NO168213C - TWO COMPONENT DIAZOTYPIMATERIAL AND PHYSICAL SENSITIVE MIX - Google Patents
TWO COMPONENT DIAZOTYPIMATERIAL AND PHYSICAL SENSITIVE MIXInfo
- Publication number
- NO168213C NO168213C NO851973A NO851973A NO168213C NO 168213 C NO168213 C NO 168213C NO 851973 A NO851973 A NO 851973A NO 851973 A NO851973 A NO 851973A NO 168213 C NO168213 C NO 168213C
- Authority
- NO
- Norway
- Prior art keywords
- acid
- diazotypimaterial
- component
- stabilizer
- resin binder
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/58—Coupling substances therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/60—Compositions containing diazo compounds as photosensitive substances with macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photoreceptors In Electrophotography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Liquid Developers In Electrophotography (AREA)
- Mirrors, Picture Frames, Photograph Stands, And Related Fastening Devices (AREA)
- Reinforcement Elements For Buildings (AREA)
- Inorganic Insulating Materials (AREA)
Abstract
1. A light-sensitive mixture, composed of a diazonium salt, a coupler, a resin binder, a stabilizer, conventional additives and a liquid phase, which comprises a combination of a) at least one p-aminobenzenediazonium hexafluophosphate, b) at least one 4,4-dihydroxy-diphenyl sulfide, if appropriate as a mixture with a further coupler, c) an acid stabilizer in a concentration from zero to 20 per cent by weight, relative to the diazonium salt employed, d) at least one plastic which contains acid groups, has an acid number of at least 100 and is derived from the maleic acid or phthalic acid type, as the resin binder, and e) lower alcohols, glycol ethers, ketones water or mixtures of these solvents.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19843418469 DE3418469A1 (en) | 1984-05-18 | 1984-05-18 | LIGHT-SENSITIVE MIXTURE AND TWO-COMPONENT DIAZOTYPE MATERIAL PRODUCED WITH IT |
Publications (3)
Publication Number | Publication Date |
---|---|
NO851973L NO851973L (en) | 1985-11-19 |
NO168213B NO168213B (en) | 1991-10-14 |
NO168213C true NO168213C (en) | 1992-01-22 |
Family
ID=6236196
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO851973A NO168213C (en) | 1984-05-18 | 1985-05-15 | TWO COMPONENT DIAZOTYPIMATERIAL AND PHYSICAL SENSITIVE MIX |
Country Status (13)
Country | Link |
---|---|
EP (1) | EP0161655B1 (en) |
JP (1) | JPS60256140A (en) |
AT (1) | ATE39771T1 (en) |
AU (1) | AU578094B2 (en) |
BR (1) | BR8502350A (en) |
CA (1) | CA1270142A (en) |
DE (2) | DE3418469A1 (en) |
DK (1) | DK161113C (en) |
ES (1) | ES8607574A1 (en) |
FI (1) | FI851954L (en) |
IE (1) | IE56665B1 (en) |
NO (1) | NO168213C (en) |
ZA (1) | ZA853737B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4550069A (en) * | 1984-06-11 | 1985-10-29 | American Hoechst Corporation | Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate |
US10034690B2 (en) | 2014-12-09 | 2018-07-31 | John A. Heflin | Spine alignment system |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3203803A (en) * | 1964-01-20 | 1965-08-31 | Tecnifax Corp | Light-sensitive diazo hexafluoro-phosphate compositions |
US3591381A (en) * | 1967-07-31 | 1971-07-06 | Eastman Kodak Co | Stabilized diazotype composition |
US3857896A (en) * | 1967-09-13 | 1974-12-31 | R Desjarlais | Substituted diresorcyl sulfide and sulfoxide compounds |
US3619191A (en) * | 1967-09-13 | 1971-11-09 | Tecnifax Corp The | Diazo-type materials |
DE2747412A1 (en) * | 1976-10-22 | 1978-04-27 | Scott Paper Co | LIGHT SENSITIVE DIAZOMASS FOR DIAZOTYPE |
DE2652942C3 (en) * | 1976-11-22 | 1979-05-31 | Hoechst Ag, 6000 Frankfurt | Two component diazotype material |
DE2811981A1 (en) * | 1978-03-18 | 1979-09-27 | Hoechst Ag | 2-HYDROXY-3-NAPHTHOESAEUREAMIDE |
DE2907446A1 (en) * | 1979-02-26 | 1980-09-04 | Hoechst Ag | TWO COMPONENT DIAZOTYPE MATERIAL |
-
1984
- 1984-05-18 DE DE19843418469 patent/DE3418469A1/en not_active Withdrawn
-
1985
- 1985-05-10 ES ES543035A patent/ES8607574A1/en not_active Expired
- 1985-05-13 DE DE8585105849T patent/DE3567291D1/en not_active Expired
- 1985-05-13 AT AT85105849T patent/ATE39771T1/en not_active IP Right Cessation
- 1985-05-13 EP EP85105849A patent/EP0161655B1/en not_active Expired
- 1985-05-14 CA CA000481444A patent/CA1270142A/en not_active Expired - Fee Related
- 1985-05-15 NO NO851973A patent/NO168213C/en unknown
- 1985-05-16 FI FI851954A patent/FI851954L/en not_active Application Discontinuation
- 1985-05-17 BR BR8502350A patent/BR8502350A/en not_active IP Right Cessation
- 1985-05-17 AU AU42626/85A patent/AU578094B2/en not_active Ceased
- 1985-05-17 IE IE1243/85A patent/IE56665B1/en not_active IP Right Cessation
- 1985-05-17 ZA ZA853737A patent/ZA853737B/en unknown
- 1985-05-17 DK DK219485A patent/DK161113C/en not_active IP Right Cessation
- 1985-05-17 JP JP60104156A patent/JPS60256140A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
JPS60256140A (en) | 1985-12-17 |
FI851954A0 (en) | 1985-05-16 |
EP0161655B1 (en) | 1989-01-04 |
DK219485A (en) | 1985-11-19 |
DE3567291D1 (en) | 1989-02-09 |
DK219485D0 (en) | 1985-05-17 |
DE3418469A1 (en) | 1985-11-21 |
ES543035A0 (en) | 1986-06-01 |
BR8502350A (en) | 1986-01-21 |
EP0161655A3 (en) | 1987-05-27 |
AU4262685A (en) | 1985-11-21 |
NO168213B (en) | 1991-10-14 |
AU578094B2 (en) | 1988-10-13 |
CA1270142A (en) | 1990-06-12 |
NO851973L (en) | 1985-11-19 |
IE56665B1 (en) | 1991-10-23 |
IE851243L (en) | 1985-11-18 |
DK161113B (en) | 1991-05-27 |
EP0161655A2 (en) | 1985-11-21 |
ES8607574A1 (en) | 1986-06-01 |
ZA853737B (en) | 1986-01-29 |
FI851954L (en) | 1985-11-19 |
ATE39771T1 (en) | 1989-01-15 |
DK161113C (en) | 1991-11-11 |
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