NO851973L - PHYSIALLY SENSITIVE MIXING AND THEREFORE MANUFACTURING TWO COMPONENT DIAZOTY MATERIAL. - Google Patents

PHYSIALLY SENSITIVE MIXING AND THEREFORE MANUFACTURING TWO COMPONENT DIAZOTY MATERIAL.

Info

Publication number
NO851973L
NO851973L NO851973A NO851973A NO851973L NO 851973 L NO851973 L NO 851973L NO 851973 A NO851973 A NO 851973A NO 851973 A NO851973 A NO 851973A NO 851973 L NO851973 L NO 851973L
Authority
NO
Norway
Prior art keywords
acid
physially
diazoty
manufacturing
component
Prior art date
Application number
NO851973A
Other languages
Norwegian (no)
Other versions
NO168213C (en
NO168213B (en
Inventor
Siegfried Scheler
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of NO851973L publication Critical patent/NO851973L/en
Publication of NO168213B publication Critical patent/NO168213B/en
Publication of NO168213C publication Critical patent/NO168213C/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/58Coupling substances therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/60Compositions containing diazo compounds as photosensitive substances with macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Liquid Developers In Electrophotography (AREA)
  • Mirrors, Picture Frames, Photograph Stands, And Related Fastening Devices (AREA)
  • Reinforcement Elements For Buildings (AREA)
  • Inorganic Insulating Materials (AREA)

Abstract

1. A light-sensitive mixture, composed of a diazonium salt, a coupler, a resin binder, a stabilizer, conventional additives and a liquid phase, which comprises a combination of a) at least one p-aminobenzenediazonium hexafluophosphate, b) at least one 4,4-dihydroxy-diphenyl sulfide, if appropriate as a mixture with a further coupler, c) an acid stabilizer in a concentration from zero to 20 per cent by weight, relative to the diazonium salt employed, d) at least one plastic which contains acid groups, has an acid number of at least 100 and is derived from the maleic acid or phthalic acid type, as the resin binder, and e) lower alcohols, glycol ethers, ketones water or mixtures of these solvents.
NO851973A 1984-05-18 1985-05-15 TWO COMPONENT DIAZOTYPIMATERIAL AND PHYSICAL SENSITIVE MIX NO168213C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19843418469 DE3418469A1 (en) 1984-05-18 1984-05-18 LIGHT-SENSITIVE MIXTURE AND TWO-COMPONENT DIAZOTYPE MATERIAL PRODUCED WITH IT

Publications (3)

Publication Number Publication Date
NO851973L true NO851973L (en) 1985-11-19
NO168213B NO168213B (en) 1991-10-14
NO168213C NO168213C (en) 1992-01-22

Family

ID=6236196

Family Applications (1)

Application Number Title Priority Date Filing Date
NO851973A NO168213C (en) 1984-05-18 1985-05-15 TWO COMPONENT DIAZOTYPIMATERIAL AND PHYSICAL SENSITIVE MIX

Country Status (13)

Country Link
EP (1) EP0161655B1 (en)
JP (1) JPS60256140A (en)
AT (1) ATE39771T1 (en)
AU (1) AU578094B2 (en)
BR (1) BR8502350A (en)
CA (1) CA1270142A (en)
DE (2) DE3418469A1 (en)
DK (1) DK161113C (en)
ES (1) ES8607574A1 (en)
FI (1) FI851954L (en)
IE (1) IE56665B1 (en)
NO (1) NO168213C (en)
ZA (1) ZA853737B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4550069A (en) * 1984-06-11 1985-10-29 American Hoechst Corporation Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US10034690B2 (en) 2014-12-09 2018-07-31 John A. Heflin Spine alignment system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3203803A (en) * 1964-01-20 1965-08-31 Tecnifax Corp Light-sensitive diazo hexafluoro-phosphate compositions
US3591381A (en) * 1967-07-31 1971-07-06 Eastman Kodak Co Stabilized diazotype composition
US3857896A (en) * 1967-09-13 1974-12-31 R Desjarlais Substituted diresorcyl sulfide and sulfoxide compounds
US3619191A (en) * 1967-09-13 1971-11-09 Tecnifax Corp The Diazo-type materials
DE2747412A1 (en) * 1976-10-22 1978-04-27 Scott Paper Co LIGHT SENSITIVE DIAZOMASS FOR DIAZOTYPE
DE2652942C3 (en) * 1976-11-22 1979-05-31 Hoechst Ag, 6000 Frankfurt Two component diazotype material
DE2811981A1 (en) * 1978-03-18 1979-09-27 Hoechst Ag 2-HYDROXY-3-NAPHTHOESAEUREAMIDE
DE2907446A1 (en) * 1979-02-26 1980-09-04 Hoechst Ag TWO COMPONENT DIAZOTYPE MATERIAL

