Classifications

• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
  • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

• Physics & Mathematics (AREA)
• Spectroscopy & Molecular Physics (AREA)
• General Physics & Mathematics (AREA)
• Compositions Of Macromolecular Compounds (AREA)
• Photosensitive Polymer And Photoresist Processing (AREA)
• Materials For Photolithography (AREA)
• Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
• Macromonomer-Based Addition Polymer (AREA)

Applications Claiming Priority (1)

Publications (1)

Family

ID=13967532

Family Applications (1)

Country Status (7)

• 1972
  • 1972-09-06 JP JP8932672A patent/JPS515936B2/ja not_active Expired
• 1973
  • 1973-08-29 CA CA179,914A patent/CA993253A/en not_active Expired
  • 1973-08-30 NL NL7311904A patent/NL7311904A/xx not_active Application Discontinuation
  • 1973-09-05 IT IT2857773A patent/IT995284B/it active
  • 1973-09-06 FR FR7332172A patent/FR2198171A1/fr not_active Withdrawn
  • 1973-09-06 GB GB4203373A patent/GB1449157A/en not_active Expired
  • 1973-09-06 DE DE19732345095 patent/DE2345095A1/de active Pending

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