NL7111290A - - Google Patents

Info

Publication number
NL7111290A
NL7111290A NL7111290A NL7111290A NL7111290A NL 7111290 A NL7111290 A NL 7111290A NL 7111290 A NL7111290 A NL 7111290A NL 7111290 A NL7111290 A NL 7111290A NL 7111290 A NL7111290 A NL 7111290A
Authority
NL
Netherlands
Application number
NL7111290A
Other versions
NL175535B (nl
NL175535C (nl
Inventor
J Grandia
R M Potemski
J M Woodall
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of NL7111290A publication Critical patent/NL7111290A/xx
Publication of NL175535B publication Critical patent/NL175535B/xx
Application granted granted Critical
Publication of NL175535C publication Critical patent/NL175535C/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00—Liquid-phase epitaxial-layer growth
    • C30B19/06—Reaction chambers; Boats for supporting the melt; Substrate holders
    • C30B19/064—Rotating sliding boat system
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00—Liquid-phase epitaxial-layer growth
    • C30B19/06—Reaction chambers; Boats for supporting the melt; Substrate holders
    • C30B19/062—Vertical dipping system
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/26—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using liquid deposition
    • H10P14/263—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using liquid deposition using melted materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/26—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using liquid deposition
    • H10P14/265—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using liquid deposition using solutions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
    • H10P14/2901—Materials
    • H10P14/2907—Materials being Group IIIA-VA materials
    • H10P14/2911—Arsenides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/34—Deposited materials, e.g. layers
    • H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
    • H10P14/3414—Deposited materials, e.g. layers characterised by the chemical composition being group IIIA-VIA materials
    • H10P14/3421—Arsenides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
NLAANVRAGE7111290,A 1970-08-17 1971-08-16 Werkwijze voor het vanuit de vloeistoffase aangroeien van ten minste een epitaxiale laag van samengesteld halfgeleidermateriaal op een dragerlichaam van samengesteld halfgeleidermateriaal. NL175535C (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US6452370A 1970-08-17 1970-08-17

Publications (3)

Publication Number Publication Date
NL7111290A true NL7111290A (enExample) 1972-02-21
NL175535B NL175535B (nl) 1984-06-18
NL175535C NL175535C (nl) 1984-11-16

Family

ID=22056562

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7111290,A NL175535C (nl) 1970-08-17 1971-08-16 Werkwijze voor het vanuit de vloeistoffase aangroeien van ten minste een epitaxiale laag van samengesteld halfgeleidermateriaal op een dragerlichaam van samengesteld halfgeleidermateriaal.

Country Status (9)

Country Link
JP (1) JPS5134391B1 (enExample)
AU (1) AU459061B2 (enExample)
BE (1) BE771417A (enExample)
CA (1) CA955507A (enExample)
CH (1) CH548791A (enExample)
FR (1) FR2104258A5 (enExample)
GB (1) GB1300187A (enExample)
NL (1) NL175535C (enExample)
SE (1) SE377055B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61126501U (enExample) * 1985-01-26 1986-08-08
JP3139329B2 (ja) * 1995-07-14 2001-02-26 株式会社村田製作所 液相エピタキシャル成長装置

Also Published As

Publication number Publication date
CA955507A (en) 1974-10-01
AU459061B2 (en) 1975-03-13
BE771417A (fr) 1971-12-31
CH548791A (de) 1974-05-15
AU3240971A (en) 1973-02-22
JPS5134391B1 (enExample) 1976-09-25
SE377055B (enExample) 1975-06-23
DE2140582B2 (de) 1975-06-19
FR2104258A5 (enExample) 1972-04-14
GB1300187A (en) 1972-12-20
DE2140582A1 (de) 1972-02-24
NL175535B (nl) 1984-06-18
NL175535C (nl) 1984-11-16

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee