NL2030028B1

NL2030028B1 - Laser marking system

Info

Publication number: NL2030028B1
Application number: NL2030028A
Authority: NL
Inventors: Joseph Boerkamp Martijn
Original assignee: Inphocal B V
Priority date: 2021-12-03
Filing date: 2021-12-03
Publication date: 2023-06-20
Also published as: WO2023101553A1

Abstract

Disclosed is a laser marking system for marking an object, comprising a laser source, an optical system, and a targeting system. The laser source configured to generate a laser beam. The 5 optical system comprises a first optical element and a second optical element. The first optical element is configured to receive the laser beam. The laser source and the optical system are configured to have the laser beam illuminate a predetermined illumination area of the first optical element. The first optical element is shaped to introduce spherical aberrations in the received laser beam, resulting in an intermediate beam produced by the first optical element. The second optical 10 element is arranged at a predetermined distance from the first optical element and configured to receive the intermediate beam. The second optical element is shaped to introduce further spherical aberrations in the received intermediate beam, resulting in the generation of an essentially non- diffractive beam. The essentially non-diffractive beam converges along an optical axis of the diffractive beam to produce a central focus volume extending over a working range along the 15 optical axis, in which at any position along the optical axis, within the working range, the central focus volume contains at least half of the total power of the non-diffractive beam. The targeting system is configured to apply a marking on a target surface of the object by positioning the target surface of the object in the central focus volume of the essentially non-diffractive beam. 20 [Fig. 1]

Description

LASER MARKING SYSTEM

The present application concerns a laser marking system. Laser marking systems known from the art comprise a laser source and an optical system configured to generate a laser beam suitable for the marking a target surface.

Lasers are used because they can illuminate relatively small, well-defined areas of a target surface with a relatively high power (wherein power can be expressed in Watt) or, alternatively said, a relatively high-power density (wherein power density can be expressed in W/m?). In the context of the present disclosure optical power per unit area is also referred to as the power density and the optical power in a three-dimensional volume is referred to as the volumetric power density, which may be expressed in W/m.

Additionally, the area of the target surface illuminated by the laser beam can be changed rapidly by, for example, deflecting the laser beam, and whether the target surface is illaminated at all can also be changed rapidly, for example by turning off the laser source or deflecting the laser beam in a different direction entirely.

This type of laser marking is typically achieved by providing a laser source configured to emit a laser beam (i.e. a beam of coherent light), and a positive lens configured to focus this laser beam onto a target. The laser beam is emitted along an optical axis, towards the lens. After traveling through the lens, the laser beam converges towards the focal point of said lens. It is at this focal point that the area of the target surface illuminated by the laser beam is the smallest and has the largest power density. As the point on the optical axis at which this focal point will occur (once the laser beam is emitted, that is) the target surface is pre-emptively arranged such that it coincides with this focal point and/or this point on the optical axis. When the target surface were to be positioned farther away from, or closer to the lens than the focal point, the illuminated area increases, and the power density decreases rapidly.

When using such systems, the target surface is required to be kept within approximately +/- 1 mm of the focal point to ensure it is indeed illuminated with approximately this desired power density. That is, there is a range of positions along the optical axis on which the target surface can be arranged such that it is illuminated with a sufficiently small area and with the desired power density. This range is also called the working range and the length of the working range is also called the focus depth. In this particular example, the focus depth equals twice the aforementioned margin of error, i.e. equals +/-2 mm. In many applications such a small focus depth is considered extremely inconvenient, if not unacceptably small.

Similarly, there is a range of positions defined by offsets perpendicular to the optical axis on which the target surface can be arranged, at which the laser beam, when deflected towards the target surface, can still accurately illuminate the target surface. This range of positions is also referred to as the scan field. The skilled person will be aware of that extend of this scan field depends on the aforementioned focus depth. Since the focus depth of systems known in the art is limited, these systems are often provided with further optical elements in an effort to increase the scan field, making the systems much more complex.

