NL298098A - - Google Patents
Info
- Publication number
- NL298098A NL298098A NL298098DA NL298098A NL 298098 A NL298098 A NL 298098A NL 298098D A NL298098D A NL 298098DA NL 298098 A NL298098 A NL 298098A
- Authority
- NL
- Netherlands
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/0029—Processes of manufacture
- H01G9/0032—Processes of manufacture formation of the dielectric layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
- C23C8/10—Oxidising
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
- H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US22510062A | 1962-09-20 | 1962-09-20 | |
US654009A US3394066A (en) | 1962-09-20 | 1967-07-17 | Method of anodizing by applying a positive potential to a body immersed in a plasma |
Publications (1)
Publication Number | Publication Date |
---|---|
NL298098A true NL298098A (en) |
Family
ID=26919299
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL298098D NL298098A (en) | 1962-09-20 |
Country Status (3)
Country | Link |
---|---|
US (1) | US3394066A (en) |
GB (1) | GB1052029A (en) |
NL (1) | NL298098A (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3436327A (en) * | 1966-07-18 | 1969-04-01 | Collins Radio Co | Selective sputtering rate circuit forming process |
US3673071A (en) * | 1968-08-08 | 1972-06-27 | Texas Instruments Inc | Process for preparation of tunneling barriers |
US3658672A (en) * | 1970-12-01 | 1972-04-25 | Rca Corp | Method of detecting the completion of plasma anodization of a metal on a semiconductor body |
US3863074A (en) * | 1972-08-30 | 1975-01-28 | Ibm | Low temperature plasma anodization apparatus |
US3962988A (en) * | 1973-03-05 | 1976-06-15 | Yoichi Murayama, Nippon Electric Varian Ltd. | Ion-plating apparatus having an h.f. electrode for providing an h.f. glow discharge region |
LU69164A1 (en) * | 1974-01-15 | 1974-04-08 | ||
JPS5413979B2 (en) * | 1975-01-23 | 1979-06-04 | ||
US4183781A (en) * | 1978-09-25 | 1980-01-15 | International Business Machines Corporation | Stabilization process for aluminum microcircuits which have been reactive-ion etched |
US4323589A (en) * | 1980-05-07 | 1982-04-06 | International Business Machines Corporation | Plasma oxidation |
FR2648478B1 (en) * | 1989-06-15 | 1993-06-11 | Siderurgie Fse Inst Rech | PROCESS FOR COLORING THE SURFACE OF METAL MATERIALS AND PRODUCTS OBTAINED BY ITS IMPLEMENTATION |
US5785838A (en) * | 1993-02-26 | 1998-07-28 | Nikon Corporation By Hiroyuki Sugimura | Method for producing an oxide film |
US5391281A (en) * | 1993-04-09 | 1995-02-21 | Materials Research Corp. | Plasma shaping plug for control of sputter etching |
FR2741361B3 (en) * | 1995-11-22 | 1998-04-17 | Balzers Hochvakuum | PROCESS FOR THERMOCHEMICAL SURFACE TREATMENT BY IMMERSION IN PLASMA, PLANT FOR THIS PROCESS, USES AND PARTS OBTAINED |
US7557362B2 (en) * | 2004-02-04 | 2009-07-07 | Veeco Instruments Inc. | Ion sources and methods for generating an ion beam with a controllable ion current density distribution |
US8158016B2 (en) * | 2004-02-04 | 2012-04-17 | Veeco Instruments, Inc. | Methods of operating an electromagnet of an ion source |
US10077717B2 (en) | 2014-10-01 | 2018-09-18 | Rolls-Royce Corporation | Corrosion and abrasion resistant coating |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2346483A (en) * | 1942-08-07 | 1944-04-11 | Gen Electric | Chargeproof cover glass |
CH291362A (en) * | 1950-08-03 | 1953-06-15 | Berghaus Elektrophysik Anst | Method and device for carrying out technical processes by means of gas discharges, which are connected with a cathodeic material atomization. |
BE526527A (en) * | 1953-02-17 | |||
US3077444A (en) * | 1956-06-13 | 1963-02-12 | Siegfried R Hoh | Laminated magnetic materials and methods |
US3108900A (en) * | 1959-04-13 | 1963-10-29 | Cornelius A Papp | Apparatus and process for producing coatings on metals |
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0
- NL NL298098D patent/NL298098A/xx unknown
- GB GB1052029D patent/GB1052029A/en active Active
-
1967
- 1967-07-17 US US654009A patent/US3394066A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
GB1052029A (en) | |
US3394066A (en) | 1968-07-23 |