NL239786A - - Google Patents
Info
- Publication number
- NL239786A NL239786A NL239786DA NL239786A NL 239786 A NL239786 A NL 239786A NL 239786D A NL239786D A NL 239786DA NL 239786 A NL239786 A NL 239786A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H10P14/3411—
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
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- H10P14/22—
-
- H10P95/00—
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL1276208X | 1959-06-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL239786A true NL239786A (en:Method) |
Family
ID=19872811
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL239786D NL239786A (en:Method) | 1959-06-02 | ||
| NL110479D NL110479C (en:Method) | 1959-06-02 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL110479D NL110479C (en:Method) | 1959-06-02 |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE1276208B (en:Method) |
| NL (2) | NL110479C (en:Method) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE764927C (de) * | 1939-02-22 | 1951-08-06 | Bosch Gmbh Robert | Verfahren zur Verdampfung im Vakuum |
| DE860973C (de) * | 1944-08-21 | 1952-12-29 | Siemens Ag | Detektor |
| DE896827C (de) * | 1951-09-08 | 1953-11-16 | Licentia Gmbh | Verfahren zur formgebenden Bearbeitung von kristallenen Halbleiterkoerpern |
| DE1011528B (de) * | 1954-05-17 | 1957-07-04 | Licentia Gmbh | Verfahren zur Oberflaechenbehandlung eines Kristalles aus einer halbleitenden Verbindung |
| DE1030463B (de) * | 1954-07-31 | 1958-05-22 | Licentia Gmbh | Verfahren zur Herstellung von Halbleiterkristallen mit p-n-UEbergaengen |
-
0
- NL NL239786D patent/NL239786A/xx unknown
- NL NL110479D patent/NL110479C/xx active
-
1960
- 1960-05-30 DE DEN18423A patent/DE1276208B/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE1276208B (de) | 1968-08-29 |
| NL110479C (en:Method) |