NL7215288A - - Google Patents

Info

Publication number
NL7215288A
NL7215288A NL7215288A NL7215288A NL7215288A NL 7215288 A NL7215288 A NL 7215288A NL 7215288 A NL7215288 A NL 7215288A NL 7215288 A NL7215288 A NL 7215288A NL 7215288 A NL7215288 A NL 7215288A
Authority
NL
Netherlands
Application number
NL7215288A
Other versions
NL177263B (nl
NL177263C (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7215288A publication Critical patent/NL7215288A/xx
Publication of NL177263B publication Critical patent/NL177263B/xx
Application granted granted Critical
Publication of NL177263C publication Critical patent/NL177263C/xx

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6302Non-deposition formation processes
    • H10P14/6324Formation by anodic treatments, e.g. anodic oxidation
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69Inorganic materials
    • H10P14/692Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6938Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
    • H10P14/6939Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal
    • H10P14/69391Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal the material containing aluminium, e.g. Al2O3
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69Inorganic materials
    • H10P14/692Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6938Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
    • H10P14/6939Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal
    • H10P14/69393Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal the material containing tantalum, e.g. Ta2O5
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
NLAANVRAGE7215288,A 1971-11-15 1972-11-10 Halfgeleiderinrichting voorzien van onderling gescheiden elektroden die zijn gevormd uit een samengestelde elektrodelaag. NL177263C (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9140571A JPS557020B2 (enExample) 1971-11-15 1971-11-15

Publications (3)

Publication Number Publication Date
NL7215288A true NL7215288A (enExample) 1973-05-17
NL177263B NL177263B (nl) 1985-03-18
NL177263C NL177263C (nl) 1985-08-16

Family

ID=14025458

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7215288,A NL177263C (nl) 1971-11-15 1972-11-10 Halfgeleiderinrichting voorzien van onderling gescheiden elektroden die zijn gevormd uit een samengestelde elektrodelaag.

Country Status (5)

Country Link
US (1) US3848260A (enExample)
JP (1) JPS557020B2 (enExample)
DE (1) DE2252832C2 (enExample)
GB (1) GB1414511A (enExample)
NL (1) NL177263C (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3987217A (en) * 1974-01-03 1976-10-19 Motorola, Inc. Metallization system for semiconductor devices, devices utilizing such metallization system and method for making devices and metallization system
US4215156A (en) * 1977-08-26 1980-07-29 International Business Machines Corporation Method for fabricating tantalum semiconductor contacts
US4206472A (en) * 1977-12-27 1980-06-03 International Business Machines Corporation Thin film structures and method for fabricating same
DE3232837A1 (de) * 1982-09-03 1984-03-08 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen einer 2-ebenen-metallisierung fuer halbleiterbauelemente, insbesondere fuer leistungshalbleiterbauelemente wie thyristoren
GB2255443B (en) * 1991-04-30 1995-09-13 Samsung Electronics Co Ltd Fabricating a metal electrode of a semiconductor device
GB2284710B (en) * 1991-04-30 1995-09-13 Samsung Electronics Co Ltd Fabricating a metal electrode of a semiconductor device
US5679982A (en) * 1993-02-24 1997-10-21 Intel Corporation Barrier against metal diffusion
US5684331A (en) * 1995-06-07 1997-11-04 Lg Semicon Co., Ltd. Multilayered interconnection of semiconductor device
JP2000507052A (ja) * 1997-01-16 2000-06-06 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 少なくともチタン、タングステン又は窒素を有する金属化層が設けられた半導体装置及びその製造方法
US9653296B2 (en) 2014-05-22 2017-05-16 Infineon Technologies Ag Method for processing a semiconductor device and semiconductor device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3442701A (en) * 1965-05-19 1969-05-06 Bell Telephone Labor Inc Method of fabricating semiconductor contacts
US3409809A (en) * 1966-04-06 1968-11-05 Irc Inc Semiconductor or write tri-layered metal contact
US3442012A (en) * 1967-08-03 1969-05-06 Teledyne Inc Method of forming a flip-chip integrated circuit
US3465211A (en) * 1968-02-01 1969-09-02 Friden Inc Multilayer contact system for semiconductors
DE1764434A1 (de) * 1968-06-05 1971-07-22 Telefunken Patent Verfahren zum Kontaktieren eines Halbleiterbauelementes
US3672984A (en) * 1969-03-12 1972-06-27 Hitachi Ltd Method of forming the electrode of a semiconductor device
US3663279A (en) * 1969-11-19 1972-05-16 Bell Telephone Labor Inc Passivated semiconductor devices

Also Published As

Publication number Publication date
US3848260A (en) 1974-11-12
JPS4856076A (enExample) 1973-08-07
NL177263B (nl) 1985-03-18
DE2252832C2 (de) 1984-08-02
JPS557020B2 (enExample) 1980-02-21
GB1414511A (en) 1975-11-19
DE2252832A1 (de) 1973-05-24
NL177263C (nl) 1985-08-16

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Legal Events

Date Code Title Description
BC A request for examination has been filed
A85 Still pending on 85-01-01
DNT Communications of changes of names of applicants whose applications have been laid open to public inspection

Free format text: NEC CORPORATION

V4 Discontinued because of reaching the maximum lifetime of a patent