NL6800091A - - Google Patents

Info

Publication number
NL6800091A
NL6800091A NL6800091A NL6800091A NL6800091A NL 6800091 A NL6800091 A NL 6800091A NL 6800091 A NL6800091 A NL 6800091A NL 6800091 A NL6800091 A NL 6800091A NL 6800091 A NL6800091 A NL 6800091A
Authority
NL
Netherlands
Application number
NL6800091A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6800091A publication Critical patent/NL6800091A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/291Oxides or nitrides or carbides, e.g. ceramics, glass
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/106Masks, special
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/15Silicon on sapphire SOS
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00Optical: systems and elements
    • Y10S359/90Methods

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
NL6800091A 1967-01-03 1968-01-03 NL6800091A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60704867A 1967-01-03 1967-01-03

Publications (1)

Publication Number Publication Date
NL6800091A true NL6800091A (xx) 1968-07-04

Family

ID=24430589

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6800091A NL6800091A (xx) 1967-01-03 1968-01-03

Country Status (5)

Country Link
US (1) US3508982A (xx)
DE (1) DE1597756A1 (xx)
FR (1) FR1549926A (xx)
GB (1) GB1186930A (xx)
NL (1) NL6800091A (xx)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3658631A (en) * 1969-09-19 1972-04-25 Itek Corp Transparent non-wettable surface
US3839039A (en) * 1969-11-18 1974-10-01 Fuji Photo Optical Co Ltd Process for producing color stripe filter
US3661436A (en) * 1970-06-30 1972-05-09 Ibm Transparent fabrication masks utilizing masking material selected from the group consisting of spinels, perovskites, garnets, fluorides and oxy-fluorides
US3743847A (en) * 1971-06-01 1973-07-03 Motorola Inc Amorphous silicon film as a uv filter
US3895147A (en) * 1971-12-27 1975-07-15 Ibm Fabrication mask using divalent rare earth element
US3815978A (en) * 1972-06-20 1974-06-11 Ibm Durable see-through photoresist mask
US3873203A (en) * 1973-03-19 1975-03-25 Motorola Inc Durable high resolution silicon template
US3906133A (en) * 1974-04-23 1975-09-16 Harris Corp Nitrocellulose protective coating on masks used in IC manufacture
US4174217A (en) * 1974-08-02 1979-11-13 Rca Corporation Method for making semiconductor structure
US4155735A (en) * 1977-11-30 1979-05-22 Ppg Industries, Inc. Electromigration method for making stained glass photomasks
USRE31220E (en) * 1977-11-30 1983-04-26 Ppg Industries, Inc. Electromigration method for making stained glass photomasks
US4309495A (en) * 1978-08-02 1982-01-05 Ppg Industries, Inc. Method for making stained glass photomasks from photographic emulsion
US4277884A (en) * 1980-08-04 1981-07-14 Rca Corporation Method for forming an improved gate member utilizing special masking and oxidation to eliminate projecting points on silicon islands
US4509162A (en) * 1980-10-28 1985-04-02 Quixote Corporation High density recording medium
GB2121980B (en) * 1982-06-10 1986-02-05 Standard Telephones Cables Ltd X ray masks
FR2589593A1 (fr) * 1985-08-09 1987-05-07 Pichot Michel Masque de lithographie, procede de fabrication de ce masque et procede de fabrication d'un circuit integre a l'aide dudit masque
WO1987007400A2 (en) * 1986-05-27 1987-12-03 Hughes Aircraft Company Monolithic channeling mask
US5786130A (en) * 1995-10-20 1998-07-28 Hause; Lawrence L. Mapping method for a microscope slide
US6300042B1 (en) 1998-11-24 2001-10-09 Motorola, Inc. Lithographic printing method using a low surface energy layer
US20130220671A1 (en) * 2011-08-11 2013-08-29 Justin Fischbach Wire guard

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL255154A (xx) * 1959-04-15

Also Published As

Publication number Publication date
DE1597756A1 (de) 1970-06-18
GB1186930A (en) 1970-04-08
FR1549926A (xx) 1968-12-13
US3508982A (en) 1970-04-28

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