NL7410245A - FOR LIGHT SENSITIVE POLYMER PREPARATION AND FOR LIGHT SENSITIVE POLYMER ELEMENT AS WELL AS PROCEDURE FOR MAKING A PRESSURE RELIEF. - Google Patents
FOR LIGHT SENSITIVE POLYMER PREPARATION AND FOR LIGHT SENSITIVE POLYMER ELEMENT AS WELL AS PROCEDURE FOR MAKING A PRESSURE RELIEF.Info
- Publication number
- NL7410245A NL7410245A NL7410245A NL7410245A NL7410245A NL 7410245 A NL7410245 A NL 7410245A NL 7410245 A NL7410245 A NL 7410245A NL 7410245 A NL7410245 A NL 7410245A NL 7410245 A NL7410245 A NL 7410245A
- Authority
- NL
- Netherlands
- Prior art keywords
- light sensitive
- sensitive polymer
- procedure
- making
- well
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
- C08B15/00—Preparation of other cellulose derivatives or modified cellulose, e.g. complexes
- C08B15/10—Crosslinking of cellulose
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/20—Carboxylic acid amides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/0325—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polysaccharides, e.g. cellulose
Landscapes
- Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Graft Or Block Polymers (AREA)
- Polymerisation Methods In General (AREA)
- Polysaccharides And Polysaccharide Derivatives (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US38905673A | 1973-08-16 | 1973-08-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7410245A true NL7410245A (en) | 1975-02-18 |
Family
ID=23536638
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7410245A NL7410245A (en) | 1973-08-16 | 1974-07-30 | FOR LIGHT SENSITIVE POLYMER PREPARATION AND FOR LIGHT SENSITIVE POLYMER ELEMENT AS WELL AS PROCEDURE FOR MAKING A PRESSURE RELIEF. |
Country Status (12)
Country | Link |
---|---|
JP (1) | JPS5050485A (en) |
AU (1) | AU7233574A (en) |
BE (1) | BE818749R (en) |
BR (1) | BR7406798D0 (en) |
DE (1) | DE2439429A1 (en) |
DK (1) | DK440074A (en) |
FI (1) | FI207474A (en) |
FR (1) | FR2241091A2 (en) |
GB (1) | GB1482953A (en) |
IT (1) | IT1048190B (en) |
NL (1) | NL7410245A (en) |
SE (1) | SE7410317L (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL8001085A (en) * | 1979-02-27 | 1980-08-29 | Minnesota Mining & Mfg | PHOTOSENSITIVE MATERIALS AND OBJECTS. |
US4316949A (en) * | 1979-12-14 | 1982-02-23 | Minnesota Mining And Manufacturing Company | Photoreactive oligomer composition and printing plate |
JP2697738B2 (en) * | 1988-02-26 | 1998-01-14 | マックダーミッド イメージング テクノロジー,インコーポレイテッド | Photopolymerizable composition |
-
1974
- 1974-07-05 FI FI2074/74A patent/FI207474A/fi unknown
- 1974-07-30 NL NL7410245A patent/NL7410245A/en unknown
- 1974-08-06 FR FR7427838A patent/FR2241091A2/fr active Pending
- 1974-08-12 BE BE147520A patent/BE818749R/en active
- 1974-08-13 SE SE7410317A patent/SE7410317L/en unknown
- 1974-08-14 AU AU72335/74A patent/AU7233574A/en not_active Expired
- 1974-08-14 IT IT26341/74A patent/IT1048190B/en active
- 1974-08-15 GB GB35969/74A patent/GB1482953A/en not_active Expired
- 1974-08-16 BR BR6798/74A patent/BR7406798D0/en unknown
- 1974-08-16 DE DE2439429A patent/DE2439429A1/en not_active Withdrawn
- 1974-08-16 JP JP49094107A patent/JPS5050485A/ja active Pending
- 1974-08-16 DK DK440074A patent/DK440074A/da not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
BE818749R (en) | 1974-12-02 |
GB1482953A (en) | 1977-08-17 |
DE2439429A1 (en) | 1975-02-27 |
JPS5050485A (en) | 1975-05-06 |
FI207474A (en) | 1975-02-17 |
BR7406798D0 (en) | 1975-06-03 |
IT1048190B (en) | 1980-11-20 |
AU7233574A (en) | 1976-02-19 |
DK440074A (en) | 1975-04-28 |
FR2241091A2 (en) | 1975-03-14 |
SE7410317L (en) | 1975-02-17 |
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