PL2956743T3 - Sposób i urządzenie do ilościowego pomiaru dokładności powierzchni obszaru - Google Patents

Sposób i urządzenie do ilościowego pomiaru dokładności powierzchni obszaru

Info

Publication number
PL2956743T3
PL2956743T3 PL14751291T PL14751291T PL2956743T3 PL 2956743 T3 PL2956743 T3 PL 2956743T3 PL 14751291 T PL14751291 T PL 14751291T PL 14751291 T PL14751291 T PL 14751291T PL 2956743 T3 PL2956743 T3 PL 2956743T3
Authority
PL
Poland
Prior art keywords
area
quantitative measurement
surface accuracy
accuracy
quantitative
Prior art date
Application number
PL14751291T
Other languages
English (en)
Inventor
Lars Bååth
Original Assignee
Qso Interferometer Systems Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qso Interferometer Systems Ab filed Critical Qso Interferometer Systems Ab
Publication of PL2956743T3 publication Critical patent/PL2956743T3/pl

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/30Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/30Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/30Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
PL14751291T 2013-02-14 2014-02-10 Sposób i urządzenie do ilościowego pomiaru dokładności powierzchni obszaru PL2956743T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SE1330009 2013-02-14
PCT/SE2014/050159 WO2014126526A1 (en) 2013-02-14 2014-02-10 A method and apparatus for quantitative measurement of surface accuracy of an area
EP14751291.7A EP2956743B1 (en) 2013-02-14 2014-02-10 A method and apparatus for quantitative measurement of surface accuracy of an area

Publications (1)

Publication Number Publication Date
PL2956743T3 true PL2956743T3 (pl) 2018-07-31

Family

ID=51354417

Family Applications (1)

Application Number Title Priority Date Filing Date
PL14751291T PL2956743T3 (pl) 2013-02-14 2014-02-10 Sposób i urządzenie do ilościowego pomiaru dokładności powierzchni obszaru

Country Status (11)

Country Link
US (1) US9453725B2 (pl)
EP (1) EP2956743B1 (pl)
JP (1) JP2016511829A (pl)
KR (1) KR101883748B1 (pl)
CN (1) CN105008853B (pl)
AU (1) AU2014216740B2 (pl)
BR (1) BR112015019480A2 (pl)
CA (1) CA2897751C (pl)
ES (1) ES2664738T3 (pl)
PL (1) PL2956743T3 (pl)
WO (1) WO2014126526A1 (pl)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6842061B2 (ja) * 2017-02-10 2021-03-17 国立大学法人神戸大学 物体表面の評価方法、評価装置および該評価方法を用いたワークの加工方法および工作機械
US10852125B2 (en) 2017-11-28 2020-12-01 Koh Young Technology Inc. Apparatus for inspecting film on substrate by using optical interference and method thereof
US10859371B2 (en) * 2017-11-28 2020-12-08 Koh Young Technology Inc. Apparatus for inspecting substrate and method thereof

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4754282A (en) * 1970-03-25 1988-06-28 The United States Of America As Represented By The Secretary Of The Navy Improved data analysis system
US4334780A (en) * 1979-06-29 1982-06-15 Grumman Aerospace Corporation Optical surface roughness detection method and apparatus
JPS5897608A (ja) 1981-12-05 1983-06-10 Nippon Paint Co Ltd 表面性状測定方法および装置
GB8617570D0 (en) 1986-07-18 1986-08-28 See C W Microscopes
US5369286A (en) 1989-05-26 1994-11-29 Ann F. Koo Method and apparatus for measuring stress in a film applied to surface of a workpiece
GB2242976A (en) 1990-04-12 1991-10-16 Rank Taylor Hobson Ltd Measuring surface characteristics
DE69635816T2 (de) 1995-03-28 2006-10-12 Applied Materials, Inc., Santa Clara Verfahren zum Herstellen einer Vorrichtung zur In-Situ-Kontrolle und Bestimmung des Endes von chemisch-mechanischen Planiervorgängen
US5781436A (en) * 1996-07-26 1998-07-14 Western Atlas International, Inc. Method and apparatus for transverse electromagnetic induction well logging
WO1998050779A1 (en) * 1997-05-06 1998-11-12 Holcomb Matthew J Surface analysis using gaussian beam profiles
JP4518789B2 (ja) * 2001-06-08 2010-08-04 ユニバーシティ・オブ・メイン 広帯域変調および統計的推定手法を用いる分光計
DE10339227B4 (de) * 2003-08-26 2014-05-28 Byk Gardner Gmbh Verfahren und Vorrichtung zur Charakterisierung von Oberflächen
JP4520794B2 (ja) * 2004-08-20 2010-08-11 セーレン株式会社 線条検査方法および装置
US7417722B2 (en) * 2004-12-19 2008-08-26 Kla-Tencor Technologies Corporation System and method for controlling light scattered from a workpiece surface in a surface inspection system
JP4646035B2 (ja) 2006-04-07 2011-03-09 株式会社 日立ディスプレイズ ラビング角度測定装置、及び液晶表示装置並びに光学フィルムの製造方法
US8446640B2 (en) * 2009-07-15 2013-05-21 Eastman Kodak Company Setting of imaging parameters using a scanner
US20120269958A1 (en) * 2009-10-27 2012-10-25 Ramesh Subramanian Material buildup simulations by application of powder jet mass conservation priciples
JP2012093200A (ja) 2010-10-26 2012-05-17 Toyota Motor Corp 表面評価装置
JP2012093316A (ja) 2010-10-28 2012-05-17 Toyota Motor Corp 表面評価装置
JP5892591B2 (ja) 2010-12-09 2016-03-23 国立大学法人九州工業大学 三次元表面の計測装置及び方法

Also Published As

Publication number Publication date
WO2014126526A1 (en) 2014-08-21
BR112015019480A2 (pt) 2017-07-18
KR101883748B1 (ko) 2018-07-31
CA2897751C (en) 2017-09-26
CN105008853A (zh) 2015-10-28
KR20150117669A (ko) 2015-10-20
EP2956743B1 (en) 2018-01-10
US9453725B2 (en) 2016-09-27
CN105008853B (zh) 2017-12-01
CA2897751A1 (en) 2014-08-21
US20160003614A1 (en) 2016-01-07
AU2014216740A1 (en) 2015-07-23
EP2956743A4 (en) 2016-10-26
JP2016511829A (ja) 2016-04-21
AU2014216740B2 (en) 2017-07-06
ES2664738T3 (es) 2018-04-23
EP2956743A1 (en) 2015-12-23

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