NL204620A - - Google Patents
Info
- Publication number
- NL204620A NL204620A NL204620DA NL204620A NL 204620 A NL204620 A NL 204620A NL 204620D A NL204620D A NL 204620DA NL 204620 A NL204620 A NL 204620A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0223—Iminoquinonediazides; Para-quinonediazides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B35/00—Disazo and polyazo dyes of the type A<-D->B prepared by diazotising and coupling
- C09B35/02—Disazo dyes
- C09B35/039—Disazo dyes characterised by the tetrazo component
- C09B35/08—Disazo dyes characterised by the tetrazo component the tetrazo component being a derivative of biphenyl
- C09B35/10—Disazo dyes characterised by the tetrazo component the tetrazo component being a derivative of biphenyl from two coupling components of the same type
- C09B35/16—Disazo dyes characterised by the tetrazo component the tetrazo component being a derivative of biphenyl from two coupling components of the same type from hydroxy-amines
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK25006A DE1003576B (de) | 1955-02-25 | 1955-02-25 | Aus Schichttraeger und lichtempfindlicher, wasserloeslicher oder wasserquellbarer Kolloidschicht bestehendes Material fuer die Herstellung von Gerbbildern |
| US56609356A | 1956-02-17 | 1956-02-17 | |
| US725803A US2994608A (en) | 1955-02-25 | 1958-04-02 | Reproduction material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL204620A true NL204620A (pl) |
Family
ID=32397430
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL204620D NL204620A (pl) | 1955-02-25 | ||
| NL94867D NL94867C (pl) | 1955-02-25 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL94867D NL94867C (pl) | 1955-02-25 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US2995442A (pl) |
| FR (1) | FR1147132A (pl) |
| GB (1) | GB788975A (pl) |
| NL (2) | NL94867C (pl) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL103895C (pl) * | 1957-08-01 | |||
| NL130926C (pl) * | 1959-09-04 | |||
| BE598570A (pl) * | 1959-12-30 | |||
| NL272474A (pl) * | 1960-12-13 | 1900-01-01 | ||
| NL280959A (pl) * | 1961-07-28 | |||
| JPS5025332B1 (pl) * | 1967-02-22 | 1975-08-22 | ||
| US3868254A (en) * | 1972-11-29 | 1975-02-25 | Gaf Corp | Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants |
| JPS5555344A (en) * | 1978-10-20 | 1980-04-23 | Toray Ind Inc | Lithographic printing plate |
| DE3222684A1 (de) * | 1981-06-19 | 1983-05-05 | Sericol Group Ltd., London | Lichtempfindliche zubereitung und deren verwendung |
| US5554481A (en) * | 1993-09-20 | 1996-09-10 | Fuji Photo Film Co., Ltd. | Positive working photoresist composition |
| CN116333711B (zh) * | 2023-05-30 | 2023-08-11 | 新疆科力新技术发展股份有限公司 | 降凝剂及其制备方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE706028C (de) * | 1937-10-10 | 1941-05-16 | Staehle Komm Ges G | Vorrichtung zum Herstellen von Schachtelteilen mit Bodenpraegung aus Platten von Polymerisierten Vinylabkoemmlingen |
| NL80569C (pl) * | 1949-07-23 | |||
| US2754209A (en) * | 1952-06-10 | 1956-07-10 | Azoplate Corp | Light-sensitive para quinone diazides for making printing plates |
-
0
- NL NL204620D patent/NL204620A/xx unknown
- NL NL94867D patent/NL94867C/xx active
-
1956
- 1956-02-17 GB GB5075/56A patent/GB788975A/en not_active Expired
- 1956-02-25 FR FR1147132D patent/FR1147132A/fr not_active Expired
-
1958
- 1958-04-02 US US725801A patent/US2995442A/en not_active Expired - Lifetime
- 1958-04-02 US US725803A patent/US2994608A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| GB788975A (en) | 1958-01-08 |
| NL94867C (pl) | |
| FR1147132A (fr) | 1957-11-19 |
| US2995442A (en) | 1961-08-08 |
| US2994608A (en) | 1961-08-01 |