NL7307880A - - Google Patents

Info

Publication number
NL7307880A
NL7307880A NL7307880A NL7307880A NL7307880A NL 7307880 A NL7307880 A NL 7307880A NL 7307880 A NL7307880 A NL 7307880A NL 7307880 A NL7307880 A NL 7307880A NL 7307880 A NL7307880 A NL 7307880A
Authority
NL
Netherlands
Application number
NL7307880A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7307880A publication Critical patent/NL7307880A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0217Polyurethanes; Epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C08F220/325Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
NL7307880A 1972-10-16 1973-06-06 NL7307880A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29782972A 1972-10-16 1972-10-16

Publications (1)

Publication Number Publication Date
NL7307880A true NL7307880A (en) 1974-04-18

Family

ID=23147914

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7307880A NL7307880A (en) 1972-10-16 1973-06-06

Country Status (8)

Country Link
JP (1) JPS4974236A (en)
AU (1) AU5801973A (en)
BE (1) BE801150A (en)
BR (1) BR7305113D0 (en)
DE (1) DE2329407A1 (en)
FR (2) FR2245252A5 (en)
IL (1) IL42266A0 (en)
NL (1) NL7307880A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5753946B2 (en) * 1975-03-18 1982-11-16
JPS5285475A (en) * 1976-01-09 1977-07-15 Nippon Telegr & Teleph Corp <Ntt> Formation method of high molecular film patterns by high energy beams
CA1164710A (en) * 1978-05-09 1984-04-03 Edward J. Reardon, Jr. Phototropic photosensitive compositions containing fluoran colorformer
JP2817173B2 (en) * 1988-03-15 1998-10-27 住友化学工業株式会社 Curable resin composition
JPH0572727A (en) * 1991-09-10 1993-03-26 Toyobo Co Ltd Hologram recording material

Also Published As

Publication number Publication date
FR2209783A1 (en) 1974-07-05
IL42266A0 (en) 1973-07-30
AU5801973A (en) 1975-01-16
DE2329407A1 (en) 1974-04-18
FR2245252A5 (en) 1975-04-18
JPS4974236A (en) 1974-07-17
BR7305113D0 (en) 1974-07-18
BE801150A (en) 1973-12-19

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