DE1933034B2 - Photomarke fuer die herstellung von mikroschaltungen - Google Patents

Photomarke fuer die herstellung von mikroschaltungen

Info

Publication number
DE1933034B2
DE1933034B2 DE19691933034 DE1933034A DE1933034B2 DE 1933034 B2 DE1933034 B2 DE 1933034B2 DE 19691933034 DE19691933034 DE 19691933034 DE 1933034 A DE1933034 A DE 1933034A DE 1933034 B2 DE1933034 B2 DE 1933034B2
Authority
DE
Germany
Prior art keywords
microcircuits
brand
photo
manufacture
photo brand
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19691933034
Other languages
German (de)
English (en)
Other versions
DE1933034A1 (de
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of DE1933034A1 publication Critical patent/DE1933034A1/de
Publication of DE1933034B2 publication Critical patent/DE1933034B2/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE19691933034 1968-07-03 1969-06-30 Photomarke fuer die herstellung von mikroschaltungen Pending DE1933034B2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US74220368A 1968-07-03 1968-07-03

Publications (2)

Publication Number Publication Date
DE1933034A1 DE1933034A1 (de) 1970-02-05
DE1933034B2 true DE1933034B2 (de) 1971-06-24

Family

ID=24983884

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19691933034 Pending DE1933034B2 (de) 1968-07-03 1969-06-30 Photomarke fuer die herstellung von mikroschaltungen

Country Status (7)

Country Link
JP (1) JPS4919902B1 (enExample)
BE (1) BE735518A (enExample)
DE (1) DE1933034B2 (enExample)
FR (1) FR2012223A1 (enExample)
GB (1) GB1277037A (enExample)
NL (1) NL144090B (enExample)
SE (1) SE349874B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2325598A1 (de) * 1972-06-20 1974-01-10 Ibm Dauerhafte, durchsichtige photomaske

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2325598A1 (de) * 1972-06-20 1974-01-10 Ibm Dauerhafte, durchsichtige photomaske

Also Published As

Publication number Publication date
GB1277037A (en) 1972-06-07
FR2012223A1 (enExample) 1970-03-13
DE1933034A1 (de) 1970-02-05
SE349874B (enExample) 1972-10-09
NL6909925A (enExample) 1970-01-06
JPS4919902B1 (enExample) 1974-05-21
NL144090B (nl) 1974-11-15
BE735518A (enExample) 1969-12-16

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Legal Events

Date Code Title Description
SH Request for examination between 03.10.1968 and 22.04.1971