When such laser marking systems are used to illuminate (at least part of) the target surface, the targets in question may be arranged in varying positions, or the targets may vary in shape and/or size. These differences between targets may result in the position of the target surface being, when considered along the optical axis, outside of the margin of error and outside of the range of positions in which the laser beam is in focus.

It is an object to provide a laser marking system suitable for marking targets having varying shapes, and sizes, and which are placed at various positions.

It is a further object to provide a laser marking system providing high quality markings in a more efficient, fast and/or reliable manner.

At least one of these or other objects may at least partially be achieved in a laser marking system for marking a surface of an object, comprising: - a laser source configured to generate a laser beam; - an optical system comprising - a first optical element configured to receive the laser beam, wherein the laser source and the optical system are configured to have the laser beam illuminate a predetermined illumination area of the first optical element, wherein the first optical element is shaped to introduce spherical aberrations in the received laser beam, resulting in an intermediate beam produced by the first optical element; - a second optical element arranged at a predetermined distance from the first optical element and configured to receive the intermediate beam, wherein the second optical element is shaped to introduce further spherical aberrations in the received intermediate beam, resulting in the generation of an essentially non-diffractive beam, wherein the essentially non-diffractive beam converges along an optical axis of the diffractive beam to produce a central focus volume extending over a working range along the optical axis, in which at any position along the optical axis, within the working range, the central focus volume contains at least half of the total power of the non- diffractive beam; and - a targeting system configured to apply a marking on a target surface of the object by positioning the target surface of the object in the central focus volume of the essentially non- diffractive beam.

In some embodiments the optical system is configured to introduce spherical aberrations in the laser beam causing the essentially non-diffractive beam to show a concentric ring pattern in the central focus volume. The concentric ring pattern may vary over the working range along the optical axis

In some embodiments, the central focus volume at least partially coincides with the target surface. In some embodiments, and/or wherein at least one of the non-diffractive beam and target surface is moving during the application of the marking on the target surface.

In a preferred embodiment, the laser source defines a first optical axis and is further configured to emit the laser beam along the first optical axis, and wherein the optical axis defined by the optical system is a second optical axis, the first and second optical axes optionally being mutually aligned. When the first and second optical axis coincide in this manner, the laser is shaped efficiently (i.e. with relatively little stray light).

In a preferred embodiment, the central focus volume is determined by the interference pattern produced in the laser beam exiting the second lens and/or wherein the optical system is configured to generate an interference pattern in the central focus volume so that the concentric laser beam maintains an essentially constant intensity as it propagates.

The first and second optical elements may be implemented in numerous ways. The second optical element may be implemented as a positive lens or a concave mirror.

In some of these embodiments the first optical element is implemented as a positive lens or a concave mirror. In this case, the distance between the first optical element and the second optical element is preferably larger than the sum of the focus length of the first optical element and the focus length of the second optical element.

Alternatively, the first optical element is implemented as a negative lens or a convex mirror.

In this case, the distance between the first optical element and the second optical element is preferably smaller than the difference between the focus length of the first optical element and the focus length of the second optical element.

The distance between the first and second optical element may be defined in a number of ways. Preferably, the distance is defined as a distance between an optical centre of the first optical element and an optical centre of the second optical element. This definition does not directly depend on the practical size and/or shape of the optical element and therefore makes it easier to exchange optical elements without changing the first distance.

In a preferred embodiment, the system further comprises at least one actuator for controlling the distance, preferably by displacing at least one of the first optical element and the second optical clement along the optical axis. In such embodiments, the laser beam preferably exits the optical system via an exit surface of the second optical element and the at least one actuator is preferably configured to displace the first optical element along the optical axis. This ensures that the distance between (the last element of) the optical system and the working range and/or interference pattern stays the same when varying the distance between the first and second optical elements.

