|
US3476618A
(en)
*
|
1963-01-18 |
1969-11-04 |
Motorola Inc |
Semiconductor device
|
|
US3345221A
(en)
*
|
1963-04-10 |
1967-10-03 |
Motorola Inc |
Method of making a semiconductor device having improved pn junction avalanche characteristics
|
|
US3328214A
(en)
*
|
1963-04-22 |
1967-06-27 |
Siliconix Inc |
Process for manufacturing horizontal transistor structure
|
|
US3197710A
(en)
*
|
1963-05-31 |
1965-07-27 |
Westinghouse Electric Corp |
Complementary transistor structure
|
|
US3328651A
(en)
*
|
1963-10-29 |
1967-06-27 |
Sylvania Electric Prod |
Semiconductor switching device and method of manufacture
|
|
NL143074B
(nl)
*
|
1963-12-13 |
1974-08-15 |
Philips Nv |
Transistor.
|
|
GB1071294A
(en)
*
|
1963-12-17 |
1967-06-07 |
Mullard Ltd |
Improvements in and relating to the manufacture of transistors
|
|
US3699406A
(en)
*
|
1963-12-26 |
1972-10-17 |
Gen Electric |
Semiconductor gate-controlled pnpn switch
|
|
GB1050805A
(enExample)
*
|
1964-06-23 |
1900-01-01 |
|
|
|
GB1073551A
(en)
*
|
1964-07-02 |
1967-06-28 |
Westinghouse Electric Corp |
Integrated circuit comprising a diode and method of making the same
|
|
US3458367A
(en)
*
|
1964-07-18 |
1969-07-29 |
Fujitsu Ltd |
Method of manufacture of superhigh frequency transistor
|
|
GB1112992A
(en)
*
|
1964-08-18 |
1968-05-08 |
Texas Instruments Inc |
Three-dimensional integrated circuits and methods of making same
|
|
US3381187A
(en)
*
|
1964-08-18 |
1968-04-30 |
Hughes Aircraft Co |
High-frequency field-effect triode device
|
|
US3379584A
(en)
*
|
1964-09-04 |
1968-04-23 |
Texas Instruments Inc |
Semiconductor wafer with at least one epitaxial layer and methods of making same
|
|
US3384791A
(en)
*
|
1964-09-10 |
1968-05-21 |
Nippon Electric Co |
High frequency semiconductor diode
|
|
US3381182A
(en)
*
|
1964-10-19 |
1968-04-30 |
Philco Ford Corp |
Microcircuits having buried conductive layers
|
|
GB1086128A
(en)
*
|
1964-10-23 |
1967-10-04 |
Motorola Inc |
Fabrication of four-layer switch with controlled breakdown voltage
|
|
US3337751A
(en)
*
|
1965-01-29 |
1967-08-22 |
Melvin H Poston |
Integrated circuitry including scr and field-effect structure
|
|
US3386865A
(en)
*
|
1965-05-10 |
1968-06-04 |
Ibm |
Process of making planar semiconductor devices isolated by encapsulating oxide filled channels
|
|
US3426254A
(en)
*
|
1965-06-21 |
1969-02-04 |
Sprague Electric Co |
Transistors and method of manufacturing the same
|
|
US3428870A
(en)
*
|
1965-07-29 |
1969-02-18 |
Gen Electric |
Semiconductor devices
|
|
US3412295A
(en)
*
|
1965-10-19 |
1968-11-19 |
Sprague Electric Co |
Monolithic structure with three-region complementary transistors
|
|
US3425879A
(en)
*
|
1965-10-24 |
1969-02-04 |
Texas Instruments Inc |
Method of making shaped epitaxial deposits
|
|
US3430110A
(en)
*
|
1965-12-02 |
1969-02-25 |
Rca Corp |
Monolithic integrated circuits with a plurality of isolation zones
|
|
US3404450A
(en)
*
|
1966-01-26 |
1968-10-08 |
Westinghouse Electric Corp |
Method of fabricating an integrated circuit structure including unipolar transistor and bipolar transistor portions
|
|
US3460006A
(en)
*
|
1966-02-28 |
1969-08-05 |
Westinghouse Electric Corp |
Semiconductor integrated circuits with improved isolation
|
|
US3387193A
(en)
*
|
1966-03-24 |
1968-06-04 |
Mallory & Co Inc P R |
Diffused resistor for an integrated circuit
|
|
US3465213A
(en)
*
|
1966-06-20 |
1969-09-02 |
Frances B Hugle |
Self-compensating structure for limiting base drive current in transistors
|
|
US3791882A
(en)
*
|
1966-08-31 |
1974-02-12 |
K Ogiue |
Method of manufacturing semiconductor devices utilizing simultaneous deposition of monocrystalline and polycrystalline regions
|
|
US3481801A
(en)
*
|
1966-10-10 |
1969-12-02 |
Frances Hugle |
Isolation technique for integrated circuits
|
|
US3930909A
(en)
*
|
1966-10-21 |
1976-01-06 |
U.S. Philips Corporation |
Method of manufacturing a semiconductor device utilizing simultaneous outdiffusion during epitaxial growth
|
|
NL145396B
(nl)
*
|
1966-10-21 |
1975-03-17 |
Philips Nv |
Werkwijze ter vervaardiging van een geintegreerde halfgeleiderinrichting en geintegreerde halfgeleiderinrichting, vervaardigd volgens de werkwijze.
