PL2044816T3 - Urządzenie i sposób do wytwarzania i/lub do utrzymywania plazmy - Google Patents

Urządzenie i sposób do wytwarzania i/lub do utrzymywania plazmy

Info

Publication number
PL2044816T3
PL2044816T3 PL07765802T PL07765802T PL2044816T3 PL 2044816 T3 PL2044816 T3 PL 2044816T3 PL 07765802 T PL07765802 T PL 07765802T PL 07765802 T PL07765802 T PL 07765802T PL 2044816 T3 PL2044816 T3 PL 2044816T3
Authority
PL
Poland
Prior art keywords
confining
plasma
producing
Prior art date
Application number
PL07765802T
Other languages
English (en)
Inventor
Jacques Pelletier
Ana Lacoste
Stéphane Bechu
Original Assignee
Centre National De La Recherche Scientifique (Cnrs)
Université Grenoble Alpes
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National De La Recherche Scientifique (Cnrs), Université Grenoble Alpes filed Critical Centre National De La Recherche Scientifique (Cnrs)
Publication of PL2044816T3 publication Critical patent/PL2044816T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
PL07765802T 2006-07-21 2007-07-04 Urządzenie i sposób do wytwarzania i/lub do utrzymywania plazmy PL2044816T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0606680A FR2904178B1 (fr) 2006-07-21 2006-07-21 Dispositif et procede de production et/ou de confinement d'un plasma

Publications (1)

Publication Number Publication Date
PL2044816T3 true PL2044816T3 (pl) 2017-01-31

Family

ID=37709764

Family Applications (1)

Application Number Title Priority Date Filing Date
PL07765802T PL2044816T3 (pl) 2006-07-21 2007-07-04 Urządzenie i sposób do wytwarzania i/lub do utrzymywania plazmy

Country Status (7)

Country Link
US (1) US8324814B2 (pl)
EP (1) EP2044816B1 (pl)
ES (1) ES2589109T3 (pl)
FR (1) FR2904178B1 (pl)
HU (1) HUE032512T2 (pl)
PL (1) PL2044816T3 (pl)
WO (1) WO2008009559A2 (pl)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2938150B1 (fr) * 2008-10-30 2010-12-17 Centre Nat Rech Scient Dispositif et procede de production et/ou de confinement d'un plasma
FR2993429B1 (fr) * 2012-07-11 2016-08-05 Centre Nat De La Rech Scient (Cnrs) Applicateur micro-onde coaxial pour la production de plasma
EP2784175A1 (fr) * 2013-03-28 2014-10-01 NeoCoat SA Equipement de dépôt de diamant en phase vapeur
FR3019708B1 (fr) * 2014-04-04 2016-05-06 Hydromecanique & Frottement Procede et dispositif pour generer un plasma excite par une energie micro-onde dans le domaine de la resonnance cyclonique electronique (rce), pour realiser un traitement de surface ou revetement autour d'un element filiforme.
CN105590824B (zh) * 2014-10-20 2017-11-03 中微半导体设备(上海)有限公司 一种等离子体加工设备
US10748745B2 (en) * 2016-08-16 2020-08-18 Applied Materials, Inc. Modular microwave plasma source
CN107316729B (zh) * 2017-06-15 2019-08-30 中国科学院近代物理研究所 磁环组件和制造磁环组件的方法
CN108776129B (zh) * 2018-07-06 2023-12-08 中国科学院西安光学精密机械研究所 多功能环形磁铁阵列激光等离子体约束装置及其应用系统
ES3048282T3 (en) * 2022-03-14 2025-12-09 Univ Princeton Stellarator with planar shaping coils
WO2024226565A2 (en) * 2023-04-26 2024-10-31 Thea Energy, Inc. Planar coil stellarator including removable field shaping units

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53147217A (en) * 1977-05-26 1978-12-21 Matsushita Electric Ind Co Ltd Cylindrical shape field magnet for small direct current motor
US5133826A (en) * 1989-03-09 1992-07-28 Applied Microwave Plasma Concepts, Inc. Electron cyclotron resonance plasma source
US5370765A (en) * 1989-03-09 1994-12-06 Applied Microwave Plasma Concepts, Inc. Electron cyclotron resonance plasma source and method of operation
US6022446A (en) * 1995-08-21 2000-02-08 Shan; Hongching Shallow magnetic fields for generating circulating electrons to enhance plasma processing
US5767628A (en) * 1995-12-20 1998-06-16 International Business Machines Corporation Helicon plasma processing tool utilizing a ferromagnetic induction coil with an internal cooling channel
US5975014A (en) * 1996-07-08 1999-11-02 Asm Japan K.K. Coaxial resonant multi-port microwave applicator for an ECR plasma source
FR2797372B1 (fr) 1999-08-04 2002-10-25 Metal Process Procede de production de plasmas elementaires en vue de creer un plasma uniforme pour une surface d'utilisation et dispositif de production d'un tel plasma
FR2838020B1 (fr) 2002-03-28 2004-07-02 Centre Nat Rech Scient Dispositif de confinement de plasma
FR2840451B1 (fr) * 2002-06-04 2004-08-13 Centre Nat Rech Scient Dispositif de production d'une nappe de plasma
US7084573B2 (en) * 2004-03-05 2006-08-01 Tokyo Electron Limited Magnetically enhanced capacitive plasma source for ionized physical vapor deposition
US7551265B2 (en) * 2004-10-01 2009-06-23 Nikon Corporation Contact material and system for ultra-clean applications

Also Published As

Publication number Publication date
EP2044816A2 (fr) 2009-04-08
FR2904178B1 (fr) 2008-11-07
ES2589109T3 (es) 2016-11-10
US8324814B2 (en) 2012-12-04
US20100109532A1 (en) 2010-05-06
WO2008009559A2 (fr) 2008-01-24
WO2008009559A9 (fr) 2008-05-08
HUE032512T2 (en) 2017-09-28
EP2044816B1 (fr) 2016-06-01
FR2904178A1 (fr) 2008-01-25
WO2008009559A3 (fr) 2009-03-05

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