|
NL255348A
(OSRAM)
*
|
1959-08-29 |
|
|
|
|
NL255517A
(OSRAM)
*
|
1959-09-04 |
|
|
|
|
US3149972A
(en)
*
|
1960-08-16 |
1964-09-22 |
Gen Aniline & Film Corp |
Diazo and resinous coupler printing plates for photomechanical reproduction
|
|
NL132291C
(OSRAM)
*
|
1961-01-25 |
|
|
|
|
BE620660A
(OSRAM)
*
|
1961-07-28 |
|
|
|
|
BE795755A
(fr)
*
|
1972-02-24 |
1973-08-21 |
Kalle Ag |
Procede de fabrication de formes d'impression offset
|
|
DE2331377C2
(de)
*
|
1973-06-20 |
1982-10-14 |
Hoechst Ag, 6000 Frankfurt |
Lichtempfindliches Kopiermaterial
|
|
US4189320A
(en)
*
|
1975-04-29 |
1980-02-19 |
American Hoechst Corporation |
Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures
|
|
US4174222A
(en)
*
|
1975-05-24 |
1979-11-13 |
Tokyo Ohka Kogyo Kabushiki Kaisha |
Positive-type O-quinone diazide containing photoresist compositions
|
|
DE2547905C2
(de)
*
|
1975-10-25 |
1985-11-21 |
Hoechst Ag, 6230 Frankfurt |
Lichtempfindliches Aufzeichnungsmaterial
|
|
IT1169682B
(it)
*
|
1983-11-08 |
1987-06-03 |
I M G Ind Materiali Grafici Sp |
Composizione per fotoriproduzioni
|
|
DE3635303A1
(de)
|
1986-10-17 |
1988-04-28 |
Hoechst Ag |
Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten
|
|
DE3718416A1
(de)
*
|
1987-06-02 |
1988-12-15 |
Hoechst Ag |
Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung
|
|
DE3729035A1
(de)
*
|
1987-08-31 |
1989-03-09 |
Hoechst Ag |
Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial
|
|
US4853315A
(en)
*
|
1988-01-15 |
1989-08-01 |
International Business Machines Corporation |
O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists
|
|
EP0410606B1
(en)
|
1989-07-12 |
1996-11-13 |
Fuji Photo Film Co., Ltd. |
Siloxane polymers and positive working light-sensitive compositions comprising the same
|
|
US5273856A
(en)
*
|
1990-10-31 |
1993-12-28 |
International Business Machines Corporation |
Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation
|
|
GB9326150D0
(en)
*
|
1993-12-22 |
1994-02-23 |
Alcan Int Ltd |
Electrochemical roughening method
|
|
JPH0876380A
(ja)
|
1994-09-06 |
1996-03-22 |
Fuji Photo Film Co Ltd |
ポジ型印刷版組成物
|
|
JP3278306B2
(ja)
|
1994-10-31 |
2002-04-30 |
富士写真フイルム株式会社 |
ポジ型フォトレジスト組成物
|
|
WO1997039894A1
(en)
|
1996-04-23 |
1997-10-30 |
Horsell Graphic Industries Limited |
Heat-sensitive composition and method of making a lithographic printing form with it
|
|
US6117610A
(en)
*
|
1997-08-08 |
2000-09-12 |
Kodak Polychrome Graphics Llc |
Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
|
|
GB9622657D0
(en)
|
1996-10-31 |
1997-01-08 |
Horsell Graphic Ind Ltd |
Direct positive lithographic plate
|
|
US6063544A
(en)
*
|
1997-03-21 |
2000-05-16 |
Kodak Polychrome Graphics Llc |
Positive-working printing plate and method of providing a positive image therefrom using laser imaging
|
|
US6090532A
(en)
*
|
1997-03-21 |
2000-07-18 |
Kodak Polychrome Graphics Llc |
Positive-working infrared radiation sensitive composition and printing plate and imaging method
|
|
WO1999001796A2
(en)
|
1997-07-05 |
1999-01-14 |
Kodak Polychrome Graphics Llc |
Pattern-forming methods
|
|
US6060217A
(en)
*
|
1997-09-02 |
2000-05-09 |
Kodak Polychrome Graphics Llc |
Thermal lithographic printing plates
|
|
US6045963A
(en)
*
|
1998-03-17 |
2000-04-04 |
Kodak Polychrome Graphics Llc |
Negative-working dry planographic printing plate
|
|
US6296982B1
(en)
|
1999-11-19 |
2001-10-02 |
Kodak Polychrome Graphics Llc |
Imaging articles
|