NL272474A - - Google Patents

Info

Publication number
NL272474A
NL272474A NL272474DA NL272474A NL 272474 A NL272474 A NL 272474A NL 272474D A NL272474D A NL 272474DA NL 272474 A NL272474 A NL 272474A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of NL272474A publication Critical patent/NL272474A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL272474D 1960-12-13 NL272474A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US75566A US3228768A (en) 1960-12-13 1960-12-13 Process of diffusion printing and a structure for use therein

Publications (1)

Publication Number Publication Date
NL272474A true NL272474A (ja) 1900-01-01

Family

ID=22126593

Family Applications (1)

Application Number Title Priority Date Filing Date
NL272474D NL272474A (ja) 1960-12-13

Country Status (4)

Country Link
US (1) US3228768A (ja)
CH (1) CH426490A (ja)
GB (1) GB932026A (ja)
NL (1) NL272474A (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3323917A (en) * 1963-03-07 1967-06-06 Gen Aniline & Film Corp Photomechanical bleachout color process
DE1472771A1 (de) * 1965-07-30 1969-01-02 Adox Du Pont Fotowerke Verfahren zur Herstellung von masshaltigen photographischen Filmen
US4550069A (en) * 1984-06-11 1985-10-29 American Hoechst Corporation Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US5143814A (en) * 1984-06-11 1992-09-01 Hoechst Celanese Corporation Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate
US4983490A (en) * 1985-10-28 1991-01-08 Hoechst Celanese Corporation Photoresist treating composition consisting of a mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
US4948697A (en) * 1985-10-28 1990-08-14 Hoechst Celanese Corporation Positive photoresist with a solvent mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
US4692398A (en) * 1985-10-28 1987-09-08 American Hoechst Corporation Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate
US5039594A (en) * 1985-10-28 1991-08-13 Hoechst Celanese Corporation Positive photoresist containing a mixture of propylene glycol alkyl ethers and propylene glycol alkyl ether acetate
US4806458A (en) * 1985-10-28 1989-02-21 Hoechst Celanese Corporation Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate
NL1004757C2 (nl) * 1996-12-12 1998-06-15 Av Flexologic Bv Systeem en werkwijze voor het verschaffen van fotodrukplaten en dergelijke.

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US428472A (en) * 1890-05-20 Photo-mechanical printing-plate
US2702243A (en) * 1950-06-17 1955-02-15 Azoplate Corp Light-sensitive photographic element and process of producing printing plates
US2772971A (en) * 1951-01-19 1956-12-04 Gen Aniline & Film Corp Production of subtractively colored photographic material
NL76744C (ja) * 1951-09-19
NL242367A (ja) * 1953-02-18
NL94867C (ja) * 1955-02-25
US2996381A (en) * 1957-07-02 1961-08-15 Kalvar Corp Photographic materials and procedures for using same

Also Published As

Publication number Publication date
CH426490A (de) 1966-12-15
GB932026A (en) 1963-07-24
US3228768A (en) 1966-01-11

Similar Documents

Publication Publication Date Title
AT13735B (ja)
FR408415A (ja)
AT4957B (ja)
DE6750622U (ja)
AT12077B (ja)
AT10960B (ja)
AT12934B (ja)
AT13914B (ja)
AT12294B (ja)
AT11379B (ja)
AT11552B (ja)
AT12326B (ja)
AT12472B (ja)
AT12485B (ja)
AT11398B (ja)
AT11407B (ja)
AT12486B (ja)
AT11473B (ja)
AT11476B (ja)
AT11502B (ja)
AT11522B (ja)
IT380973B (ja)
AT12513B (ja)
AT12595B (ja)
AT6289B (ja)