NL7005508A - - Google Patents

Info

Publication number
NL7005508A
NL7005508A NL7005508A NL7005508A NL7005508A NL 7005508 A NL7005508 A NL 7005508A NL 7005508 A NL7005508 A NL 7005508A NL 7005508 A NL7005508 A NL 7005508A NL 7005508 A NL7005508 A NL 7005508A
Authority
NL
Netherlands
Application number
NL7005508A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7005508A publication Critical patent/NL7005508A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J33/00Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
    • H01J33/02Details
    • H01J33/04Windows
NL7005508A 1969-04-16 1970-04-16 NL7005508A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB09316/69A GB1241371A (en) 1969-04-16 1969-04-16 Apparatus for electron beam irradiation

Publications (1)

Publication Number Publication Date
NL7005508A true NL7005508A (en) 1970-10-20

Family

ID=10127350

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7005508A NL7005508A (en) 1969-04-16 1970-04-16

Country Status (3)

Country Link
US (1) US3624391A (en)
GB (1) GB1241371A (en)
NL (1) NL7005508A (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4514636A (en) * 1979-09-14 1985-04-30 Eaton Corporation Ion treatment apparatus
US4261762A (en) * 1979-09-14 1981-04-14 Eaton Corporation Method for conducting heat to or from an article being treated under vacuum
US4680061A (en) * 1979-12-21 1987-07-14 Varian Associates, Inc. Method of thermal treatment of a wafer in an evacuated environment
US4743570A (en) * 1979-12-21 1988-05-10 Varian Associates, Inc. Method of thermal treatment of a wafer in an evacuated environment
US4909314A (en) * 1979-12-21 1990-03-20 Varian Associates, Inc. Apparatus for thermal treatment of a wafer in an evacuated environment
DE10007650C2 (en) * 2000-02-19 2003-04-10 Leica Microsystems Light-optical microscope with electron beam device
US7295015B2 (en) * 2004-02-19 2007-11-13 Brooks Automation, Inc. Ionization gauge
US7030619B2 (en) * 2004-02-19 2006-04-18 Brooks Automation, Inc. Ionization gauge
JP5154232B2 (en) * 2005-02-18 2013-02-27 アイエムエス ナノファブリケーション エージー Charged particle exposure equipment
WO2007107211A1 (en) * 2006-03-20 2007-09-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Device for altering the characteristics of three-dimensional shaped parts using electrons
JP5241195B2 (en) * 2006-10-30 2013-07-17 アイエムエス ナノファブリカツィオン アーゲー Charged particle exposure system
US7768267B2 (en) * 2007-07-11 2010-08-03 Brooks Automation, Inc. Ionization gauge with a cold electron source

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2907704A (en) * 1957-07-19 1959-10-06 High Voltage Engineering Corp Electron irradiation
US3418155A (en) * 1965-09-30 1968-12-24 Ford Motor Co Electron discharge control
US3440466A (en) * 1965-09-30 1969-04-22 Ford Motor Co Window support and heat sink for electron-discharge device
US3486060A (en) * 1967-09-06 1969-12-23 High Voltage Engineering Corp Cooling apparatus with laminar flow for electron permeable windows

Also Published As

Publication number Publication date
US3624391A (en) 1971-11-30
GB1241371A (en) 1971-08-04

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