NL293315A - - Google Patents

Info

Publication number
NL293315A
NL293315A NL293315DA NL293315A NL 293315 A NL293315 A NL 293315A NL 293315D A NL293315D A NL 293315DA NL 293315 A NL293315 A NL 293315A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL293315A publication Critical patent/NL293315A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/11—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with bag, cage, hose, tube, sleeve or like filtering elements
    • B01D29/13—Supported filter elements
    • B01D29/23—Supported filter elements arranged for outward flow filtration
    • B01D29/25—Supported filter elements arranged for outward flow filtration open-ended the arrival of the mixture to be filtered and the discharge of the concentrated mixture are situated on both opposite sides of the filtering element
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/62—Regenerating the filter material in the filter
    • B01D29/64—Regenerating the filter material in the filter by scrapers, brushes, nozzles, or the like, acting on the cake side of the filtering element
    • B01D29/6469—Regenerating the filter material in the filter by scrapers, brushes, nozzles, or the like, acting on the cake side of the filtering element scrapers
    • B01D29/6476—Regenerating the filter material in the filter by scrapers, brushes, nozzles, or the like, acting on the cake side of the filtering element scrapers with a rotary movement with respect to the filtering element
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/88—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor having feed or discharge devices
    • B01D29/90—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor having feed or discharge devices for feeding
    • B01D29/902—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor having feed or discharge devices for feeding containing fixed liquid displacement elements or cores
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
NL293315D 1962-05-30 NL293315A (OSRAM)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH657262A CH399122A (de) 1962-05-30 1962-05-30 Einrichtung für die Verdampfung von Substanzen im Hochvakuum

Publications (1)

Publication Number Publication Date
NL293315A true NL293315A (OSRAM)

Family

ID=4311700

Family Applications (1)

Application Number Title Priority Date Filing Date
NL293315D NL293315A (OSRAM) 1962-05-30

Country Status (5)

Country Link
US (1) US3274417A (OSRAM)
CH (1) CH399122A (OSRAM)
DE (1) DE1255440B (OSRAM)
GB (1) GB995180A (OSRAM)
NL (1) NL293315A (OSRAM)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3730962A (en) * 1971-08-24 1973-05-01 Airco Inc Electron beam furance with material-evaporant equilibrium control
DE3276333D1 (en) * 1982-10-28 1987-06-19 Ibm Method and apparatus for vacuum evaporation coating using an electron gun
CN102373420A (zh) * 2010-08-24 2012-03-14 鸿富锦精密工业(深圳)有限公司 坩埚及具有该坩埚的蒸镀设备
TWI477623B (zh) * 2010-08-24 2015-03-21 Hon Hai Prec Ind Co Ltd 坩堝及具有該坩堝的蒸鍍設備

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3040112A (en) * 1960-06-03 1962-06-19 Stauffer Chemical Co Electron-beam furnace with beam emission suppressors
BE627166A (OSRAM) * 1962-01-15
US3202794A (en) * 1963-02-18 1965-08-24 Thermionics Lab Inc Permanent magnet transverse electron beam evaporation source

Also Published As

Publication number Publication date
US3274417A (en) 1966-09-20
DE1255440B (de) 1967-11-30
CH399122A (de) 1966-03-31
GB995180A (en) 1965-06-16

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