NL7920170A - Het optisch verhitten van materialen met twee golfleng- ten. - Google Patents
Het optisch verhitten van materialen met twee golfleng- ten. Download PDFInfo
- Publication number
- NL7920170A NL7920170A NL7920170A NL7920170A NL7920170A NL 7920170 A NL7920170 A NL 7920170A NL 7920170 A NL7920170 A NL 7920170A NL 7920170 A NL7920170 A NL 7920170A NL 7920170 A NL7920170 A NL 7920170A
- Authority
- NL
- Netherlands
- Prior art keywords
- light
- radiation
- pulse
- wavelength
- substrate
- Prior art date
Links
Classifications
-
- H10P34/42—
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/22—Heating of the molten zone by irradiation or electric discharge
- C30B13/24—Heating of the molten zone by irradiation or electric discharge using electromagnetic waves
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Recrystallisation Techniques (AREA)
- Laser Beam Processing (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US96419378A | 1978-11-28 | 1978-11-28 | |
| US96419378 | 1978-11-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7920170A true NL7920170A (nl) | 1980-09-30 |
Family
ID=25508237
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7920170A NL7920170A (nl) | 1978-11-28 | 1979-11-15 | Het optisch verhitten van materialen met twee golfleng- ten. |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS55500964A (enExample) |
| CA (1) | CA1129969A (enExample) |
| FR (1) | FR2443138A1 (enExample) |
| GB (1) | GB2056769B (enExample) |
| IT (1) | IT1127616B (enExample) |
| NL (1) | NL7920170A (enExample) |
| WO (1) | WO1980001121A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1174285A (en) * | 1980-04-28 | 1984-09-11 | Michelangelo Delfino | Laser induced flow of integrated circuit structure materials |
| US4542037A (en) * | 1980-04-28 | 1985-09-17 | Fairchild Camera And Instrument Corporation | Laser induced flow of glass bonded materials |
| WO1998015380A1 (en) * | 1996-10-08 | 1998-04-16 | The University Of Arkansas | Process and apparatus for sequential multi-beam laser processing of materials |
| US8546805B2 (en) | 2012-01-27 | 2013-10-01 | Ultratech, Inc. | Two-beam laser annealing with improved temperature performance |
| US9558973B2 (en) | 2012-06-11 | 2017-01-31 | Ultratech, Inc. | Laser annealing systems and methods with ultra-short dwell times |
| SG10201503478UA (en) | 2012-06-11 | 2015-06-29 | Ultratech Inc | Laser annealing systems and methods with ultra-short dwell times |
| US10083843B2 (en) | 2014-12-17 | 2018-09-25 | Ultratech, Inc. | Laser annealing systems and methods with ultra-short dwell times |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3340601A (en) * | 1963-07-17 | 1967-09-12 | United Aircraft Corp | Alloy diffused transistor |
| US3492072A (en) * | 1965-04-14 | 1970-01-27 | Westinghouse Electric Corp | Apparatus for producing radiation patterns for forming etchant-resistant patterns and the like |
| US3585088A (en) * | 1968-10-18 | 1971-06-15 | Ibm | Methods of producing single crystals on supporting substrates |
| US3848104A (en) * | 1973-04-09 | 1974-11-12 | Avco Everett Res Lab Inc | Apparatus for heat treating a surface |
| US4151008A (en) * | 1974-11-15 | 1979-04-24 | Spire Corporation | Method involving pulsed light processing of semiconductor devices |
| US3940289A (en) * | 1975-02-03 | 1976-02-24 | The United States Of America As Represented By The Secretary Of The Navy | Flash melting method for producing new impurity distributions in solids |
| US4059461A (en) * | 1975-12-10 | 1977-11-22 | Massachusetts Institute Of Technology | Method for improving the crystallinity of semiconductor films by laser beam scanning and the products thereof |
| US3989778A (en) * | 1975-12-17 | 1976-11-02 | W. R. Grace & Co. | Method of heat sealing thermoplastic sheets together using a split laser beam |
| DE2643893C3 (de) * | 1976-09-29 | 1981-01-08 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur Herstellung einer mit einer Struktur versehenen Schicht auf einem Substrat |
