NL6914613A - - Google Patents
Info
- Publication number
- NL6914613A NL6914613A NL6914613A NL6914613A NL6914613A NL 6914613 A NL6914613 A NL 6914613A NL 6914613 A NL6914613 A NL 6914613A NL 6914613 A NL6914613 A NL 6914613A NL 6914613 A NL6914613 A NL 6914613A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3014—Imagewise removal using liquid means combined with ultrasonic means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US77060368A | 1968-10-25 | 1968-10-25 | |
| US77109968A | 1968-10-28 | 1968-10-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL6914613A true NL6914613A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1970-04-28 |
Family
ID=27118335
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6914613A NL6914613A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1968-10-25 | 1969-09-26 |
Country Status (4)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1981001474A1 (fr) * | 1979-11-14 | 1981-05-28 | Stork Screens Bv | Procede et appareil de fabrication de rouleaux a dessins continus |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53143669A (en) * | 1977-05-23 | 1978-12-14 | Asahi Chem Ind Co Ltd | Elimination of surface tuckiness of radically-polymerizable resin cured product |
| US4246335A (en) * | 1979-04-09 | 1981-01-20 | W. R. Grace & Co. | Shape dispensing of photopolymer |
| JPS55135838A (en) * | 1979-04-12 | 1980-10-23 | Asahi Chem Ind Co Ltd | Surface treating method for photosensitive elastomer printing plate |
| US4806506A (en) * | 1987-09-14 | 1989-02-21 | E. I. Du Pont De Nemours And Company | Process for detackifying photopolymer flexographic printing plates |
| DE3937418A1 (de) * | 1989-11-10 | 1991-05-16 | Nokia Unterhaltungselektronik | Verfahren zum herstellen einer feinstrukturierten tiefdruckplatte und anwendung einer solchen platte |
| GB9112295D0 (en) * | 1991-06-07 | 1991-07-24 | Dantex Graphics Ltd | Preparation of photopolymerised elastomeric printing plates |
-
1969
- 1969-09-26 NL NL6914613A patent/NL6914613A/xx unknown
- 1969-10-09 DE DE19691950901 patent/DE1950901A1/de active Pending
- 1969-10-09 DE DE19696939303 patent/DE6939303U/de not_active Expired
- 1969-10-23 FR FR6936434A patent/FR2021570A1/fr not_active Withdrawn
- 1969-10-23 SE SE1456069A patent/SE366845B/xx unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1981001474A1 (fr) * | 1979-11-14 | 1981-05-28 | Stork Screens Bv | Procede et appareil de fabrication de rouleaux a dessins continus |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2021570A1 (en) | 1970-07-24 |
| SE366845B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-05-06 |
| DE6939303U (de) | 1972-04-20 |
| DE1950901A1 (de) | 1970-04-30 |