NL301413A - - Google Patents
Info
- Publication number
- NL301413A NL301413A NL301413DA NL301413A NL 301413 A NL301413 A NL 301413A NL 301413D A NL301413D A NL 301413DA NL 301413 A NL301413 A NL 301413A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D3/00—Control of position or direction
- G05D3/12—Control of position or direction using feedback
- G05D3/14—Control of position or direction using feedback using an analogue comparing device
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Control Of Position Or Direction (AREA)
- Projection-Type Copiers In General (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL301413 | 1963-12-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL301413A true NL301413A (xx) |
Family
ID=19755272
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL301413D NL301413A (xx) | 1963-12-05 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3354806A (xx) |
| DE (1) | DE1235725B (xx) |
| GB (1) | GB1095703A (xx) |
| NL (1) | NL301413A (xx) |
| SE (1) | SE335055B (xx) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3541338A (en) * | 1967-01-12 | 1970-11-17 | Ibm | Positioning system |
| US3639059A (en) * | 1969-02-10 | 1972-02-01 | Matrographics Inc | Graphic-processing apparatus |
| US4445776A (en) * | 1980-09-29 | 1984-05-01 | High resistration photomask machine and computerized numerical control system | |
| US3903536A (en) * | 1973-11-19 | 1975-09-02 | Gerhard Westerberg | Device for generating masks for microcircuits |
| DE2905636C2 (de) * | 1979-02-14 | 1985-06-20 | Censor Patent- Und Versuchs-Anstalt, Vaduz | Verfahren zum Kopieren von Masken auf ein Werkstück |
| US4346987A (en) * | 1980-07-18 | 1982-08-31 | Xerox Corporation | Printed circuit board projection imaging system |
| JP4579376B2 (ja) * | 2000-06-19 | 2010-11-10 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1208407A (fr) * | 1958-06-10 | 1960-02-23 | Victor Bouzard Et Ses Fils | Dispositif de commande automatique pour machines à copier photomécaniques, en particulier pour l'offset |
| GB1048048A (en) * | 1962-11-20 | 1966-11-09 | Rank Organisation Ltd | Improvements in or relating to data processing apparatus |
-
0
- NL NL301413D patent/NL301413A/xx unknown
-
1964
- 1964-11-27 US US414095A patent/US3354806A/en not_active Expired - Lifetime
- 1964-12-02 GB GB48996/64A patent/GB1095703A/en not_active Expired
- 1964-12-02 SE SE14567/64A patent/SE335055B/xx unknown
- 1964-12-02 DE DEN25910A patent/DE1235725B/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US3354806A (en) | 1967-11-28 |
| DE1235725B (de) | 1967-03-02 |
| GB1095703A (en) | 1967-12-20 |
| SE335055B (xx) | 1971-05-10 |