NO854552L - Integrert laser-hode og lavinduktans pulsdannende krets for pulsede glasslasere. - Google Patents
Integrert laser-hode og lavinduktans pulsdannende krets for pulsede glasslasere.Info
- Publication number
- NO854552L NO854552L NO85854552A NO854552A NO854552L NO 854552 L NO854552 L NO 854552L NO 85854552 A NO85854552 A NO 85854552A NO 854552 A NO854552 A NO 854552A NO 854552 L NO854552 L NO 854552L
- Authority
- NO
- Norway
- Prior art keywords
- energy storage
- stated
- storage device
- capacitors
- discharge electrode
- Prior art date
Links
- 239000011521 glass Substances 0.000 title 1
- 238000010438 heat treatment Methods 0.000 title 1
- 239000003990 capacitor Substances 0.000 claims description 39
- 238000004146 energy storage Methods 0.000 claims description 24
- 239000007789 gas Substances 0.000 claims description 19
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 8
- 238000010276 construction Methods 0.000 claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 4
- 239000003985 ceramic capacitor Substances 0.000 claims description 4
- 239000001569 carbon dioxide Substances 0.000 claims description 3
- 229910010293 ceramic material Inorganic materials 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 230000008878 coupling Effects 0.000 claims description 3
- 238000010168 coupling process Methods 0.000 claims description 3
- 238000005859 coupling reaction Methods 0.000 claims description 3
- 229910052734 helium Inorganic materials 0.000 claims description 3
- 239000001307 helium Substances 0.000 claims description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 239000003989 dielectric material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 6
- 238000013461 design Methods 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000012671 ceramic insulating material Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- -1 nitro- Chemical class 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/686,339 US4876693A (en) | 1984-12-26 | 1984-12-26 | Integrated laser head and low inductance pulse forming circuit for pulsed gas lasers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NO854552L true NO854552L (no) | 1990-07-30 |
Family
ID=24755908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO85854552A NO854552L (no) | 1984-12-26 | 1985-11-14 | Integrert laser-hode og lavinduktans pulsdannende krets for pulsede glasslasere. |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4876693A (de) |
| DE (1) | DE3544862A1 (de) |
| FR (1) | FR2637742A1 (de) |
| GB (1) | GB2227877B (de) |
| IT (1) | IT8548903A0 (de) |
| NO (1) | NO854552L (de) |
| SE (1) | SE8600078D0 (de) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5305338A (en) * | 1990-09-25 | 1994-04-19 | Mitsubishi Denki Kabushiki Kaisha | Switch device for laser |
| US5197079A (en) * | 1990-09-26 | 1993-03-23 | Siemens Aktiengesellschaft | High-power stripline laser |
| DE4033166A1 (de) * | 1990-10-19 | 1992-04-23 | Bergmann Hans Wilhelm | Verfahren zur einkopplung von cw-co(pfeil abwaerts)2(pfeil abwaerts)-laserstrahlen |
| US5557629A (en) * | 1992-08-28 | 1996-09-17 | Kabushiki Kaisha Komatsu Seisakusho | Laser device having an electrode with auxiliary conductor members |
| US5369660A (en) * | 1992-09-23 | 1994-11-29 | The United States Of America As Represented By The Secretary Of The Air Force | Repetitively pulsed, closed cycle, photolytic atomic iodine laser |
| DE19513823A1 (de) * | 1995-04-12 | 1996-10-17 | Kompa Guenter Prof Dr Ing | Optisches Impulsradar |
| CN1272232A (zh) * | 1998-05-20 | 2000-11-01 | 东芝株式会社 | 脉冲气体激光发生装置 |
| US7856044B2 (en) | 1999-05-10 | 2010-12-21 | Cymer, Inc. | Extendable electrode for gas discharge laser |
| US6414979B2 (en) | 2000-06-09 | 2002-07-02 | Cymer, Inc. | Gas discharge laser with blade-dielectric electrode |
| JP3775469B2 (ja) * | 2000-03-15 | 2006-05-17 | ウシオ電機株式会社 | ＡｒＦエキシマレーザ装置、ＫｒＦエキシマレーザ装置及びフッ素レーザ装置 |
| US7132123B2 (en) * | 2000-06-09 | 2006-11-07 | Cymer, Inc. | High rep-rate laser with improved electrodes |
| US6466602B1 (en) | 2000-06-09 | 2002-10-15 | Cymer, Inc. | Gas discharge laser long life electrodes |
| US7190708B2 (en) | 2000-11-01 | 2007-03-13 | Cymer, Inc. | Annealed copper alloy electrodes for fluorine containing gas discharge lasers |
| US6690706B2 (en) | 2000-06-09 | 2004-02-10 | Cymer, Inc. | High rep-rate laser with improved electrodes |
| US6711202B2 (en) | 2000-06-09 | 2004-03-23 | Cymer, Inc. | Discharge laser with porous insulating layer covering anode discharge surface |
| US6363094B1 (en) | 2000-06-09 | 2002-03-26 | Cymer, Inc. | Gas discharge laser electrode with reduced sensitivity to adverse boundary layer effects |
| US6560263B1 (en) | 2000-06-09 | 2003-05-06 | Cymer, Inc. | Discharge laser having electrodes with sputter cavities and discharge peaks |
