NL7007827A - - Google Patents
Info
- Publication number
- NL7007827A NL7007827A NL7007827A NL7007827A NL7007827A NL 7007827 A NL7007827 A NL 7007827A NL 7007827 A NL7007827 A NL 7007827A NL 7007827 A NL7007827 A NL 7007827A NL 7007827 A NL7007827 A NL 7007827A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7007827A NL7007827A (de) | 1970-05-29 | 1970-05-29 | |
| GB1557971A GB1339663A (en) | 1970-05-29 | 1971-05-18 | Presensitized water-washable planographic printing plates |
| FR7119564A FR2090380B1 (de) | 1970-05-29 | 1971-05-28 | |
| DE19712127080 DE2127080A1 (de) | 1970-05-29 | 1971-06-01 | Vorsensibihsierte Flachdruckplatten und Verfahren zu deren Herstellung |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7007827A NL7007827A (de) | 1970-05-29 | 1970-05-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7007827A true NL7007827A (de) | 1971-12-01 |
Family
ID=19810192
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7007827A NL7007827A (de) | 1970-05-29 | 1970-05-29 |
Country Status (4)
| Country | Link |
|---|---|
| DE (1) | DE2127080A1 (de) |
| FR (1) | FR2090380B1 (de) |
| GB (1) | GB1339663A (de) |
| NL (1) | NL7007827A (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR850001415B1 (ko) * | 1980-07-04 | 1985-09-30 | 가부시기가이샤 히다찌 세이사꾸쇼 | 감광성 조성물(感光性組成物) |
| IT1169682B (it) * | 1983-11-08 | 1987-06-03 | I M G Ind Materiali Grafici Sp | Composizione per fotoriproduzioni |
| US4600679A (en) * | 1984-05-25 | 1986-07-15 | W. R. Grace & Co. | Water-developable, negative-working, diazo lithographic printing plate with oleophilic ester overlayer |
| DE3430712A1 (de) * | 1984-08-21 | 1986-03-06 | Hoechst Ag, 6230 Frankfurt | Verfahren zur reduzierung von unterstrahlungen bei der bestrahlung von reproduktionsschichten |
| DE3433911A1 (de) * | 1984-09-15 | 1986-03-27 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung |
| DE3736980A1 (de) * | 1987-10-31 | 1989-05-18 | Basf Ag | Mehrschichtiges, flaechenfoermiges, lichtempfindliches aufzeichnungsmaterial |
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1970
- 1970-05-29 NL NL7007827A patent/NL7007827A/xx unknown
-
1971
- 1971-05-18 GB GB1557971A patent/GB1339663A/en not_active Expired
- 1971-05-28 FR FR7119564A patent/FR2090380B1/fr not_active Expired
- 1971-06-01 DE DE19712127080 patent/DE2127080A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2090380A1 (de) | 1972-01-14 |
| DE2127080A1 (de) | 1972-12-07 |
| FR2090380B1 (de) | 1973-06-08 |
| GB1339663A (en) | 1973-12-05 |