In a preferred embodiment, the system further comprises a control unit configured to control the illumination area, the control unit preferably being arranged in front of the first optical element.

The control unit preferably comprises a configurable aperture. Such an aperture may change the size of the illuminated area while maintaining the local power density with which the optical element is illuminated. The control anit may additionally and alternatively comprise a configurable beam expander. Such a beam expander may change the size of the illuminated area while maintaining the total power with which the optical element is illuminated.

In a preferred embodiment, the laser source is configured to generate a collimated laser beam.

In some embodiments, a central spot may be defined as, for any position on the optical axis beyond the optical system, a projection of the concentric laser beam on a plane perpendicular to the optical axis, wherein the central spot preferably has an approximately circular shape. The centre of the central spot preferably approximately coincides with the optical axis and a radius Rs of the central spot may be 1 millimetre or less, preferably 200 micrometre or less, more preferably 100 micrometre or less, even more preferably 50 micrometre or less.

The percentage of the total power of the laser beam contained in the central spot may be equal to the power of the laser beam in the area of the central spot divided by the total power of the laser beam passing through the plane in which the central spot is defined. In preferred embodiments, the substantial percentage of the total power of the laser beam is 60%, preferably 75%, and more preferably 90%.

To avoid damaging optical elements outside of the working range, in preferred embodiments of the laser marking system, in front of and/or beyond the working range, the central spot of the concentric laser beam contains less than the substantial percentage of the total power of the laser beam.

In preferred embodiments, the length of the working range, along the optical axis, is 1 centimetre or more, preferably 5 centimetre or more, more preferably 10 centimetre or more.

Additionally and/or alternatively, a distance from the optical system to a start of the working range, along the optical axis, may be 15 centimetre or more, preferably 25 centimetre or more, more preferably 50 centimetre or more.

To be able to effectively use the central focus volume, it may be preferred that the translator is arranged in between the optical system and the central focus volume.

Laser marking systems are preferably configured for marking a surface of an object that is arranged on the optical axis, farther from the optical system than a starting point of the working range, but closer to the optical system than an end point of the working range.

Further details and advantages of the present disclosure will become apparent from the following description of a few exemplifying examples of an optical system. Reference is made to the attached figures, wherein like reference numerals refer to the like elements throughout and in which: 5 figure 1 schematically shows an embodiment of an optical system that may be comprised by a laser marking system according to the invention; figure 2 schematically shows a further embodiment of the optical system); figures 3 and 4 show parts of embodiments of laser marking systems in which the illamination fraction is adaptable; figures 5a and 5b show parts of embodiments of laser marking systems; figure 6 shows transversal aberrations resulting from the laser beam passing through an exemplary embodiment; figares 7A and 7B show schematic representations of further embodiments of laser marking systems according to the invention; figures 8A and 8B show perspective views of further embodiments of laser marking systems according to the invention; figure 9 show a cross-section of the interference pattern that occurs in the laser beam after the laser beam has exited an optical system comprised by a laser marking system according to the invention; figures 10a-d each show other cross-sections of the interference pattern shown in figure 10; figare 11 shows the percentage of power encircled by the central spot along the optical axis for various radii of the central spot; figure 12 shows the percentage of power encircled by the central spot along the optical axis for various illumination areas: figure 13 shows the percentage of power encircled by the central spot along the optical axis for various inter-lens distances D1; figure 14 shows the graphs of figure 13, realigned in the direction of the x-axis such that their maximum values coincide; figure 15 shows a comparison between an interference pattern provided by a laser marking system according to the invention and a laser beam provided by a system known from the art.