| US6654403B2 (en) | 2000-06-09 | 2003-11-25 | Cymer, Inc. | Flow shaping electrode with erosion pad for gas discharge laser |
| US7230965B2 (en) * | 2001-02-01 | 2007-06-12 | Cymer, Inc. | Anodes for fluorine gas discharge lasers |
| US7095774B2 (en) * | 2001-09-13 | 2006-08-22 | Cymer, Inc. | Cathodes for fluorine gas discharge lasers |
| US7339973B2 (en) * | 2001-09-13 | 2008-03-04 | Cymer, Inc. | Electrodes for fluorine gas discharge lasers |
| US7671349B2 (en) * | 2003-04-08 | 2010-03-02 | Cymer, Inc. | Laser produced plasma EUV light source |
| US7301980B2 (en) * | 2002-03-22 | 2007-11-27 | Cymer, Inc. | Halogen gas discharge laser electrodes |
| US7633989B2 (en) | 2005-06-27 | 2009-12-15 | Cymer, Inc. | High pulse repetition rate gas discharge laser |
| US20070071047A1 (en) * | 2005-09-29 | 2007-03-29 | Cymer, Inc. | 6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements |
| US7706424B2 (en) * | 2005-09-29 | 2010-04-27 | Cymer, Inc. | Gas discharge laser system electrodes and power supply for delivering electrical energy to same |
| US7655925B2 (en) | 2007-08-31 | 2010-02-02 | Cymer, Inc. | Gas management system for a laser-produced-plasma EUV light source |
| US7812329B2 (en) | 2007-12-14 | 2010-10-12 | Cymer, Inc. | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus |
| US8519366B2 (en) | 2008-08-06 | 2013-08-27 | Cymer, Inc. | Debris protection system having a magnetic field for an EUV light source |
| JP5687488B2 (ja) | 2010-02-22 | 2015-03-18 | ギガフォトン株式会社 | 極端紫外光生成装置 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3659225A (en) * | 1970-05-21 | 1972-04-25 | Nasa | Optical pump and driver system for lasers |
| US3828277A (en) * | 1971-12-27 | 1974-08-06 | Us Army | Integral capacitor lateral discharge laser |
| US3970956A (en) * | 1975-07-24 | 1976-07-20 | The United States Of America As Represented By The United States Energy Research And Development Administration | Cylindrical electron beam diode |
| US4112392A (en) * | 1975-09-17 | 1978-09-05 | Andersson Hans E B | Method and apparatus for producing laser pulses with high reproducibility |
| NL7605991A (nl) * | 1976-06-03 | 1977-12-06 | Stichting Fund Ond Material | Opstelling voor een dwars aangestoten bij atmosferische druk werkende laser. |
| DE2636177C3 (de) * | 1976-08-11 | 1981-08-20 | Kraftwerk Union AG, 4330 Mülheim | Hochenergielaser |
| DE2753304C2 (de) * | 1977-11-30 | 1984-11-08 | Eltro GmbH, Gesellschaft für Strahlungstechnik, 6900 Heidelberg | Transversal angeregter, bei Atmosphärendruck arbeitender Gaslaser (TEA-Laser) |
| WO1979000432A1 (en) * | 1977-12-23 | 1979-07-12 | Battelle Memorial Institute | Electronically excited impulse laser in an active gas medium |
| US4201953A (en) * | 1978-05-01 | 1980-05-06 | Robbins Gene A | Laser system with triangulated capacitor encircling the laser head |
| DE2850521C2 (de) * | 1978-11-22 | 1986-05-22 | Eltro GmbH, Gesellschaft für Strahlungstechnik, 6900 Heidelberg | Transversal angeregter, bei Atmosphärendruck arbeitender Gaslaser |
| US4237430A (en) * | 1979-02-27 | 1980-12-02 | Westinghouse Electric Corp. | Coaxial discharge sealed-off quartz laser tube |
| DE2932781C2 (de) * | 1979-08-13 | 1985-10-31 | Kraftwerk Union AG, 4330 Mülheim | Vorrichtung zur Erzeugung schneller gepulster Kondensatorentladungen in einem Laser |
| NL7906279A (nl) * | 1979-08-17 | 1981-02-19 | Goudsche Machinefabriek Bv | Ijkeenheid voor het ijken van een hydraulisch of elek- trisch drukmeetelement, in het bijzonder van een son- deerapparaat. |
| DE3264478D1 (en) * | 1981-02-16 | 1985-08-08 | Comp Generale Electricite | Capacitor discharge excited gas laser |
| DE3314157A1 (de) * | 1982-04-19 | 1983-12-08 | Kraftwerk Union AG, 4330 Mülheim | Anregungskreis fuer lasersysteme, insbesondere fuer te-hochenergielaser, mit einstellung der vorionisierung |
| DE3240372A1 (de) * | 1982-11-02 | 1984-05-03 | Kraftwerk Union AG, 4330 Mülheim | Anregungssystem zur erzeugung einer schnellen, gepulsten hochspannungsentladung, insbesondere zur anregung eines hochleistungslasers |
-
1984
- 1984-12-26 US US06/686,339 patent/US4876693A/en not_active Expired - Fee Related
-
1985
- 1985-11-14 NO NO85854552A patent/NO854552L/no unknown
- 1985-12-10 IT IT8548903A patent/IT8548903A0/it unknown
- 1985-12-18 DE DE19853544862 patent/DE3544862A1/de not_active Withdrawn
- 1985-12-18 GB GB8531290A patent/GB2227877B/en not_active Expired - Fee Related
- 1985-12-23 FR FR8519018A patent/FR2637742A1/fr not_active Withdrawn
-
1986
- 1986-01-08 SE SE8600078A patent/SE8600078D0/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| FR2637742A1 (fr) | 1990-04-13 |
| DE3544862A1 (de) | 1990-06-28 |
| GB2227877B (en) | 1990-10-24 |
| IT8548903A0 (it) | 1985-12-10 |
| GB2227877A (en) | 1990-08-08 |
| GB8531290D0 (en) | 1990-04-25 |
| SE8600078D0 (sv) | 1986-01-08 |
| US4876693A (en) | 1989-10-24 |
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