NO20076570L - Reflektoroppstilling, fremstillingsmetode for samme, og smalbandet rontgenstralefilter og system som inkluderer samme - Google Patents

Reflektoroppstilling, fremstillingsmetode for samme, og smalbandet rontgenstralefilter og system som inkluderer samme

Info

Publication number
NO20076570L
NO20076570L NO20076570A NO20076570A NO20076570L NO 20076570 L NO20076570 L NO 20076570L NO 20076570 A NO20076570 A NO 20076570A NO 20076570 A NO20076570 A NO 20076570A NO 20076570 L NO20076570 L NO 20076570L
Authority
NO
Norway
Prior art keywords
ray
same
manufacturing
system including
narrow band
Prior art date
Application number
NO20076570A
Other languages
English (en)
Norwegian (no)
Inventor
Yong Min Cho
Original Assignee
Monochromatic X Ray Filter Tec
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Monochromatic X Ray Filter Tec filed Critical Monochromatic X Ray Filter Tec
Publication of NO20076570L publication Critical patent/NO20076570L/no

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Measurement Of Radiation (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Connection Of Plates (AREA)
NO20076570A 2005-05-19 2007-12-19 Reflektoroppstilling, fremstillingsmetode for samme, og smalbandet rontgenstralefilter og system som inkluderer samme NO20076570L (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/132,305 US7257197B2 (en) 2003-06-03 2005-05-19 Reflector rack, fabrication method thereof, and narrow brand x-ray filter and system including same
PCT/US2006/019602 WO2007005130A2 (fr) 2005-05-19 2006-05-19 Bati reflechissant, procede de fabrication de celui-ci, et filtre rayons x a bande etroite comprenant celui-ci

Publications (1)

Publication Number Publication Date
NO20076570L true NO20076570L (no) 2008-02-19

Family

ID=37604922

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20076570A NO20076570L (no) 2005-05-19 2007-12-19 Reflektoroppstilling, fremstillingsmetode for samme, og smalbandet rontgenstralefilter og system som inkluderer samme

Country Status (11)

Country Link
US (1) US7257197B2 (fr)
EP (1) EP1882258A2 (fr)
KR (1) KR20080037617A (fr)
CN (1) CN101341552A (fr)
AU (1) AU2006266432A1 (fr)
CA (1) CA2609265A1 (fr)
IL (1) IL187523A0 (fr)
MX (1) MX2007014609A (fr)
NO (1) NO20076570L (fr)
RU (1) RU2007144627A (fr)
WO (1) WO2007005130A2 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7321654B2 (en) * 2003-06-03 2008-01-22 Mentor Technologies, Inc. Narrow band x-ray system and fabrication method thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4519503A (en) * 1983-08-15 1985-05-28 Wilson James D Nestable/stackable basket/tray combination for use in bakery goods distribution systems
WO1988001428A1 (fr) 1986-08-15 1988-02-25 Commonwealth Scientific And Industrial Research Or Instruments de conditionnement de faisceaux a rayons x ou a neutrons
US6643353B2 (en) 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
US7321654B2 (en) * 2003-06-03 2008-01-22 Mentor Technologies, Inc. Narrow band x-ray system and fabrication method thereof

Also Published As

Publication number Publication date
CA2609265A1 (fr) 2007-01-11
WO2007005130A2 (fr) 2007-01-11
CN101341552A (zh) 2009-01-07
MX2007014609A (es) 2008-04-22
EP1882258A2 (fr) 2008-01-30
US7257197B2 (en) 2007-08-14
WO2007005130A3 (fr) 2007-04-05
RU2007144627A (ru) 2009-06-27
IL187523A0 (en) 2008-03-20
US20050220271A1 (en) 2005-10-06
KR20080037617A (ko) 2008-04-30
AU2006266432A1 (en) 2007-01-11

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Legal Events

Date Code Title Description
FC2A Withdrawal, rejection or dismissal of laid open patent application