It is noted that, as used herein and in the appended claims, the singular forms “a”, “an”, and “the” include plural referents unless the context clearly dictates otherwise. It is further noted that the claims may be drafted to exclude any optional element. As such, this statement is intended to serve as antecedent basis for use of such exclusive terminology as “solely,” “only” and the like in connection with the recitation of claim elements, or use of a “negative™ limitation. Furthermore, where a range of values is provided, it is understood that each intervening value, to the tenth of the unit of the lower limit unless the context clearly dictates otherwise, between the upper and lower limit of that range and any other stated or intervening value in that stated range, is encompassed within the invention. The upper and lower limits of these smaller ranges may independently be included in the smaller ranges and are also encompassed within the invention, subject to any specifically excluded limit in the stated range. Where the stated range includes one or both of the limits, ranges excluding either or both of those included limits are also included in the invention.

Certain ranges are presented herein with numerical values being preceded by the term "about" or " approximately”. These terms are used herein to provide literal support for the exact number that it proceeds, as well as a number that is near to or approximately the number that the term precedes. In determining whether a number is near to or approximately a specifically recited number, the near or approximating unrecited number may be a number which, in the context in which it is presented, provides the substantial equivalent of the specifically recited number.

Generally, a laser beam travels along an optical axis in a more or less linear manner — light can be assumed to travel in a straight line in the scale of the application — and because light is received at one point of an optical system and is emitted from another, possibly different point of optical system, the skilled person can derive the general path that laser beam traverses through the optical system. Therefore, some point A on this path can be said to be “in front of” some point B if light from the received laser beam travels along point A before traveling along point B. Similar statements may be made regarding elements of optical system 1 or parts of the aforementioned interference pattern: Their relative positions may be described using the intended direction with which the laser beam travels through the optical system.

In the present disclosure, a “central spot’ is an area containing laser light, the area being defined in a plane perpendicular to the optical axis of an optical system, and intersecting the optical axis at a particular point. The skilled person will understand that the central spot may be said to be at that point on the optical axis, even though when considering the central spot in three dimensions, not all points are. The central spot may be an approximately circular area, but may also have a different shape, like a square or an ellipse. In the present disclosure approximately circular central spots may be characterized by their radius. A “central spot of 50 micrometres” may refer to a central spot having an approximately circular shape with a radius of 50 micrometres.

There may be power “inside the central spot” when (part of a) laser beam travels through the central spot. This power may be expressed in either absolute or relative units, Alternatively, the application may state that power is ‘contained’ in, or ‘included’ in the central spot, or that power is ‘encircled’ by the central spot. The same concept is referred to each time. Altematively, the application may refer to an amount of power at a particular point on the optical axis. The skilled person will understand that this then refers to the power in a central spot and that this central spot is associated with a specific position on the optical axis.

Reference is now made to figures 1-6, wherein figure 1 is a side view in perspective, figures 2 and 5 are a longitudinal cross-sections and figures 3, 4, and 6 are magnifications of parts of an exemplifying embodiment of a laser marking system according to the invention. In this embodiment, optical system 1 comprises a first spherical lens 2, and — arranged at an inter-lens distance D1 from lens 2 - a second spherical lens 3. Both are arranged with their respective optical centres along a common optical axis A. Optical system 1 is arranged to receive a laser beam 4 from a (not-depicted) laser source. The laser beam 4 from the laser source extends parallel to the optical axis A and consequently may be stated to be received by the optical system 1 along the optical axis A. In the shown embodiment the laser light received from the laser source and impinging on the spherical surface of the first spherical lens 2 is a collimated laser beam. However, a perfectly collimated laser beam is not always necessary. It is also possible to use a diverging laser beam to illuminate the spherical lens. The effect of the first spherical lens 2 on the incoming collimated laser beam can be described as introducing spherical aberrations into the wave front of the laser beam or as different phase shifts which are introduced in different parts of (the light included in) the laser beam. The laser beam exiting the optical system 1 has been shaped by the optical system 1 in such a manner {to be described later) that at a certain distance from the optical system an interference pattern is created.

