NO131392B - - Google Patents
Download PDFInfo
- Publication number
- NO131392B NO131392B NO151172A NO151172A NO131392B NO 131392 B NO131392 B NO 131392B NO 151172 A NO151172 A NO 151172A NO 151172 A NO151172 A NO 151172A NO 131392 B NO131392 B NO 131392B
- Authority
- NO
- Norway
- Prior art keywords
- chambers
- electrode
- electrodes
- walls
- separate
- Prior art date
Links
- 238000004804 winding Methods 0.000 claims description 7
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 230000005684 electric field Effects 0.000 claims description 3
- 239000000758 substrate Substances 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000013077 target material Substances 0.000 description 5
- 239000000498 cooling water Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NO151172A NO131392C (ja) | 1972-04-28 | 1972-04-28 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NO151172A NO131392C (ja) | 1972-04-28 | 1972-04-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
NO131392B true NO131392B (ja) | 1975-02-10 |
NO131392C NO131392C (ja) | 1975-05-21 |
Family
ID=19878244
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO151172A NO131392C (ja) | 1972-04-28 | 1972-04-28 |
Country Status (1)
Country | Link |
---|---|
NO (1) | NO131392C (ja) |
-
1972
- 1972-04-28 NO NO151172A patent/NO131392C/no unknown
Also Published As
Publication number | Publication date |
---|---|
NO131392C (ja) | 1975-05-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10253412B2 (en) | Deposition apparatus including edge plenum showerhead assembly | |
KR100243446B1 (ko) | 플라즈마 발생부를 가지는 샤워헤드장치 | |
US5554255A (en) | Method of and apparatus for a direct voltage arc discharge enhanced reactive treatment of objects | |
KR20240045193A (ko) | 고온 기판 페데스탈 모듈 및 이의 컴포넌트들 | |
TWI416623B (zh) | 具有單一平面天線之電感耦合雙區域處理腔室 | |
US9982343B2 (en) | Apparatus for providing plasma to a process chamber | |
CN102017057B (zh) | 用于基板的等离子体辅助处理的等离子体处理装置和方法 | |
JP2018037413A (ja) | 対称プラズマ処理チャンバ | |
JP2019533274A (ja) | プラズマ処理チャンバ用プラズマスクリーン | |
TW201713794A (zh) | 具有減少的背側電漿點火的噴淋頭 | |
JP2017112371A (ja) | シャワーヘッドアセンブリ | |
US20040026038A1 (en) | Plasma treatment apparatus | |
JP2018014337A (ja) | 誘導結合プラズマ(icp)リアクタの電力堆積制御 | |
KR950012606A (ko) | 플라즈마 처리 장치 | |
US20120212136A1 (en) | Penetrating plasma generating apparatus for high vacuum chambers | |
JP2013541177A5 (ja) | 中性/イオンフラックスの制御のための半導体ウエハ処理装置、半導体ウエハ処理システム、及び、ガス分配ユニット | |
US11854771B2 (en) | Film stress control for plasma enhanced chemical vapor deposition | |
US11031273B2 (en) | Physical vapor deposition (PVD) electrostatic chuck with improved thermal coupling for temperature sensitive processes | |
US20190338420A1 (en) | Pressure skew system for controlling center-to-edge pressure change | |
NO131392B (ja) | ||
US3849283A (en) | Sputtering apparatus | |
KR20210112412A (ko) | 플라즈마 처리 장치 내의 각을 이룬 인젝터를 갖는 가스 공급부 | |
KR20210013771A (ko) | 고밀도 플라즈마 강화 화학 기상 증착 챔버 | |
KR20170121775A (ko) | 화학 기상 증착 장치 | |
KR101490440B1 (ko) | 기판처리장치 |