NL6913318A - - Google Patents

Info

Publication number
NL6913318A
NL6913318A NL6913318A NL6913318A NL6913318A NL 6913318 A NL6913318 A NL 6913318A NL 6913318 A NL6913318 A NL 6913318A NL 6913318 A NL6913318 A NL 6913318A NL 6913318 A NL6913318 A NL 6913318A
Authority
NL
Netherlands
Application number
NL6913318A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6913318A publication Critical patent/NL6913318A/xx

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/44—Projection printing apparatus, e.g. enlarger, copying camera for multiple copying of the same original at the same time
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/88—Image or video recognition using optical means, e.g. reference filters, holographic masks, frequency domain filters or spatial domain filters
    • G06V10/89—Image or video recognition using optical means, e.g. reference filters, holographic masks, frequency domain filters or spatial domain filters using frequency domain filters, e.g. Fourier masks implemented on spatial light modulators
    • G06V10/893—Image or video recognition using optical means, e.g. reference filters, holographic masks, frequency domain filters or spatial domain filters using frequency domain filters, e.g. Fourier masks implemented on spatial light modulators characterised by the kind of filter
    • G06V10/895—Image or video recognition using optical means, e.g. reference filters, holographic masks, frequency domain filters or spatial domain filters using frequency domain filters, e.g. Fourier masks implemented on spatial light modulators characterised by the kind of filter the filter being related to phase processing, e.g. phase-only filters
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Multimedia (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Holo Graphy (AREA)
NL6913318A 1968-10-21 1969-09-01 NL6913318A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US76910368A 1968-10-21 1968-10-21

Publications (1)

Publication Number Publication Date
NL6913318A true NL6913318A (xx) 1970-04-23

Family

ID=25084468

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6913318A NL6913318A (xx) 1968-10-21 1969-09-01

Country Status (5)

Country Link
US (1) US3591252A (xx)
DE (1) DE1940361A1 (xx)
FR (1) FR2022291A1 (xx)
GB (1) GB1280681A (xx)
NL (1) NL6913318A (xx)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4142772A (en) * 1977-05-12 1979-03-06 Rca Corporation Redundant hologram recording method employing temporal information signal
US4455061A (en) * 1980-07-31 1984-06-19 The Regents Of The University Of Minnesota Multi-faceted holographic optical element and methods of making and using same
US4547037A (en) * 1980-10-16 1985-10-15 Regents Of The University Of Minnesota Holographic method for producing desired wavefront transformations
US4471445A (en) * 1981-03-30 1984-09-11 Grumman Aerospace Corporation Fourier transform signal processor
GB8615908D0 (en) * 1986-06-30 1986-08-06 Hugle W B Integrated circuits
DE3750174T2 (de) * 1986-10-30 1994-11-17 Canon Kk Belichtungseinrichtung.
EP1111432B1 (en) * 1991-03-27 2005-12-14 Fujitsu Limited Light beam scanning aparatus
GB2267356B (en) * 1992-03-13 1995-12-06 Holtronic Technologies Ltd Manufacture of high accuracy T1R holograms for full-field lithography processes
US5415835A (en) * 1992-09-16 1995-05-16 University Of New Mexico Method for fine-line interferometric lithography
JPH06102813A (ja) * 1992-09-18 1994-04-15 Fujitsu Ltd 空間光変調装置および立体表示装置
EP0979426A1 (en) 1996-06-10 2000-02-16 Holographic Lithography Systems, Inc. Holographic patterning method and tool for production environments
US6255038B1 (en) 1996-06-10 2001-07-03 Optical Switch Corporation Process for modulating interferometric lithography patterns to record selected discrete patterns in photoresist
US6377337B1 (en) * 1998-05-02 2002-04-23 Canon Kabushiki Kaisha Projection exposure apparatus
TW460758B (en) 1998-05-14 2001-10-21 Holographic Lithography System A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material
US7167615B1 (en) 1999-11-05 2007-01-23 Board Of Regents, The University Of Texas System Resonant waveguide-grating filters and sensors and methods for making and using same
CN102769083A (zh) * 2012-07-16 2012-11-07 江苏扬景光电有限公司 倒装焊氮化物发光二极管及其透光衬底和制造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3405614A (en) * 1965-12-01 1968-10-15 Bell Telephone Labor Inc Apparatus for producing a fly's eye lens

Also Published As

Publication number Publication date
DE1940361A1 (de) 1970-04-23
US3591252A (en) 1971-07-06
GB1280681A (en) 1972-07-05
FR2022291A1 (xx) 1970-07-31

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