GB1449157A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- GB1449157A GB1449157A GB4203373A GB4203373A GB1449157A GB 1449157 A GB1449157 A GB 1449157A GB 4203373 A GB4203373 A GB 4203373A GB 4203373 A GB4203373 A GB 4203373A GB 1449157 A GB1449157 A GB 1449157A
- Authority
- GB
- United Kingdom
- Prior art keywords
- substituted
- cinnamate
- radical
- solvent
- compositions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title abstract 3
- -1 alkyl radical Chemical class 0.000 abstract 4
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 abstract 4
- 229940114081 cinnamate Drugs 0.000 abstract 3
- WBYWAXJHAXSJNI-UHFFFAOYSA-N cinnamic acid Chemical class OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 abstract 3
- 238000000576 coating method Methods 0.000 abstract 3
- 239000002904 solvent Substances 0.000 abstract 3
- 229930016911 cinnamic acid Natural products 0.000 abstract 2
- 235000013985 cinnamic acid Nutrition 0.000 abstract 2
- 239000000126 substance Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 abstract 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 150000008425 anthrones Chemical class 0.000 abstract 1
- 150000005840 aryl radicals Chemical class 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 150000001851 cinnamic acid derivatives Chemical class 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 150000001875 compounds Chemical group 0.000 abstract 1
- 125000004093 cyano group Chemical group *C#N 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- BLNWTAHYTCHDJH-UHFFFAOYSA-O hydroxy(oxo)azanium Chemical compound O[NH+]=O BLNWTAHYTCHDJH-UHFFFAOYSA-O 0.000 abstract 1
- 150000002576 ketones Chemical class 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 238000003801 milling Methods 0.000 abstract 1
- 239000000123 paper Substances 0.000 abstract 1
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 abstract 1
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 abstract 1
- 239000000049 pigment Substances 0.000 abstract 1
- 239000004033 plastic Substances 0.000 abstract 1
- 229920003023 plastic Polymers 0.000 abstract 1
- 239000004014 plasticizer Substances 0.000 abstract 1
- 229920002755 poly(epichlorohydrin) Polymers 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical class C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 abstract 1
- 150000004053 quinones Chemical class 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 150000003254 radicals Chemical class 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 239000011342 resin composition Substances 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000003381 stabilizer Substances 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8932672A JPS515936B2 (enrdf_load_stackoverflow) | 1972-09-06 | 1972-09-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1449157A true GB1449157A (en) | 1976-09-15 |
Family
ID=13967532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4203373A Expired GB1449157A (en) | 1972-09-06 | 1973-09-06 | Photosensitive composition |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS515936B2 (enrdf_load_stackoverflow) |
| CA (1) | CA993253A (enrdf_load_stackoverflow) |
| DE (1) | DE2345095A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2198171A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1449157A (enrdf_load_stackoverflow) |
| IT (1) | IT995284B (enrdf_load_stackoverflow) |
| NL (1) | NL7311904A (enrdf_load_stackoverflow) |
-
1972
- 1972-09-06 JP JP8932672A patent/JPS515936B2/ja not_active Expired
-
1973
- 1973-08-29 CA CA179,914A patent/CA993253A/en not_active Expired
- 1973-08-30 NL NL7311904A patent/NL7311904A/xx not_active Application Discontinuation
- 1973-09-05 IT IT2857773A patent/IT995284B/it active
- 1973-09-06 FR FR7332172A patent/FR2198171A1/fr not_active Withdrawn
- 1973-09-06 GB GB4203373A patent/GB1449157A/en not_active Expired
- 1973-09-06 DE DE19732345095 patent/DE2345095A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2198171A1 (enrdf_load_stackoverflow) | 1974-03-29 |
| JPS4946428A (enrdf_load_stackoverflow) | 1974-05-04 |
| CA993253A (en) | 1976-07-20 |
| JPS515936B2 (enrdf_load_stackoverflow) | 1976-02-24 |
| DE2345095A1 (de) | 1974-03-14 |
| NL7311904A (enrdf_load_stackoverflow) | 1974-03-08 |
| IT995284B (it) | 1975-11-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |