NL6513928A - - Google Patents

Info

Publication number
NL6513928A
NL6513928A NL6513928A NL6513928A NL6513928A NL 6513928 A NL6513928 A NL 6513928A NL 6513928 A NL6513928 A NL 6513928A NL 6513928 A NL6513928 A NL 6513928A NL 6513928 A NL6513928 A NL 6513928A
Authority
NL
Netherlands
Application number
NL6513928A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL6513928A priority Critical patent/NL6513928A/xx
Priority to GB104966A priority patent/GB1131462A/en
Publication of NL6513928A publication Critical patent/NL6513928A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
NL6513928A 1965-10-27 1965-10-27 NL6513928A (enrdf_load_html_response)

Priority Applications (2)

Application Number Priority Date Filing Date Title
NL6513928A NL6513928A (enrdf_load_html_response) 1965-10-27 1965-10-27
GB104966A GB1131462A (en) 1965-10-27 1966-01-10 Process for preheating shaped bodies in the deposition of semiconductor materials

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6513928A NL6513928A (enrdf_load_html_response) 1965-10-27 1965-10-27

Publications (1)

Publication Number Publication Date
NL6513928A true NL6513928A (enrdf_load_html_response) 1967-04-28

Family

ID=19794484

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6513928A NL6513928A (enrdf_load_html_response) 1965-10-27 1965-10-27

Country Status (2)

Country Link
GB (1) GB1131462A (enrdf_load_html_response)
NL (1) NL6513928A (enrdf_load_html_response)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI464292B (zh) * 2008-03-26 2014-12-11 Gtat Corp 塗覆金之多晶矽反應器系統和方法
US20110318909A1 (en) * 2010-06-29 2011-12-29 Gt Solar Incorporated System and method of semiconductor manufacturing with energy recovery
JP2013535390A (ja) * 2010-07-19 2013-09-12 アールイーシー シリコン インコーポレイテッド 多結晶シリコン生産
KR101145014B1 (ko) * 2011-09-15 2012-05-11 웅진폴리실리콘주식회사 내벽에 복사열 반사 및 불순물 확산 방지용 니켈-망간 합금층을 구비한 화학기상증착 반응기와 그 제조방법
DE102011084137A1 (de) 2011-10-07 2013-04-11 Wacker Chemie Ag Vorrichtung und Verfahren zur Abscheidung von polykristallinemSilicium
US11015244B2 (en) 2013-12-30 2021-05-25 Advanced Material Solutions, Llc Radiation shielding for a CVD reactor
US10450649B2 (en) 2014-01-29 2019-10-22 Gtat Corporation Reactor filament assembly with enhanced misalignment tolerance

Also Published As

Publication number Publication date
GB1131462A (en) 1968-10-23

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