NO20000013D0 - Process for producing active or passive components on a polymer base for integrated optical devices - Google Patents
Process for producing active or passive components on a polymer base for integrated optical devicesInfo
- Publication number
- NO20000013D0 NO20000013D0 NO20000013A NO20000013A NO20000013D0 NO 20000013 D0 NO20000013 D0 NO 20000013D0 NO 20000013 A NO20000013 A NO 20000013A NO 20000013 A NO20000013 A NO 20000013A NO 20000013 D0 NO20000013 D0 NO 20000013D0
- Authority
- NO
- Norway
- Prior art keywords
- optical devices
- packing density
- integrated optical
- passive components
- polymer base
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
- G03F7/405—Treatment with inorganic or organometallic reagents after imagewise removal
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Optical Integrated Circuits (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Abstract
The invention relates to a method aimed at producing in an economical manner high-quality active and passive optoelectronic components presenting a high degree of integration and great packing density. According to the invention a high-quality structurable layer of coating polymer is applied to an optoelectronic component. A structure is produced by means of an etching mask in conjunction with highly anisotropic deep etching and the resulting structure filled with monomers by means of gaseous or liquid phase diffusion. Depending on the type of monomer used for diffusion and both temperature and reaction time the optical characteristics of the optical component can be modified in a targeted manner. The method provided for in the invention makes it possible to raise the packing density of future integrated monomode optical devices and allows for the cost-efficient production of large numbers of such devices.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NO20000013A NO323741B1 (en) | 1997-07-05 | 2000-01-03 | Process for producing active or passive components on a polymer base for integrated optical devices |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP1997/003558 WO1999003021A1 (en) | 1997-07-05 | 1997-07-05 | Method for producing active or passive components on a polymer basis for integrated optical devices |
NO20000013A NO323741B1 (en) | 1997-07-05 | 2000-01-03 | Process for producing active or passive components on a polymer base for integrated optical devices |
Publications (3)
Publication Number | Publication Date |
---|---|
NO20000013D0 true NO20000013D0 (en) | 2000-01-03 |
NO20000013L NO20000013L (en) | 2000-01-03 |
NO323741B1 NO323741B1 (en) | 2007-07-02 |
Family
ID=8166677
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO20000013A NO323741B1 (en) | 1997-07-05 | 2000-01-03 | Process for producing active or passive components on a polymer base for integrated optical devices |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP0995148B1 (en) |
JP (1) | JP2002510408A (en) |
KR (1) | KR100477338B1 (en) |
AT (1) | ATE414932T1 (en) |
CA (1) | CA2296569A1 (en) |
DE (1) | DE59712982D1 (en) |
NO (1) | NO323741B1 (en) |
WO (1) | WO1999003021A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19957682A1 (en) * | 1999-12-01 | 2001-06-07 | Deutsche Telekom Ag | Device for optical spectroscopy and method for its production |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2550982B2 (en) * | 1987-04-06 | 1996-11-06 | 富士通株式会社 | Method of forming resist mask |
FR2702288B1 (en) * | 1993-03-02 | 1995-09-22 | France Telecom | METHOD FOR FORMING A PHOTORESIST PATTERN ON THE SURFACE OF A SUBSTRATE AND PHOTORESIST SOLUTION COMPRISING AN OXIDIZING COMPOUND. |
DE19616324A1 (en) * | 1996-04-24 | 1997-10-30 | Deutsche Telekom Ag | Polymer-based opto-electronic, e.g. active or passive, component manufacture |
-
1997
- 1997-07-05 DE DE59712982T patent/DE59712982D1/en not_active Expired - Lifetime
- 1997-07-05 AT AT97934449T patent/ATE414932T1/en not_active IP Right Cessation
- 1997-07-05 CA CA002296569A patent/CA2296569A1/en not_active Abandoned
- 1997-07-05 EP EP97934449A patent/EP0995148B1/en not_active Expired - Lifetime
- 1997-07-05 KR KR10-1999-7012576A patent/KR100477338B1/en not_active IP Right Cessation
- 1997-07-05 WO PCT/EP1997/003558 patent/WO1999003021A1/en active IP Right Grant
- 1997-07-05 JP JP50802199A patent/JP2002510408A/en not_active Ceased
-
2000
- 2000-01-03 NO NO20000013A patent/NO323741B1/en unknown
Also Published As
Publication number | Publication date |
---|---|
WO1999003021A1 (en) | 1999-01-21 |
NO323741B1 (en) | 2007-07-02 |
EP0995148B1 (en) | 2008-11-19 |
KR100477338B1 (en) | 2005-03-17 |
EP0995148A1 (en) | 2000-04-26 |
ATE414932T1 (en) | 2008-12-15 |
NO20000013L (en) | 2000-01-03 |
CA2296569A1 (en) | 1999-01-21 |
DE59712982D1 (en) | 2009-01-02 |
KR20010014400A (en) | 2001-02-26 |
JP2002510408A (en) | 2002-04-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DK1504113T3 (en) | Process for preparing polymer layers | |
US3767445A (en) | Embossing techniques for producing integrated optical circuits | |
KR100955018B1 (en) | Method for producing a microstructure using organic-inorganic hybride materials and nano-imprint technology, and the microstructure therefof | |
DE60127402D1 (en) | METHOD FOR PRODUCING SUBSTRATES AND SUBSTRATES MADE THEREOF | |
WO2005009632A3 (en) | Methods for forming tunable molecular gradients on substrates | |
WO2001093652A3 (en) | Liquid crystal display device and method of manufacturing such | |
JP2003534563A5 (en) | ||
EP2270560A3 (en) | Optical device | |
KR100838188B1 (en) | Method of manufacturing piezoelectric elements | |
WO2003030239A1 (en) | Silicon substrate etching method and etching apparatus | |
SE9800756L (en) | Process for manufacturing mirrors in polymeric waveguides | |
ATE252225T1 (en) | METHOD FOR PRODUCING A MICRO-ELECTROMECHANICAL ELEMENT | |
EP0827008A3 (en) | A flat panel display device and a manufacturing method therefor | |
NO20000013D0 (en) | Process for producing active or passive components on a polymer base for integrated optical devices | |
KR960019604A (en) | Method of Making Polycrystalline Semiconductor Thin Film | |
KR950001924A (en) | How to Form a Fine Copper Conductor Pattern | |
JPS60254034A (en) | Formation of pattern | |
KR20040085179A (en) | Integrated semiconductor optical device, method and apparatus for manufacturing such a device | |
Wang et al. | One-step fabrication of surface-relief diffusers by stress-induced undulations on elastomer | |
JPS61204604A (en) | Manufacture of lightwave guide construction | |
JPH0290644A (en) | Manufacture of semiconductor device | |
WO2000029881A1 (en) | Tuning of optical devices | |
US4671850A (en) | Mask using polyimide to support a patterned x-ray opaque layer | |
JPH03501895A (en) | organic optical waveguide | |
JP2002214415A (en) | Light scattering and reflecting surface, method for producing the same and its applied instrument |