The created interference pattern is such that a central spot is formed along a considerable length of the optical axis A. Furthermore, when the power intensity is defined as the amount of power per unit of area of the laser light propagating through an imaginary plane perpendicular to the optical axis A and at an arbitrary position within a working range of positions, the optical system is configured to provide a power intensity (density) through a perpendicular plane at each position in the central focal zone that is more than a predefined minimum percentage of the total power intensity (i.e. the power intensity through the entire plane).

First spherical lens 2 is configured to introduce spherical aberrations into the laser beam.

The first spherical lens 2 is just one possible embodiment of the first optical element required to introduce these spherical aberrations. First spherical lens 2 can be made of any one of the numerous available materials. A material may be chosen depending on a refractive index {e.g. around 2, or less than 2) and/or transmission range corresponding to a wavelength of the laser beam. Some materials that may be suitable are Amtir- 1 Ge33 Asl2 Se55 Glass, Barium Fluoride (BaF2), Potassium

Bromide (KBr), Caesium Iodide (CsI), Potassium Chloride (KCl), Cadmium Telluride (CdTe),

Silicon (Si), High Resistivity Silicon (Si), Calcium Fluoride (CaF2), Gallium Arsenide (GaAs),

Sodium Chloride (NaCl), Sodium Chloride (NaCl), Germanium (Ge), Thallium Bromoiodide KRS- 5 (TIBr-T), Zinc Selenide Laser Grade (ZnSe CVD), Zinc Sulfide Cleartran (ZnS), infrared plastic.

Other suitable materials may also be used.

In further embodiments, the first optical element may be implemented by any other specific implementation well known to the skilled person. The first optical element may for example be embodied by a spherical mirror. Such a mirror may comprise a substrate of fused silica, N-BK7, copper, or any other suitable material. The substrate may be coated with any one or more of the following coatings: an E-coating from Thorlabs (E01, E02, E03, E04), Dielectric, UV-Enhanced

Aluminium, Protected aluminium, Ultrafast-enhanced silver, Protected silver (P01), Protected silver (P02), (Protected) gold, MIR Enhanced gold, Unprotected gold. Single-Crystal GaAs/AlGaAs.

Second spherical lens 3 is also configured to introduce spherical aberrations into the laser beam. Second spherical lens 3 may further ensure that, when exiting optical system 1, the laser beam converges, resulting in the generation of an essentially non-diffractive beam. In the context of the application, a laser beam is considered non-diffractive if, as the laser beam propagates, it does not diffract and spread out. The skilled person will appreciate that no practical implementation can result in a laser beam that is perfectly non-diffractive and in the context of the application, it should further be understood that a laser beam is considered non-diffractive if, as the laser beam propagates, it diffracts and/or spreads out only minimally.

Second spherical lens 3 may be implemented using a condensing lens. In further embodiments, the second optical element may be implemented by a mirror, or prism provided with reflecting surfaces. The skilled person will appreciate that the aforementioned inter-lens distance D1 could then be referred to as just “distance D1’ or inter-element distance D1, or any other suitable name for the same concept that does not rely on the wording ‘lens’.

In figure 1, the requirement that the central spot has to contain at least a substantial percentage of the total power of the laser beam is fulfilled for a range of points on the optical axis also referred to as a working range 61. Working range starts from point Pl and ends at point P2. The length of the working range is also referred to as the focus depth. The set of central spots with radius 62 over working range 61 together define a working volume or central focal zone 60. For some embodiments, laser beam 4 may more specifically be said to be essentially non-diffractive over working range 61.

The applicant finds that power may be encircled by a central spot within the working range regardless of the exact shape and/or distribution. The illumination pattern seen within the central spot may comprise one central area, one central ring, one central area and one or more rings, or one or more rings in itself.

Additionally, an ideal spot P3 may be defined in working range 61 and/or between P1 and

P2. Spot P3 may be defined in a number of ways. It may for example be the point on the optical axis in which the central spot contains the largest percentage of power. Alternatively, it may be that point in which the substantial percentage of the total power is encircled by the smallest possible central spot.

