NL2034667A - Computer-implemented method based on fast mask near-field calculation by using cycle-consistent adversarial network - Google Patents
Computer-implemented method based on fast mask near-field calculation by using cycle-consistent adversarial network Download PDFInfo
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- NL2034667A NL2034667A NL2034667A NL2034667A NL2034667A NL 2034667 A NL2034667 A NL 2034667A NL 2034667 A NL2034667 A NL 2034667A NL 2034667 A NL2034667 A NL 2034667A NL 2034667 A NL2034667 A NL 2034667A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
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- G06F17/15—Correlation function computation including computation of convolution operations
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- G06N3/00—Computing arrangements based on biological models
- G06N3/02—Neural networks
- G06N3/04—Architecture, e.g. interconnection topology
- G06N3/045—Combinations of networks
- G06N3/0455—Auto-encoder networks; Encoder-decoder networks
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- G06N3/0464—Convolutional networks [CNN, ConvNet]
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- G06N3/08—Learning methods
- G06N3/094—Adversarial learning
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- G—PHYSICS
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- G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
- G06N3/00—Computing arrangements based on biological models
- G06N3/02—Neural networks
- G06N3/04—Architecture, e.g. interconnection topology
- G06N3/048—Activation functions
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- Life Sciences & Earth Sciences (AREA)
- Artificial Intelligence (AREA)
- Mathematical Analysis (AREA)
- Mathematical Optimization (AREA)
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Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210610711.5A CN115047721A (zh) | 2022-05-31 | 2022-05-31 | 一种使用循环一致对抗网络快速计算掩模近场的方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL2034667A true NL2034667A (en) | 2023-12-07 |
Family
ID=83160319
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2034667A NL2034667A (en) | 2022-05-31 | 2023-04-24 | Computer-implemented method based on fast mask near-field calculation by using cycle-consistent adversarial network |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN115047721A (zh) |
| NL (1) | NL2034667A (zh) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111401138B (zh) * | 2020-02-24 | 2023-11-07 | 上海理工大学 | 生成对抗神经网络训练过程的对抗优化方法 |
| CN111738908B (zh) * | 2020-06-11 | 2023-04-07 | 山东大学 | 结合实例分割和循环生成对抗网络的场景转换方法及系统 |
| CN112309112B (zh) * | 2020-09-10 | 2021-10-29 | 浙江工业大学 | 一种基于GraphSAGE-GAN的交通路网数据修复方法 |
| CN113870128A (zh) * | 2021-09-08 | 2021-12-31 | 武汉大学 | 一种基于深度卷积对抗式网络的数字壁画图像修复方法 |
-
2022
- 2022-05-31 CN CN202210610711.5A patent/CN115047721A/zh active Pending
-
2023
- 2023-04-24 NL NL2034667A patent/NL2034667A/en unknown
Non-Patent Citations (1)
| Title |
|---|
| YUAN PENGPENG ET AL: "Rigorous EUV absorber model for the mask modeling with deep learning techniques", JOURNAL OF MICRO/NANOPATTERNING, MATERIALS, AND METROLOGY, vol. 20, no. 4, 3 November 2021 (2021-11-03), pages 041207-1, XP060149681, ISSN: 1932-5150, [retrieved on 20211103], DOI: 10.1117/1.JMM.20.4.041207 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN115047721A (zh) | 2022-09-13 |
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