NL7202035A - - Google Patents
Info
- Publication number
- NL7202035A NL7202035A NL7202035A NL7202035A NL7202035A NL 7202035 A NL7202035 A NL 7202035A NL 7202035 A NL7202035 A NL 7202035A NL 7202035 A NL7202035 A NL 7202035A NL 7202035 A NL7202035 A NL 7202035A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/702—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof
- H01L21/707—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof of thin-film circuits or parts thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2110987A DE2110987B2 (de) | 1971-03-08 | 1971-03-08 | Verfahren zum Herstellen von dünnen Schichten aus Tantal |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7202035A true NL7202035A (en:Method) | 1972-09-12 |
Family
ID=5800841
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7202035A NL7202035A (en:Method) | 1971-03-08 | 1972-02-16 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3808109A (en:Method) |
| BE (1) | BE780373A (en:Method) |
| DE (1) | DE2110987B2 (en:Method) |
| FR (1) | FR2128643B1 (en:Method) |
| GB (1) | GB1349833A (en:Method) |
| IT (1) | IT949790B (en:Method) |
| NL (1) | NL7202035A (en:Method) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4046712A (en) * | 1972-11-30 | 1977-09-06 | United Kingdom Atomic Energy Authority | Catalysts sputtered on substantially nonporous low surface area particulate supports |
| US3874922A (en) * | 1973-08-16 | 1975-04-01 | Boeing Co | Tantalum thin film resistors by reactive evaporation |
| US4036708A (en) * | 1976-05-13 | 1977-07-19 | Bell Telephone Laboratories, Incorporated | Technique for nucleating b.c.c. tantalum films on insulating substrates |
| JPS5671821A (en) | 1979-11-14 | 1981-06-15 | Hitachi Ltd | Substrate for magnetic disc and its manufacture |
| EP0582387B1 (en) * | 1992-08-05 | 1999-05-26 | Sharp Kabushiki Kaisha | Metallic wiring board and method for producing the same |
| EP2423158A1 (en) * | 2004-03-24 | 2012-02-29 | H. C. Starck Inc | Methods of forming alpha and beta tantalum films with controlled and new microstructures |
| DE112006004000A5 (de) * | 2006-06-16 | 2009-05-20 | Siemens Aktiengesellschaft | Thermisch beanspruchbares Bauteil mit einer Korrosionsschihct und Verfahren zu dessen Herstellung |
| CN113235060B (zh) * | 2021-05-12 | 2023-01-06 | 中国兵器工业第五九研究所 | 一种全α相钽涂层的制备方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1665571B1 (de) * | 1966-03-08 | 1971-09-09 | Siemens Ag | Verfahren zur herstellung von duennschichtbaugruppen der elektronik |
-
1971
- 1971-03-08 DE DE2110987A patent/DE2110987B2/de not_active Withdrawn
-
1972
- 1972-02-16 NL NL7202035A patent/NL7202035A/xx not_active Application Discontinuation
- 1972-02-18 GB GB755772A patent/GB1349833A/en not_active Expired
- 1972-03-02 IT IT21293/72A patent/IT949790B/it active
- 1972-03-06 FR FR7207645A patent/FR2128643B1/fr not_active Expired
- 1972-03-07 US US00232373A patent/US3808109A/en not_active Expired - Lifetime
- 1972-03-08 BE BE780373A patent/BE780373A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| IT949790B (it) | 1973-06-11 |
| US3808109A (en) | 1974-04-30 |
| GB1349833A (en) | 1974-04-10 |
| BE780373A (fr) | 1972-07-03 |
| DE2110987B2 (de) | 1978-11-16 |
| DE2110987A1 (de) | 1972-09-14 |
| FR2128643B1 (en:Method) | 1977-04-01 |
| FR2128643A1 (en:Method) | 1972-10-20 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| BB | A search report has been drawn up | ||
| BV | The patent application has lapsed |