NL7412217A - METHOD FOR DIFFUSING ACTIVE POLLUTIONS IN SEMICONDUCTIVE MATERIALS. - Google Patents
METHOD FOR DIFFUSING ACTIVE POLLUTIONS IN SEMICONDUCTIVE MATERIALS.Info
- Publication number
- NL7412217A NL7412217A NL7412217A NL7412217A NL7412217A NL 7412217 A NL7412217 A NL 7412217A NL 7412217 A NL7412217 A NL 7412217A NL 7412217 A NL7412217 A NL 7412217A NL 7412217 A NL7412217 A NL 7412217A
- Authority
- NL
- Netherlands
- Prior art keywords
- pollutions
- semiconductive materials
- diffusing active
- diffusing
- active
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02164—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon oxide, e.g. SiO2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
- H01L21/02211—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound being a silane, e.g. disilane, methylsilane or chlorosilane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
- H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
- H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
- H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/02255—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by thermal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
- H01L21/2251—Diffusion into or out of group IV semiconductors
- H01L21/2254—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
- H01L21/2255—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides the applied layer comprising oxides only, e.g. P2O5, PSG, H3BO3, doped oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US39810273A | 1973-09-17 | 1973-09-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7412217A true NL7412217A (en) | 1975-03-19 |
Family
ID=23573993
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7412217A NL7412217A (en) | 1973-09-17 | 1974-09-13 | METHOD FOR DIFFUSING ACTIVE POLLUTIONS IN SEMICONDUCTIVE MATERIALS. |
Country Status (9)
Country | Link |
---|---|
JP (1) | JPS5132422B2 (en) |
BR (1) | BR7407742D0 (en) |
CH (1) | CH574678A5 (en) |
DE (1) | DE2439535A1 (en) |
FR (1) | FR2246066B1 (en) |
GB (1) | GB1464734A (en) |
IT (1) | IT1020140B (en) |
NL (1) | NL7412217A (en) |
SE (1) | SE402182B (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5220763A (en) * | 1975-08-08 | 1977-02-16 | Matsushita Electric Ind Co Ltd | Impurity diffusion system |
US4152824A (en) * | 1977-12-30 | 1979-05-08 | Mobil Tyco Solar Energy Corporation | Manufacture of solar cells |
JPS5919461B2 (en) * | 1978-12-13 | 1984-05-07 | 株式会社日立製作所 | Method for manufacturing silicon semiconductor devices |
JPS56148868A (en) * | 1980-04-18 | 1981-11-18 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
JPS61121326A (en) * | 1984-11-19 | 1986-06-09 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
DE4013929C2 (en) * | 1989-05-02 | 1995-12-07 | Toshiba Kawasaki Kk | Method for introducing interfering substances into a semiconductor material layer when producing a semiconductor component and application of the method |
EP0598438A1 (en) * | 1992-11-17 | 1994-05-25 | Koninklijke Philips Electronics N.V. | Method for diffusing a dopant into a semiconductor |
DE19908400A1 (en) * | 1999-02-26 | 2000-09-07 | Bosch Gmbh Robert | Process for the production of highly doped semiconductor components |
-
1974
- 1974-08-02 FR FR7427487A patent/FR2246066B1/fr not_active Expired
- 1974-08-17 DE DE2439535A patent/DE2439535A1/en active Pending
- 1974-08-22 GB GB3685574A patent/GB1464734A/en not_active Expired
- 1974-08-23 JP JP49096291A patent/JPS5132422B2/ja not_active Expired
- 1974-08-23 IT IT26540/74A patent/IT1020140B/en active
- 1974-09-06 CH CH1213874A patent/CH574678A5/xx not_active IP Right Cessation
- 1974-09-12 SE SE7411498A patent/SE402182B/en unknown
- 1974-09-13 NL NL7412217A patent/NL7412217A/en not_active Application Discontinuation
- 1974-09-17 BR BR7742/74A patent/BR7407742D0/en unknown
Also Published As
Publication number | Publication date |
---|---|
DE2439535A1 (en) | 1975-07-03 |
FR2246066B1 (en) | 1976-12-31 |
JPS5132422B2 (en) | 1976-09-13 |
CH574678A5 (en) | 1976-04-15 |
GB1464734A (en) | 1977-02-16 |
SE402182B (en) | 1978-06-19 |
SE7411498L (en) | 1975-03-18 |
FR2246066A1 (en) | 1975-04-25 |
BR7407742D0 (en) | 1975-07-15 |
IT1020140B (en) | 1977-12-20 |
JPS5057776A (en) | 1975-05-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
NL7501683A (en) | DEVICE FOR AERATING LIQUIDS. | |
NL187735C (en) | METHOD FOR MANUFACTURING AN ORIENTED POLYMERIC MATERIAL | |
NL7415597A (en) | METHOD AND DEVICE FOR DYEING TEXTILE MATERIALS. | |
NL7414761A (en) | METHOD OF INCLUDING FILLER MATERIALS IN BASE MATERIALS. | |
NL7414822A (en) | METHOD AND DEVICE FOR PRINTING FIBER MATERIALS. | |
NL7412533A (en) | PROCEDURE FOR DIFFUSING A DOPING MATERIAL IN A SEMICONDUCTIVE MATERIAL. | |
NL7410858A (en) | DEVICE FOR FORMING NAGALM. | |
NL155045B (en) | PROCESS FOR PREPARING ORGANOSILICUM PREPARATIONS AND FOR THE ANTI-ADHESIA LAYER IN OBJECTS USING THESE PREPARATIONS. | |
BE817595A (en) | WERKWIJZE EN INRICHTING VOOR HET IN EEN GROEP OPSPOREN VAN EEN LICHAMELIJKE AFWIJKING | |
NL7410115A (en) | METHOD AND DEVICE FOR AERATING A LIQUID. | |
NL7416198A (en) | METHOD FOR DRAWING MATERIALS. | |
NL7410888A (en) | DEVICE FOR COMPACTING WASTE. | |
NL7412217A (en) | METHOD FOR DIFFUSING ACTIVE POLLUTIONS IN SEMICONDUCTIVE MATERIALS. | |
NL7413921A (en) | METHOD AND STRUCTURE FOR DETRINKING FIBERWORK. | |
NL7409981A (en) | METHOD AND DEVICE FOR REPLACING TIRES. | |
NL7416366A (en) | DEVICE FOR TREATING ARC-SHAPED MATERIAL WITH AN OPPOSED ROTATING ROTATING BRUSH DEVICE. | |
NL7408054A (en) | METHOD AND DEVICE FOR WASHING EGGS. | |
NL184462C (en) | DEVICE FOR TREATING JOB-MATERIAL. | |
NL7409114A (en) | DEVICE FOR TREATING PARTICULARLY TEXTILE MATERIALS. | |
BE812979A (en) | INRICHTING VOOR HET AFTASTEN VAN EEN OPPERVLAK IN MICRO-ENDOSCOOP VOORZIEN VAN EEN DERGELIJKE INRICHTING | |
NL7410199A (en) | METHOD AND DEVICE FOR MANUFACTURING Cords. | |
NL7414512A (en) | DEVICE FOR TRANSPORTING LANDMATERIAL. | |
BE809490A (en) | METHOD AND DEVICE FOR MANUFACTURING POLYMER FILM | |
NL7412446A (en) | METHODS FOR PREPARING AND USING HETEROCYCLICAL COMPOUNDS. | |
NL7409117A (en) | METHODS FOR PREPARING AND USING HETEROCYCLICAL COMPOUNDS. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
BV | The patent application has lapsed |