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Priority claimed from JP7953469Aexternal-prioritypatent/JPS4814684B1/ja
Priority claimed from JP6585870Aexternal-prioritypatent/JPS4812924B1/ja
Application filedfiledCritical
Publication of NL7014502ApublicationCriticalpatent/NL7014502A/xx
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/06—Silver salts
G03F7/07—Silver salts used for diffusion transfer
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
Photosensitive Polymer And Photoresist Processing
(AREA)