Also Published As

Publication number Publication date
JPS60256140A (en) 1985-12-17
NO168213C (en) 1992-01-22
FI851954A0 (en) 1985-05-16
EP0161655B1 (en) 1989-01-04
DK219485A (en) 1985-11-19
DE3567291D1 (en) 1989-02-09
DK219485D0 (en) 1985-05-17
DE3418469A1 (en) 1985-11-21
ES543035A0 (en) 1986-06-01
BR8502350A (en) 1986-01-21
EP0161655A3 (en) 1987-05-27
AU4262685A (en) 1985-11-21
NO168213B (en) 1991-10-14
AU578094B2 (en) 1988-10-13
CA1270142A (en) 1990-06-12
IE56665B1 (en) 1991-10-23
IE851243L (en) 1985-11-18
DK161113B (en) 1991-05-27
EP0161655A2 (en) 1985-11-21
ES8607574A1 (en) 1986-06-01
ZA853737B (en) 1986-01-29
FI851954L (en) 1985-11-19
ATE39771T1 (en) 1989-01-15
DK161113C (en) 1991-11-11

Similar Documents

Publication Publication Date Title
ATE13515T1 (en) DYE.
JPS5545774A (en) Epoxy resin composition
JPS5341221A (en) Photographic light sensitive material
NO851973L (en) PHYSIALLY SENSITIVE MIXING AND THEREFORE MANUFACTURING TWO COMPONENT DIAZOTY MATERIAL.
DE3587033D1 (en) IMAGING DEVICE WITH COMPENSATION OF PHASE ERRORS CAUSED BY CHANGES IN SCAN SPEED.
NO834845L (en) STABLE CEMENT CONTAINING MIXTURE
Rustamov et al. Interactions on the Ga sub 2 Te sub 3--FeTe and GaTe--Fe Sections of the Ga--Fe--Te System
JPS5515019A (en) Solvent for water titration dependent upon karl fischer method
JPS5446426A (en) Input medium expressed by bar code to information processor
BE856962A (en) RESINS OF THE RESOL TYPE
SE8200820L (en) PROCEDURE TO PLASTATE MEDIUM LIGNOSULPHONATE MIXED PORTLAND CEMENT MIXTURES AND BRING THEM IN FLIGHT FORM
JPS5595709A (en) Auto-travelling type floating work-platform with 6-legs
JPS54137093A (en) Preparation of modified polyarylene dicarboxylate
JPS53134051A (en) Method of stabilizing thermally flame-retardant resin composition
IT1059757B (en) COMPOSITIONS INCLUDING EPOXY RESINS AND PHENOLIC RESINS WITH NO VOLACCHE
KR850002448A (en) Synthetic resin goggles and manufacturing method
SHEFTEL Polymer materials- Toxic properties/Handbook/(in Russian)
JPS5597084A (en) Bubble memory module
JPS56115293A (en) Recording material
JPS52142055A (en) Preparation of 1,4-dihydroanthraquinones
Pecharskii et al. The Crystal Structure of the Compound LaSb sub 2 Ni sub 2
JPS5364514A (en) Silver halide photographic material
Porcella et al. Erratum for “Index To Evaluate Lake Restoration”
JPS5366109A (en) Folding testing set
Lukendakenda Analysis of errors in English composition by Tanzanian students