NL6812645A - - Google Patents
Info
- Publication number
- NL6812645A NL6812645A NL6812645A NL6812645A NL6812645A NL 6812645 A NL6812645 A NL 6812645A NL 6812645 A NL6812645 A NL 6812645A NL 6812645 A NL6812645 A NL 6812645A NL 6812645 A NL6812645 A NL 6812645A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C317/00—Sulfones; Sulfoxides
- C07C317/26—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
- C07C317/28—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton with sulfone or sulfoxide groups bound to acyclic carbon atoms of the carbon skeleton
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB4057467 | 1967-09-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL6812645A true NL6812645A (en) | 1969-02-25 |
Family
ID=10415578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6812645A NL6812645A (en) | 1967-09-05 | 1968-09-05 |
Country Status (3)
| Country | Link |
|---|---|
| BE (1) | BE720276A (en) |
| GB (1) | GB1231789A (en) |
| NL (1) | NL6812645A (en) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3930087A1 (en) * | 1989-09-09 | 1991-03-14 | Hoechst Ag | POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL THEREOF |
| DE3930086A1 (en) * | 1989-09-09 | 1991-03-21 | Hoechst Ag | POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL THEREOF |
| DE69125634T2 (en) * | 1990-01-30 | 1998-01-02 | Wako Pure Chem Ind Ltd | Chemically reinforced photoresist material |
| US5216135A (en) * | 1990-01-30 | 1993-06-01 | Wako Pure Chemical Industries, Ltd. | Diazodisulfones |
| JPH03223863A (en) * | 1990-01-30 | 1991-10-02 | Wako Pure Chem Ind Ltd | Resist material |
| JP2500533B2 (en) * | 1990-01-30 | 1996-05-29 | 和光純薬工業株式会社 | Novel diazodisulfone compound |
| DE4006190A1 (en) * | 1990-02-28 | 1991-08-29 | Hoechst Ag | NEGATIVE WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL THEREOF |
| JP3030672B2 (en) * | 1991-06-18 | 2000-04-10 | 和光純薬工業株式会社 | New resist material and pattern forming method |
| DE69218393T2 (en) * | 1991-12-16 | 1997-10-16 | Wako Pure Chem Ind Ltd | Resist material |
| EP0825927B1 (en) | 1996-04-23 | 1999-08-11 | Kodak Polychrome Graphics Company Ltd. | Lithographic printing form precursor and its use by heat imaging |
| US5858626A (en) | 1996-09-30 | 1999-01-12 | Kodak Polychrome Graphics | Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition |
| US6117610A (en) | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
| US6063544A (en) | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
| US6090532A (en) | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
| BR9810668A (en) | 1997-07-05 | 2001-09-04 | Kodak Polychrome Graphics Co | Processes for forming molds and materials sensitive to radiation |
| US6060217A (en) | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
| US6153733A (en) * | 1998-05-18 | 2000-11-28 | Tokyo Ohka Kogyo Co., Ltd. | (Disulfonyl diazomethane compounds) |
| WO2001063363A2 (en) * | 2000-02-27 | 2001-08-30 | Shipley Company, L.L.C. | Photoacid generators and photoresists comprising same |
-
1967
- 1967-09-05 GB GB1231789D patent/GB1231789A/en not_active Expired
-
1968
- 1968-09-02 BE BE720276D patent/BE720276A/xx unknown
- 1968-09-05 NL NL6812645A patent/NL6812645A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| GB1231789A (en) | 1971-05-12 |
| BE720276A (en) | 1969-03-03 |