-13
CN113474738A (zh) 2021-10-01
KR20210125518A (ko) 2021-10-18
US20210364926A1 (en) 2021-11-25

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