NL6513928A - - Google Patents
Info
- Publication number
- NL6513928A NL6513928A NL6513928A NL6513928A NL6513928A NL 6513928 A NL6513928 A NL 6513928A NL 6513928 A NL6513928 A NL 6513928A NL 6513928 A NL6513928 A NL 6513928A NL 6513928 A NL6513928 A NL 6513928A
- Authority
- NL
- Netherlands
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Electrodes Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL6513928A NL6513928A (ko) | 1965-10-27 | 1965-10-27 | |
| GB104966A GB1131462A (en) | 1965-10-27 | 1966-01-10 | Process for preheating shaped bodies in the deposition of semiconductor materials |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL6513928A NL6513928A (ko) | 1965-10-27 | 1965-10-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL6513928A true NL6513928A (ko) | 1967-04-28 |
Family
ID=19794484
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6513928A NL6513928A (ko) | 1965-10-27 | 1965-10-27 |
Country Status (2)
| Country | Link |
|---|---|
| GB (1) | GB1131462A (ko) |
| NL (1) | NL6513928A (ko) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20100139092A (ko) * | 2008-03-26 | 2010-12-31 | 지티 솔라 인코퍼레이티드 | 금-코팅된 폴리실리콘 반응기 시스템 및 방법 |
| US20110318909A1 (en) * | 2010-06-29 | 2011-12-29 | Gt Solar Incorporated | System and method of semiconductor manufacturing with energy recovery |
| DE112011102417T5 (de) * | 2010-07-19 | 2013-05-16 | Rec Silicon Inc. | Herstellung von polykristallinem Silizium |
| KR101145014B1 (ko) * | 2011-09-15 | 2012-05-11 | 웅진폴리실리콘주식회사 | 내벽에 복사열 반사 및 불순물 확산 방지용 니켈-망간 합금층을 구비한 화학기상증착 반응기와 그 제조방법 |
| DE102011084137A1 (de) | 2011-10-07 | 2013-04-11 | Wacker Chemie Ag | Vorrichtung und Verfahren zur Abscheidung von polykristallinemSilicium |
| US11015244B2 (en) | 2013-12-30 | 2021-05-25 | Advanced Material Solutions, Llc | Radiation shielding for a CVD reactor |
| US10450649B2 (en) | 2014-01-29 | 2019-10-22 | Gtat Corporation | Reactor filament assembly with enhanced misalignment tolerance |
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1965
- 1965-10-27 NL NL6513928A patent/NL6513928A/xx unknown
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1966
- 1966-01-10 GB GB104966A patent/GB1131462A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1131462A (en) | 1968-10-23 |