An example of the interference pattern, or at least a cross-section thereof, is shown in figure 9. The cross-section shown is one in a plane spanned by the optical axis and a vector perpendicular to the optical axis. This cross-section of the interference patterns may also be referred to as a side- view.

Referring more specifically to figure 2, the area of first spherical lens 2 illuminated by laser beam 4, hereafter referred to as illumination area F1, as well as the distance between first spherical lens 2 and second spherical lens 3, hereafter referred to as inter-lens distance D1, are indicated. The illamination area and inter-lens distance (herein also referred to as the input factors Fl and D1) may be varied to appropriately configure the optical system 1 so as to shape the interference pattern such that the central spots over the entire working range (i.e. the laser beam in the central focus volume 60) contains at least a substantial percentage of the total power of the laser beam.

Nlumination area Fl may be described in a number of ways. In some embodiments, laser beam 4, before entering optical system 1, has an approximately circular cross-section in a plane perpendicular to the optical axis (herein also referred to as the perpendicular cross-section). The centre of this circular cross-section may approximately coincide with optical axis A. Alternative shapes that a perpendicular cross-section may have is square, triangular, or other regular two dimensional polygons.

When the perpendicular cross-section is circular, the skilled person can derive how the illumination area F1 may be described using the radius of said circular cross-section. The outer radius of Fl is illuminated by the most outer rays of laser beam 4 (also referred to as the marginal rays). By mentioning that the marginal rays arrive at first spherical lens 2 at that distance from optical axis A {assuming a relatively contiguous cross-section for laser beam 4) the skilled person will understand that light also arrives at first spherical lens 2 at distances from the optical axis smaller than that radius (i.e. rays closer to optical axis A than the marginal rays).

The applicant finds that even if laser beam 4 has a cross-section not completely contiguous, or not completely circular, that laser beam 4 may still be described based on the distance that the marginal rays have with respect to optical axis A when arriving at first spherical lens 2. In such embodiments, the term ‘radius’ therefore may refer to the distance the marginal rays have to optical axis A when arriving at first spherical lens 2.

The laser marking system may comprise means for controlling the illumination area FI.

Specifically, optical system | may comprise means for controlling the diameter of the input laser beam 4. Referring to figure 3, means for controlling the illumination area F1 are embodied as a beam expander, preferably an adaptable beam expander 5a. Figure 4 further shows laser beam 4 being received along optical axis A, travelling through expander 5a and onto first spherical lens 2. By changing the mutual distance between the two lenses of expander 54, the radius of laser beam 4 when exiting expander Sa may be changed without changing the total power of laser beam 4. In figure 4 the means for controlling the illumination area Fl is embodied as an aperture, preferably adaptable aperture 5b. Similar to figure 3, figure 4 shows laser beam 4 being received along optical axis A, partially traveling through aperture 5b, and onto first spherical lens 2. By changing the radius of the aperture, the radius of laser beam 4 when passing through aperture 5b may be changed without changing the local power density of those parts of spherical lens 2 still illuminated.

Inter-lens distance D1 may be defined in a number of ways. One way is elucidated in figure

Sa. Figure 5a shows first spherical lens 2 embodied by a positive lens of which the focal point fp positioned at a distance from first spherical lens 2 corresponding to the focal length Fy. Figure 5 further shows second spherical lens 3 of which the focal point is positioned at a distance from the second spherical lens 2 corresponding to the focal length F»

The inter-lens distance D1 may be measured from the optical centre of the first spherical tens, up to the optical centre of the second spherical lens. This allows for exchanging the lenses with other appropriate lenses, without having to compensate for the physical dimensions of the lens (such as the shape, and/or size) for so far as these do not change the aforementioned focal points.

To ensure convergence of laser beam 4 when exiting optical system 1, first spherical lens 2 and second spherical lens 3 may be spaced apart by an inter-lens distance D1 larger than focal length

Fi plus focal length Fo.