|
|
US3479233A
(en)
*
|
1967-01-16 |
1969-11-18 |
Ibm |
Method for simultaneously forming a buried layer and surface connection in semiconductor devices
|
|
US3524113A
(en)
*
|
1967-06-15 |
1970-08-11 |
Ibm |
Complementary pnp-npn transistors and fabrication method therefor
|
|
US3483446A
(en)
*
|
1967-06-15 |
1969-12-09 |
Westinghouse Electric Corp |
Semiconductor integrated circuit including a bidirectional transistor and method of making the same
|
|
US3582724A
(en)
*
|
1967-09-22 |
1971-06-01 |
Sanyo Electric Co |
Transistor having concave collector contact and method of making same
|
|
US3517280A
(en)
*
|
1967-10-17 |
1970-06-23 |
Ibm |
Four layer diode device insensitive to rate effect and method of manufacture
|
|
US3510736A
(en)
*
|
1967-11-17 |
1970-05-05 |
Rca Corp |
Integrated circuit planar transistor
|
|
US3502951A
(en)
*
|
1968-01-02 |
1970-03-24 |
Singer Co |
Monolithic complementary semiconductor device
|
|
US3538399A
(en)
*
|
1968-05-15 |
1970-11-03 |
Tektronix Inc |
Pn junction gated field effect transistor having buried layer of low resistivity
|
|
US3770520A
(en)
*
|
1968-06-26 |
1973-11-06 |
Kyodo Denshi Gijutsu Kenkyusho |
Production of semiconductor integrated-circuit devices
|
|
US3569800A
(en)
*
|
1968-09-04 |
1971-03-09 |
Ibm |
Resistively isolated integrated current switch
|
|
US3547716A
(en)
*
|
1968-09-05 |
1970-12-15 |
Ibm |
Isolation in epitaxially grown monolithic devices
|
|
US3544863A
(en)
*
|
1968-10-29 |
1970-12-01 |
Motorola Inc |
Monolithic integrated circuit substructure with epitaxial decoupling capacitance
|
|
US3717515A
(en)
*
|
1969-11-10 |
1973-02-20 |
Ibm |
Process for fabricating a pedestal transistor
|
|
US3734787A
(en)
*
|
1970-01-09 |
1973-05-22 |
Ibm |
Fabrication of diffused junction capacitor by simultaneous outdiffusion
|
|
US3619735A
(en)
*
|
1970-01-26 |
1971-11-09 |
Ibm |
Integrated circuit with buried decoupling capacitor
|
|
FR2080849A6
(enExample)
*
|
1970-02-06 |
1971-11-26 |
Radiotechnique Compelec |
|
|
US3648125A
(en)
*
|
1971-02-02 |
1972-03-07 |
Fairchild Camera Instr Co |
Method of fabricating integrated circuits with oxidized isolation and the resulting structure
|
|
JPS4879585A
(enExample)
*
|
1972-01-24 |
1973-10-25 |
|
|
|
US3969750A
(en)
*
|
1974-02-12 |
1976-07-13 |
International Business Machines Corporation |
Diffused junction capacitor and process for producing the same
|
|
GB1503223A
(en)
*
|
1975-07-26 |
1978-03-08 |
Int Computers Ltd |
Formation of buried layers in a substrate
|
|
US3976512A
(en)
*
|
1975-09-22 |
1976-08-24 |
Signetics Corporation |
Method for reducing the defect density of an integrated circuit utilizing ion implantation
|
|
US4171995A
(en)
*
|
1975-10-20 |
1979-10-23 |
Semiconductor Research Foundation |
Epitaxial deposition process for producing an electrostatic induction type thyristor
|
|
US4571275A
(en)
*
|
1983-12-19 |
1986-02-18 |
International Business Machines Corporation |
Method for minimizing autodoping during epitaxial deposition utilizing a graded pattern subcollector
|
|
US4695868A
(en)
*
|
1985-12-13 |
1987-09-22 |
Rca Corporation |
Patterned metallization for integrated circuits
|
|
GB9013926D0
(en)
*
|
1990-06-22 |
1990-08-15 |
Gen Electric Co Plc |
A vertical pnp transistor
|