| US4087695A (en) * | 1977-01-17 | 1978-05-02 | The United States Of America As Represented By The Secretary Of The Army | Method for producing optical baffling material using pulsed electron beams |
| DE2705444A1 (de) * | 1977-02-09 | 1978-08-10 | Siemens Ag | Verfahren zur lokal begrenzten erwaermung eines festkoerpers |
| US4154625A (en) * | 1977-11-16 | 1979-05-15 | Bell Telephone Laboratories, Incorporated | Annealing of uncapped compound semiconductor materials by pulsed energy deposition |
| US4147563A (en) * | 1978-08-09 | 1979-04-03 | The United States Of America As Represented By The United States Department Of Energy | Method for forming p-n junctions and solar-cells by laser-beam processing |
| US4155779A (en) * | 1978-08-21 | 1979-05-22 | Bell Telephone Laboratories, Incorporated | Control techniques for annealing semiconductors |
-
1979
- 1979-11-15 WO PCT/US1979/000978 patent/WO1980001121A1/en not_active Ceased
- 1979-11-15 JP JP50010779A patent/JPS55500964A/ja active Pending
- 1979-11-15 GB GB8024258A patent/GB2056769B/en not_active Expired
- 1979-11-15 NL NL7920170A patent/NL7920170A/nl not_active Application Discontinuation
- 1979-11-21 CA CA340,333A patent/CA1129969A/en not_active Expired
- 1979-11-27 IT IT27611/79A patent/IT1127616B/it active
- 1979-11-27 FR FR7929145A patent/FR2443138A1/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| FR2443138B1 (enExample) | 1983-06-17 |
| IT1127616B (it) | 1986-05-21 |
| JPS55500964A (enExample) | 1980-11-13 |
| IT7927611A0 (it) | 1979-11-27 |
| CA1129969A (en) | 1982-08-17 |
| GB2056769A (en) | 1981-03-18 |
| WO1980001121A1 (en) | 1980-05-29 |
| FR2443138A1 (fr) | 1980-06-27 |
| GB2056769B (en) | 1983-03-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4234356A (en) | Dual wavelength optical annealing of materials | |
| EP1872397B1 (en) | System and method for dual wavelength thermal flux laser annealing | |
| Ashkenasi et al. | Application of self-focusing of ps laser pulses for three-dimensional microstructuring of transparent materials | |
| CN103038862A (zh) | 激光退火方法及其装置 | |
| NL7920170A (nl) | Het optisch verhitten van materialen met twee golfleng- ten. | |
| Garg et al. | Laser-induced damage studies in GaAs | |
| JP2004006703A5 (enExample) | ||
| US20240335909A1 (en) | Method of and apparatus for cutting a substrate or preparing a substrate for cleaving | |
| Grigorev | Laser processing of transparent semiconductor materials | |
| TWI879856B (zh) | 樹脂構件之加工方法、樹脂構件之加工裝置及樹脂零件之製造方法 | |
| RU2708935C1 (ru) | Лазерный способ изменения структуры прозрачных материалов с запрещенной зоной | |
| Singh et al. | Recrystallization of germanium surfaces by femtosecond laser pulses | |
| Zelenina et al. | Laser implantation of impurities in cadmium telluride crystals | |
| Amosov et al. | Optical breakdown of quartz glass by XeF laser radiation | |
| Lee et al. | Laser micro-machining and applications of glasses in optoelectronics | |
| Boggess et al. | Dynamic Picosecond Reflectivity Studies Of Highly Optically-Excited Crystalline Silicon | |
| BOGGESS et al. | Fundamentals and Applications of the Interaction of Picosecond, One Micron | |
| Ivlev et al. | Heating and melting of single-crystal germanium by nanosecond laser pulses | |
| Hajtó et al. | Effect of pulsed laser radiation on amorphous semiconductor films | |
| UA148066U (uk) | Спосіб виготовлення розсіюючого оптичного елемента | |
| Boyd et al. | Fundamentals and Applications of the Interaction of Picosecond, One Micron Radiation with Crystalline Silicon | |
| Mao et al. | Femtosecond time-resolved studies of laser ablation | |
| Gnatyuk et al. | Formation of holograms at the wavelength of 2.76 μ andmeasurement of the width of the emission line of aCaF2: Er3+ crystal laser by a holographic method | |
| Ashkenasi | Nonlinear response in optical materials using ultrashort laser technology | |
| Pob et al. | Melting of a silicon surface by a visible light laser |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A85 | Still pending on 85-01-01 | ||
| BV | The patent application has lapsed |