NL6603190A - - Google Patents
Info
- Publication number
- NL6603190A NL6603190A NL6603190A NL6603190A NL6603190A NL 6603190 A NL6603190 A NL 6603190A NL 6603190 A NL6603190 A NL 6603190A NL 6603190 A NL6603190 A NL 6603190A NL 6603190 A NL6603190 A NL 6603190A
- Authority
- NL
- Netherlands
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/66—Polyesters containing oxygen in the form of ether groups
- C08G63/668—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/676—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
- C08F299/0478—Copolymers from unsaturated polyesters and low molecular monomers characterised by the monomers used
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
- C08G63/682—Polyesters containing atoms other than carbon, hydrogen and oxygen containing halogens
- C08G63/6824—Polyesters containing atoms other than carbon, hydrogen and oxygen containing halogens derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/6828—Polycarboxylic acids and polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/136—Coating process making radiation sensitive element
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1377365 | 1965-03-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL6603190A true NL6603190A (fr) | 1966-09-12 |
Family
ID=11842552
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL129237D NL129237C (fr) | 1965-03-11 | ||
NL6603190A NL6603190A (fr) | 1965-03-11 | 1966-03-11 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL129237D NL129237C (fr) | 1965-03-11 |
Country Status (4)
Country | Link |
---|---|
US (1) | US3556791A (fr) |
DE (1) | DE1522362C2 (fr) |
GB (1) | GB1131617A (fr) |
NL (2) | NL6603190A (fr) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2041411A5 (fr) * | 1969-04-23 | 1971-01-29 | Eastman Kodak Co | |
US3858510A (en) * | 1971-03-11 | 1975-01-07 | Asahi Chemical Ind | Relief structures prepared from photosensitive compositions |
US3856744A (en) * | 1972-04-10 | 1974-12-24 | Continental Can Co | Ultraviolet polymerizable printing ink comprising vehicle prepared from beta-hydroxy esters and polyitaconates |
DE2364183A1 (de) * | 1972-12-28 | 1974-07-25 | Sumitomo Chemical Co | Originalplatte zur uebertragung eines erhabenen musters und verfahren zum uebertragen eines erhabenen musters von einer originalplatte auf ein thermoplastisches harzmaterial |
DE2444118C2 (de) * | 1974-09-14 | 1987-02-12 | Basf Ag, 6700 Ludwigshafen | Mehrschichtige Druckplatte sowie mehrschichtige Reliefdruckform für den Flexodruck |
US4048035A (en) * | 1975-12-17 | 1977-09-13 | Mitsubishi Rayon Co., Ltd. | Photopolymerizable composition |
US4168173A (en) * | 1977-05-27 | 1979-09-18 | Hercules Incorporated | Polymers for increasing the viscosity of photosensitive resins |
CA1123649A (fr) * | 1978-06-22 | 1982-05-18 | Norman E. Hughes | Plaques d'impression constituees d'une couche de base ayant un taux de polymerisation plus eleve que celui de la couche d'impression superficielle |
US4308119A (en) * | 1979-02-21 | 1981-12-29 | Panelgraphic Corporation | Abrasion-resistant optical coating composition containing pentaerythritol based polyacrylates and cellulose esters |
US4332873A (en) * | 1979-08-22 | 1982-06-01 | Hercules Incorporated | Multilayer printing plates and process for making same |
US4407855A (en) * | 1980-01-07 | 1983-10-04 | Panelographic Corporation | Method for forming an abrasion resistant coating from cellulose ester and pentaerythritol acrylates |
US4399192A (en) * | 1980-01-07 | 1983-08-16 | Panelographic Corporation | Radiation cured abrasion resistant coatings of pentaerythritol acrylates and cellulose esters on polymeric substrates |
DE3010428A1 (de) * | 1980-03-19 | 1981-09-24 | Bayer Ag, 5090 Leverkusen | Photopolymerisierbare polyesterharze, verfahren zu ihrer herstellung und ihre verwendung als lackbindemittel |
US4403566A (en) * | 1980-06-23 | 1983-09-13 | Hercules Incorporated | Apparatus for producing a printing plate |
US4475810A (en) * | 1980-10-06 | 1984-10-09 | Hercules Incorporated | Docking sensor system |
US4373007A (en) * | 1980-11-03 | 1983-02-08 | Panelgraphic Corporation | [Non-photoinitialio] non-photocatalyzed dipentaerythritol polyacrylate based coating compositions exhibiting high abrasion resistance |
US4450226A (en) * | 1981-10-26 | 1984-05-22 | Hercules Incorporated | Method and apparatus for producing a printing plate |
US4615968A (en) * | 1982-11-04 | 1986-10-07 | Ciba-Geigy Corporation | Compositions of matter which crosslink under the action of light in the presence of sensitizers |
US4604342A (en) * | 1984-03-17 | 1986-08-05 | E. I. Du Pont De Nemours And Company | Photopolymerizable mixture and recording material produced from it |
EP0177302A3 (fr) * | 1984-09-28 | 1986-09-17 | Hercules Incorporated | Plaque d'impression compressible |
US5238772A (en) * | 1989-06-21 | 1993-08-24 | Hoechst Aktiengesellschaft | Photopolymerizable mixture and recording material containing free-radically polymerizable compound, photosensitive polymerization initiator and polyurethane binder grafted with vinyl alcohol and vinyl acetal units |
JP2944164B2 (ja) * | 1990-08-08 | 1999-08-30 | 旭化成工業株式会社 | フレキソ印刷版用液状感光性樹脂組成物 |
US5348605A (en) * | 1993-09-15 | 1994-09-20 | Hercules Incorporated | Tilting bucket assembly for photopolymer platemaking |
US5753414A (en) * | 1995-10-02 | 1998-05-19 | Macdermid Imaging Technology, Inc. | Photopolymer plate having a peelable substrate |
US6010598A (en) * | 1997-05-08 | 2000-01-04 | The Procter & Gamble Company | Papermaking belt with improved life |
JP2000314961A (ja) * | 1999-04-28 | 2000-11-14 | Fuji Photo Film Co Ltd | ネガ型画像記録材料 |
KR20120080385A (ko) * | 2011-01-07 | 2012-07-17 | 삼성전자주식회사 | 패턴 형성용 접착 필름 조성물, 이를 포함하는 접착 필름 및 이를 이용한 반도체 패키징 방법 |
JP5466689B2 (ja) * | 2011-11-30 | 2014-04-09 | 富士フイルム株式会社 | フレキソ印刷版用樹脂組成物、フレキソ印刷版原版及びその製造方法、並びに、フレキソ印刷版及びその製版方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE623613A (fr) * | 1961-10-16 |
-
0
- NL NL129237D patent/NL129237C/xx active
-
1966
- 1966-03-04 GB GB9596/66A patent/GB1131617A/en not_active Expired
- 1966-03-08 US US532574A patent/US3556791A/en not_active Expired - Lifetime
- 1966-03-11 NL NL6603190A patent/NL6603190A/xx unknown
- 1966-03-11 DE DE1522362A patent/DE1522362C2/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
US3556791A (en) | 1971-01-19 |
DE1522362C2 (de) | 1973-01-04 |
GB1131617A (en) | 1968-10-23 |
DE1522362B1 (de) | 1970-04-30 |
NL129237C (fr) |