NL6914613A - - Google Patents

Info

Publication number
NL6914613A
NL6914613A NL6914613A NL6914613A NL6914613A NL 6914613 A NL6914613 A NL 6914613A NL 6914613 A NL6914613 A NL 6914613A NL 6914613 A NL6914613 A NL 6914613A NL 6914613 A NL6914613 A NL 6914613A
Authority
NL
Netherlands
Application number
NL6914613A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6914613A publication Critical patent/NL6914613A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3014—Imagewise removal using liquid means combined with ultrasonic means
NL6914613A 1968-10-25 1969-09-26 NL6914613A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US77060368A 1968-10-25 1968-10-25
US77109968A 1968-10-28 1968-10-28

Publications (1)

Publication Number Publication Date
NL6914613A true NL6914613A (en) 1970-04-28

Family

ID=27118335

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6914613A NL6914613A (en) 1968-10-25 1969-09-26

Country Status (4)

Country Link
DE (2) DE6939303U (en)
FR (1) FR2021570A1 (en)
NL (1) NL6914613A (en)
SE (1) SE366845B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1981001474A1 (en) * 1979-11-14 1981-05-28 Stork Screens Bv Method and apparatus for manufacturing continuous design rollers

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53143669A (en) * 1977-05-23 1978-12-14 Asahi Chem Ind Co Ltd Elimination of surface tuckiness of radically-polymerizable resin cured product
US4246335A (en) * 1979-04-09 1981-01-20 W. R. Grace & Co. Shape dispensing of photopolymer
JPS55135838A (en) * 1979-04-12 1980-10-23 Asahi Chem Ind Co Ltd Surface treating method for photosensitive elastomer printing plate
US4806506A (en) * 1987-09-14 1989-02-21 E. I. Du Pont De Nemours And Company Process for detackifying photopolymer flexographic printing plates
DE3937418A1 (en) * 1989-11-10 1991-05-16 Nokia Unterhaltungselektronik Finely structured plastic film recess printing plate prodn. - used for transfer printing matrix onto flat display panel
GB9112295D0 (en) * 1991-06-07 1991-07-24 Dantex Graphics Ltd Preparation of photopolymerised elastomeric printing plates

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1981001474A1 (en) * 1979-11-14 1981-05-28 Stork Screens Bv Method and apparatus for manufacturing continuous design rollers

Also Published As

Publication number Publication date
FR2021570A1 (en) 1970-07-24
DE1950901A1 (en) 1970-04-30
SE366845B (en) 1974-05-06
DE6939303U (en) 1972-04-20

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