NL7300691A - - Google Patents

Info

Publication number
NL7300691A
NL7300691A NL7300691A NL7300691A NL7300691A NL 7300691 A NL7300691 A NL 7300691A NL 7300691 A NL7300691 A NL 7300691A NL 7300691 A NL7300691 A NL 7300691A NL 7300691 A NL7300691 A NL 7300691A
Authority
NL
Netherlands
Application number
NL7300691A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7300691A publication Critical patent/NL7300691A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
NL7300691A 1972-01-27 1973-01-17 NL7300691A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2203732A DE2203732C2 (de) 1972-01-27 1972-01-27 Mischpolymerisate und diese enthaltende lichtempfindliche Kopiermassen

Publications (1)

Publication Number Publication Date
NL7300691A true NL7300691A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1973-07-31

Family

ID=5834148

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7300691A NL7300691A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-01-27 1973-01-17

Country Status (9)

Country Link
US (1) US3857822A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5635856B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BE (1) BE794542A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA989537A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE2203732C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2185640B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB1414693A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IT (1) IT974265B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL7300691A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4382135A (en) * 1981-04-01 1983-05-03 Diamond Shamrock Corporation Radiation-hardenable diluents
US4415652A (en) * 1982-01-04 1983-11-15 E. I. Du Pont De Nemours & Co. Aqueous processable, positive-working photopolymer compositions
US4417023A (en) * 1982-01-21 1983-11-22 Diamond Shamrock Corporation Polysiloxane stabilizers for flatting agents in radiation hardenable compositions
US4375398A (en) * 1982-03-12 1983-03-01 Gaf Corporation Electron beam sensitive resist of an anhydride copolymer
US4448876A (en) * 1982-05-24 1984-05-15 Gaf Corporation Electron beam sensitive resist
US4876384A (en) * 1985-04-22 1989-10-24 Diamond Shamrock Chemicals Co. Radiation-hardenable diluents
US5110889A (en) * 1985-11-13 1992-05-05 Diamond Shamrock Chemical Co. Radiation hardenable compositions containing low viscosity diluents
US4795692A (en) * 1987-02-02 1989-01-03 Eastman Kodak Company Negative-working polymers useful as X-ray or E-beam resists
EP0350498A1 (en) * 1987-12-23 1990-01-17 Hoechst Celanese Corporation A photoresist composition including a copolymer from maleimide and a vinyl-ether or -ester
JPH0454453U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1990-09-14 1992-05-11
CN103339532B (zh) * 2011-01-31 2016-06-22 日产化学工业株式会社 微透镜形成用感光性树脂组合物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2732297A (en) * 1948-11-03 1956-01-24 Decorating ceramic objects
US2977334A (en) * 1956-10-04 1961-03-28 Monsanto Chemicals Derivatives of ethylene/maleic anhydride copolymers
US3556793A (en) * 1968-05-22 1971-01-19 Gaf Corp Novel substituted allyl polymer derivatives useful as photoresists

Also Published As

Publication number Publication date
CA989537A (en) 1976-05-18
DE2203732C2 (de) 1983-06-01
US3857822A (en) 1974-12-31
GB1414693A (en) 1975-11-19
DE2203732A1 (de) 1973-08-30
IT974265B (it) 1974-06-20
FR2185640A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1974-01-04
JPS4882902A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1973-11-06
BE794542A (fr) 1973-07-25
FR2185640B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1977-02-04
JPS5635856B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1981-08-20

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Legal Events

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BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
BV The patent application has lapsed