NL6503733A - - Google Patents
Info
- Publication number
- NL6503733A NL6503733A NL6503733A NL6503733A NL6503733A NL 6503733 A NL6503733 A NL 6503733A NL 6503733 A NL6503733 A NL 6503733A NL 6503733 A NL6503733 A NL 6503733A NL 6503733 A NL6503733 A NL 6503733A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DES90205A DE1216455B (de) | 1964-03-25 | 1964-03-25 | Verfahren zum Ausrichten der Feldachse eines elektronenoptischen Linsen, insbesondere in einem Elektronenmikroskop zugeordneten Stigmators und Anordnung zur Durchfuehrung des Verfahrens |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL6503733A true NL6503733A (xx) | 1965-09-27 |
Family
ID=7515637
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6503733A NL6503733A (xx) | 1964-03-25 | 1965-03-24 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3444427A (xx) |
| DE (1) | DE1216455B (xx) |
| GB (1) | GB1095917A (xx) |
| NL (1) | NL6503733A (xx) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1325540A (en) * | 1969-10-10 | 1973-08-01 | Texas Instruments Ltd | Electron beam apparatus |
| US6864493B2 (en) * | 2001-05-30 | 2005-03-08 | Hitachi, Ltd. | Charged particle beam alignment method and charged particle beam apparatus |
| US9455115B2 (en) | 2014-12-17 | 2016-09-27 | Carl Zeiss Microscopy Gmbh | Method of adjusting a stigmator in a particle beam apparatus and a Particle beam system |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR944238A (fr) * | 1947-03-13 | 1949-03-30 | Csf | Méthode de correction des optiques électroniques |
| BE481554A (xx) * | 1947-06-26 | |||
| NL192009A (xx) * | 1953-11-02 | |||
| NL96667C (xx) * | 1957-01-03 | |||
| NL242894A (xx) * | 1958-09-06 |
-
1964
- 1964-03-25 DE DES90205A patent/DE1216455B/de active Pending
-
1965
- 1965-02-18 GB GB6982/65A patent/GB1095917A/en not_active Expired
- 1965-03-24 NL NL6503733A patent/NL6503733A/xx unknown
- 1965-03-24 US US442389A patent/US3444427A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| GB1095917A (en) | 1967-12-20 |
| DE1216455B (de) | 1966-05-12 |
| US3444427A (en) | 1969-05-13 |