PL3861401T3 - System i sposób pomiaru kąta wiązki światła kierowanej przez układ optyczny kierujący wiązką - Google Patents
System i sposób pomiaru kąta wiązki światła kierowanej przez układ optyczny kierujący wiązkąInfo
- Publication number
- PL3861401T3 PL3861401T3 PL19759516.8T PL19759516T PL3861401T3 PL 3861401 T3 PL3861401 T3 PL 3861401T3 PL 19759516 T PL19759516 T PL 19759516T PL 3861401 T3 PL3861401 T3 PL 3861401T3
- Authority
- PL
- Poland
- Prior art keywords
- measuring
- optical unit
- guiding optical
- guided
- angle
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
- H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S3/00—Direction-finders for determining the direction from which infrasonic, sonic, ultrasonic or electromagnetic waves, or particle emission, not having a directional significance, are being received
- G01S3/78—Direction-finders for determining the direction from which infrasonic, sonic, ultrasonic or electromagnetic waves, or particle emission, not having a directional significance, are being received using electromagnetic waves other than radio waves
- G01S3/782—Systems for determining direction or deviation from predetermined direction
- G01S3/783—Systems for determining direction or deviation from predetermined direction using amplitude comparison of signals derived from static detectors or detector systems
- G01S3/784—Systems for determining direction or deviation from predetermined direction using amplitude comparison of signals derived from static detectors or detector systems using a mosaic of detectors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/12—Beam splitting or combining systems operating by refraction only
- G02B27/126—The splitting element being a prism or prismatic array, including systems based on total internal reflection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/64—Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/28—Systems for automatic generation of focusing signals
- G02B7/287—Systems for automatic generation of focusing signals including a sight line detecting device
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Radar, Positioning & Navigation (AREA)
- Remote Sensing (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102018124342.1A DE102018124342A1 (de) | 2018-10-02 | 2018-10-02 | Vorrichtung und Verfahren zur Strahlwinkelmessung eines von einer Strahlführungsoptik geführten Lichtstrahls |
| PCT/EP2019/071811 WO2020069793A1 (de) | 2018-10-02 | 2019-08-14 | Vorrichtung und verfahren zur strahlwinkelmessung eines von einer strahlführungsoptik geführten lichtstrahls |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL3861401T3 true PL3861401T3 (pl) | 2026-03-09 |
Family
ID=67777283
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL19759516.8T PL3861401T3 (pl) | 2018-10-02 | 2019-08-14 | System i sposób pomiaru kąta wiązki światła kierowanej przez układ optyczny kierujący wiązką |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11737199B2 (pl) |
| EP (1) | EP3861401B9 (pl) |
| JP (1) | JP7765967B2 (pl) |
| DE (1) | DE102018124342A1 (pl) |
| PL (1) | PL3861401T3 (pl) |
| WO (1) | WO2020069793A1 (pl) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6421311A (en) * | 1987-07-16 | 1989-01-24 | Fujitsu Ltd | Fine angle displacement measuring apparatus |
| JPH01189504A (ja) * | 1988-01-25 | 1989-07-28 | Hitachi Zosen Corp | 2次元変位計測方法 |
| JP2007006118A (ja) | 2005-06-23 | 2007-01-11 | Victor Co Of Japan Ltd | 光信号伝送装置 |
| DE102010050947B4 (de) | 2010-11-10 | 2017-07-13 | Ushio Denki Kabushiki Kaisha | Verfahren und Anordnung zur Stabilisierung des Quellortes der Erzeugung extrem ultravioletter (EUV-)Strahlung auf Basis eines Entladungsplasmas |
| JP2012178534A (ja) | 2011-02-02 | 2012-09-13 | Gigaphoton Inc | 光学システムおよびそれを用いた極端紫外光生成システム |
| DE102012212354B4 (de) * | 2012-07-13 | 2024-05-16 | Asml Netherlands B.V. | Messvorrichtung zur Vermessung und Überwachung mindestens eines Laserstrahls, Strahlführungssystem zur Führung mindestens eines Laserstrahls mit einer derartigen Messvorrichtung sowie Verwendung einer derartigen Messvorrichtung |
| DE102014203141A1 (de) * | 2014-02-21 | 2015-08-27 | Carl Zeiss Smt Gmbh | Erfassung einer Ausbreitungsrichtung eines optischen Strahls |
| DE102014208792A1 (de) | 2014-05-09 | 2015-11-12 | Carl Zeiss Smt Gmbh | System und Verfahren zur Analyse eines von einer Strahlführungsoptik geführten Lichtstrahls |
-
2018
- 2018-10-02 DE DE102018124342.1A patent/DE102018124342A1/de not_active Ceased
-
2019
- 2019-08-14 EP EP19759516.8A patent/EP3861401B9/de active Active
- 2019-08-14 WO PCT/EP2019/071811 patent/WO2020069793A1/de not_active Ceased
- 2019-08-14 JP JP2021518660A patent/JP7765967B2/ja active Active
- 2019-08-14 PL PL19759516.8T patent/PL3861401T3/pl unknown
-
2021
- 2021-03-30 US US17/217,295 patent/US11737199B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| EP3861401C0 (de) | 2025-10-01 |
| WO2020069793A1 (de) | 2020-04-09 |
| EP3861401B1 (de) | 2025-10-01 |
| US20210219409A1 (en) | 2021-07-15 |
| JP2022504295A (ja) | 2022-01-13 |
| EP3861401A1 (de) | 2021-08-11 |
| US11737199B2 (en) | 2023-08-22 |
| DE102018124342A1 (de) | 2020-04-02 |
| JP7765967B2 (ja) | 2025-11-07 |
| EP3861401B9 (de) | 2025-12-17 |
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