NL6608483A - - Google Patents

Info

Publication number
NL6608483A
NL6608483A NL6608483A NL6608483A NL6608483A NL 6608483 A NL6608483 A NL 6608483A NL 6608483 A NL6608483 A NL 6608483A NL 6608483 A NL6608483 A NL 6608483A NL 6608483 A NL6608483 A NL 6608483A
Authority
NL
Netherlands
Application number
NL6608483A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6608483A publication Critical patent/NL6608483A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
NL6608483A 1965-06-18 1966-06-17 NL6608483A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46496865A 1965-06-18 1965-06-18

Publications (1)

Publication Number Publication Date
NL6608483A true NL6608483A (en) 1966-12-19

Family

ID=23846005

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6608483A NL6608483A (en) 1965-06-18 1966-06-17

Country Status (10)

Country Link
US (1) US3420977A (en)
AT (1) AT285193B (en)
BE (1) BE682211A (en)
CH (1) CH452732A (en)
DE (1) DE1565880A1 (en)
DK (1) DK121914B (en)
GB (1) GB1135290A (en)
LU (1) LU51327A1 (en)
NL (1) NL6608483A (en)
SE (1) SE336728B (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3710072A (en) * 1971-05-10 1973-01-09 Airco Inc Vapor source assembly
US4048462A (en) * 1975-01-17 1977-09-13 Airco, Inc. Compact rotary evaporation source
IT1037702B (en) * 1975-04-29 1979-11-20 Varian Associates ELECTRONIC BEAM HEATING AND EVAPORATION EQUIPMENT
US4064352A (en) * 1976-02-17 1977-12-20 Varian Associates, Inc. Electron beam evaporator having beam spot control
US4153005A (en) * 1977-07-06 1979-05-08 United Technologies Corporation Multiple electron beam vacuum vapor deposition apparatus
US4492873A (en) * 1980-04-25 1985-01-08 Dmitriev Stanislav P Apparatus for electron beam irradiation of objects
US4728772A (en) * 1986-07-16 1988-03-01 The Boc Group, Inc. Vapor source assembly with adjustable magnetic pole pieces
DE3916787C2 (en) * 1989-05-23 1994-01-20 Balzers Hochvakuum Method and arrangement for controlling the focusing of a beam of monopolar charged particles and application
DE3921040C2 (en) * 1989-06-27 1994-03-10 Balzers Hochvakuum Method and arrangement for controlling the evaporation of material from a target object by a beam of charged particles and use, and method and measuring arrangement for selectively measuring an amount of vaporized particles to carry out the method
US5111022A (en) * 1989-08-23 1992-05-05 Tfi Telemark Cooling system for electron beam gun and method
DE3929475A1 (en) * 1989-09-05 1991-03-14 Balzers Hochvakuum METHOD AND DEVICE FOR DEFLECTING A RAY
US4983806A (en) * 1990-03-01 1991-01-08 Harper James L Method and device for cooling electron beam gun
TW490714B (en) 1999-12-27 2002-06-11 Semiconductor Energy Lab Film formation apparatus and method for forming a film
US20020011205A1 (en) 2000-05-02 2002-01-31 Shunpei Yamazaki Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
US8891583B2 (en) 2000-11-15 2014-11-18 Ati Properties, Inc. Refining and casting apparatus and method
US6496529B1 (en) * 2000-11-15 2002-12-17 Ati Properties, Inc. Refining and casting apparatus and method
US7803212B2 (en) * 2005-09-22 2010-09-28 Ati Properties, Inc. Apparatus and method for clean, rapidly solidified alloys
US7803211B2 (en) * 2005-09-22 2010-09-28 Ati Properties, Inc. Method and apparatus for producing large diameter superalloy ingots
US7578960B2 (en) 2005-09-22 2009-08-25 Ati Properties, Inc. Apparatus and method for clean, rapidly solidified alloys
US8381047B2 (en) * 2005-11-30 2013-02-19 Microsoft Corporation Predicting degradation of a communication channel below a threshold based on data transmission errors
US8748773B2 (en) 2007-03-30 2014-06-10 Ati Properties, Inc. Ion plasma electron emitters for a melting furnace
BRPI0809581A2 (en) 2007-03-30 2019-03-12 Ati Properties Inc melting furnace including filament-discharged ion plasma electron emitter
US7798199B2 (en) 2007-12-04 2010-09-21 Ati Properties, Inc. Casting apparatus and method
US8747956B2 (en) 2011-08-11 2014-06-10 Ati Properties, Inc. Processes, systems, and apparatus for forming products from atomized metals and alloys

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3177535A (en) * 1960-06-21 1965-04-13 Stauffer Chemical Co Electron beam furnace with low beam source
US3068309A (en) * 1960-06-22 1962-12-11 Stauffer Chemical Co Electron beam furnace with multiple field guidance of electrons
NL287742A (en) * 1962-01-15
BE634652A (en) * 1962-07-09
US3202794A (en) * 1963-02-18 1965-08-24 Thermionics Lab Inc Permanent magnet transverse electron beam evaporation source

Also Published As

Publication number Publication date
SE336728B (en) 1971-07-12
BE682211A (en) 1966-11-14
GB1135290A (en) 1968-12-04
LU51327A1 (en) 1966-08-16
US3420977A (en) 1969-01-07
DK121914B (en) 1971-12-20
CH452732A (en) 1968-03-15
DE1565880A1 (en) 1970-02-26
AT285193B (en) 1970-10-12

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