BE682211A - - Google Patents

Info

Publication number
BE682211A
BE682211A BE682211DA BE682211A BE 682211 A BE682211 A BE 682211A BE 682211D A BE682211D A BE 682211DA BE 682211 A BE682211 A BE 682211A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE682211A publication Critical patent/BE682211A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
BE682211D 1965-06-18 1966-06-07 BE682211A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46496865A 1965-06-18 1965-06-18

Publications (1)

Publication Number Publication Date
BE682211A true BE682211A (xx) 1966-11-14

Family

ID=23846005

Family Applications (1)

Application Number Title Priority Date Filing Date
BE682211D BE682211A (xx) 1965-06-18 1966-06-07

Country Status (10)

Country Link
US (1) US3420977A (xx)
AT (1) AT285193B (xx)
BE (1) BE682211A (xx)
CH (1) CH452732A (xx)
DE (1) DE1565880A1 (xx)
DK (1) DK121914B (xx)
GB (1) GB1135290A (xx)
LU (1) LU51327A1 (xx)
NL (1) NL6608483A (xx)
SE (1) SE336728B (xx)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3710072A (en) * 1971-05-10 1973-01-09 Airco Inc Vapor source assembly
US4048462A (en) * 1975-01-17 1977-09-13 Airco, Inc. Compact rotary evaporation source
IT1037702B (it) * 1975-04-29 1979-11-20 Varian Associates Apparecchiatura di rescaldamento e o di evaporazione a fascio elettronico
US4064352A (en) * 1976-02-17 1977-12-20 Varian Associates, Inc. Electron beam evaporator having beam spot control
US4153005A (en) * 1977-07-06 1979-05-08 United Technologies Corporation Multiple electron beam vacuum vapor deposition apparatus
DE3050343C2 (de) * 1980-04-25 1985-06-27 Stanislav Petrovič Dmitriev Einrichtung zur Elektronenbestrahlung von Objekten
US4728772A (en) * 1986-07-16 1988-03-01 The Boc Group, Inc. Vapor source assembly with adjustable magnetic pole pieces
DE3916787C2 (de) * 1989-05-23 1994-01-20 Balzers Hochvakuum Verfahren und Anordnung zur Steuerung der Bündelung eines Strahls monopolar geladener Partikel und Anwendung
DE3921040C2 (de) * 1989-06-27 1994-03-10 Balzers Hochvakuum Verfahren und Anordnung zum Steuern der Verdampfung von Material von einem Zielobjekt durch einen Strahl geladener Teilchen und Verwendung, sowie Verfahren und Meßanordnung zum selektiven Messen einer verdampften Partikelmenge zur Durchführung des Verfahrens
US5111022A (en) * 1989-08-23 1992-05-05 Tfi Telemark Cooling system for electron beam gun and method
DE3929475A1 (de) * 1989-09-05 1991-03-14 Balzers Hochvakuum Verfahren und vorrichtung zur umlenkung eines strahls
US4983806A (en) * 1990-03-01 1991-01-08 Harper James L Method and device for cooling electron beam gun
TW490714B (en) * 1999-12-27 2002-06-11 Semiconductor Energy Lab Film formation apparatus and method for forming a film
US20020011205A1 (en) 2000-05-02 2002-01-31 Shunpei Yamazaki Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
US8891583B2 (en) * 2000-11-15 2014-11-18 Ati Properties, Inc. Refining and casting apparatus and method
US6496529B1 (en) * 2000-11-15 2002-12-17 Ati Properties, Inc. Refining and casting apparatus and method
US7803211B2 (en) * 2005-09-22 2010-09-28 Ati Properties, Inc. Method and apparatus for producing large diameter superalloy ingots
US7803212B2 (en) * 2005-09-22 2010-09-28 Ati Properties, Inc. Apparatus and method for clean, rapidly solidified alloys
US7578960B2 (en) 2005-09-22 2009-08-25 Ati Properties, Inc. Apparatus and method for clean, rapidly solidified alloys
US8381047B2 (en) * 2005-11-30 2013-02-19 Microsoft Corporation Predicting degradation of a communication channel below a threshold based on data transmission errors
US8748773B2 (en) 2007-03-30 2014-06-10 Ati Properties, Inc. Ion plasma electron emitters for a melting furnace
EP2137329B1 (en) 2007-03-30 2016-09-28 ATI Properties LLC Melting furnace including wire-discharge ion plasma electron emitter
US7798199B2 (en) 2007-12-04 2010-09-21 Ati Properties, Inc. Casting apparatus and method
US8747956B2 (en) 2011-08-11 2014-06-10 Ati Properties, Inc. Processes, systems, and apparatus for forming products from atomized metals and alloys

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3177535A (en) * 1960-06-21 1965-04-13 Stauffer Chemical Co Electron beam furnace with low beam source
US3068309A (en) * 1960-06-22 1962-12-11 Stauffer Chemical Co Electron beam furnace with multiple field guidance of electrons
NL287742A (xx) * 1962-01-15
BE634652A (xx) * 1962-07-09
US3202794A (en) * 1963-02-18 1965-08-24 Thermionics Lab Inc Permanent magnet transverse electron beam evaporation source

Also Published As

Publication number Publication date
AT285193B (de) 1970-10-12
CH452732A (de) 1968-03-15
NL6608483A (xx) 1966-12-19
GB1135290A (en) 1968-12-04
US3420977A (en) 1969-01-07
DE1565880A1 (de) 1970-02-26
DK121914B (da) 1971-12-20
SE336728B (xx) 1971-07-12
LU51327A1 (xx) 1966-08-16

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