NL6909925A - - Google Patents
Info
- Publication number
- NL6909925A NL6909925A NL6909925A NL6909925A NL6909925A NL 6909925 A NL6909925 A NL 6909925A NL 6909925 A NL6909925 A NL 6909925A NL 6909925 A NL6909925 A NL 6909925A NL 6909925 A NL6909925 A NL 6909925A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US74220368A | 1968-07-03 | 1968-07-03 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NL6909925A true NL6909925A (enExample) | 1970-01-06 |
| NL144090B NL144090B (nl) | 1974-11-15 |
Family
ID=24983884
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6909925A NL144090B (nl) | 1968-07-03 | 1969-06-27 | Fotomasker. |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS4919902B1 (enExample) |
| BE (1) | BE735518A (enExample) |
| DE (1) | DE1933034B2 (enExample) |
| FR (1) | FR2012223A1 (enExample) |
| GB (1) | GB1277037A (enExample) |
| NL (1) | NL144090B (enExample) |
| SE (1) | SE349874B (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3815978A (en) * | 1972-06-20 | 1974-06-11 | Ibm | Durable see-through photoresist mask |
-
1969
- 1969-06-27 SE SE918569A patent/SE349874B/xx unknown
- 1969-06-27 NL NL6909925A patent/NL144090B/xx not_active IP Right Cessation
- 1969-06-30 DE DE19691933034 patent/DE1933034B2/de active Pending
- 1969-07-02 BE BE735518D patent/BE735518A/xx not_active IP Right Cessation
- 1969-07-02 FR FR6922330A patent/FR2012223A1/fr not_active Withdrawn
- 1969-07-02 GB GB3341069A patent/GB1277037A/en not_active Expired
- 1969-07-02 JP JP5186469A patent/JPS4919902B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| GB1277037A (en) | 1972-06-07 |
| FR2012223A1 (enExample) | 1970-03-13 |
| DE1933034A1 (de) | 1970-02-05 |
| SE349874B (enExample) | 1972-10-09 |
| JPS4919902B1 (enExample) | 1974-05-21 |
| NL144090B (nl) | 1974-11-15 |
| DE1933034B2 (de) | 1971-06-24 |
| BE735518A (enExample) | 1969-12-16 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| V1 | Lapsed because of non-payment of the annual fee | ||
| NL80 | Abbreviated name of patent owner mentioned of already nullified patent |
Owner name: WESTERN ELECTRI |