Alternatively spherical lens 2 may be embodied by a negative lens as shown in figure 5b.

The focal point of the negative spherical lens fis positioned at a distance from first spherical lens 2 corresponding to the focal length Fi. In this embodiment, convergence of laser beam 4 is ensured by positioning first spherical lens 2 and second spherical lens 3 spaced apart by an inter-lens distance

D1 larger than a difference between focal length Fy and focal length Fa.

The skilled person will be aware that first spherical lens2 does not literally focus laser beam 4 on a single point along the optical axis but that the spherical aberrations spread out these points.

One embodiment by which this may be well elucidated, is when first spherical lens is implemented as a ball lens 2a, as shown in figure 7. As is elucidated in figure 7, ball lens 2a does not focus all of laser beam 4 onto a single point. Instead, marginal rays 41 of laser beam 4 (being the rays of laser beam 4 which arrive at ball lens 2a the farthest from optical axis A from all rays of laser beam 4) are focussed on a closest focal point (22a). Paraxial rays 42 of laser beam 4 (being rays of laser beam 4 which arrive at ball lens 2a closest to, but not quite on, axis A) are focussed on a farthest focal point (22c). The point on the optical axis where laser beam 4 is the narrowest is referred to as the circle of least confusion 22b.

In the application, when the focal point of a spherical lens is discussed, this may refer to a closest focal point 22a. No (substantial amount of) rays of laser beam 4 cross axis A before the closest focal point.

Focal point of ball lens 2a or spherical lens 2 may also refer to the circle of least confusion 22b, or farthest focal point 22¢.

Furthermore, when the focal point of ball lens 2a or any other spherical lens is discussed, it may also be an approximation in which this lens just has one focal point. The applicant finds that the distance between closest and farthest focal point (also referred to as transversal aberrations) is rather small in comparison to D1. Additionally, the transversal aberrations are rather small in comparison to the variations possible in D1. Even for configurations in which the illumination area F1 is large, and/or when the radius of laser beam 4 when illuminating ball lens 2 is large, and/or, when the distance between marginal rays 41 and paraxial rays 42 is relatively large. Therefore the abovementioned approximation may be assumed valid for the present application.

Optical system 1 may achieve working ranges — i.e. focus depths — which are at least 10, preferably 100 times as long or longer than the transversal aberrations generated by first spherical lens 2. Additionally, optical system 1 may achieve distances between optical system 1 and the start of range 61 which are at least 10, preferably 100 times as long or longer than the distance between the optical centre of first spherical lens 2 and at least one of the focal point of first spherical lens 2, or at least any one of the closest focal point 22a, circle of least confusion 22b, or farthest focal point 22c of first spherical lens 2.

Referring to figures 7A& 7B, schematic representations of a laser marking system 50 according to an exemplifying embodiment is shown. Laser marking system 50 comprises a laser source 51, an optical system 1, and a deflector 52. Laser marking system 50 is configured for illuminating an illuminated area 53 on a surface of an object 6. The skilled person will appreciate that illuminating an object and marking an object are sufficiently related for them to be used synonymously. The difference being that to mark an object (i.e. to a apply an essentially permanent, visible mark on or in the object by locally heating or ablating the object's surface under the influence of the impinging laser beam), it has to be illuminated for a minimum amount of time, in which said amount of time depends on the power of the laser and/or the material of the object.

Figures 8A and 8B show perspective views of such laser marking systems. Specifically, in system 50° shown in figure 8A the first optical element is implemented as a first positive lens 27 and in system 30°" shown in figure 8B the first optical element is implemented as a concave mirror 2°”.

Laser source 51 is configured to emit a laser beam 4 along an optical axis A. Optical system 1 is arranged along axis A. A deflector 52 is also arranged along axis A, at a position beyond optical system 1, and is configured to deflect laser beam 4.

In this embodiment, optical system | comprises a first spherical lens 2 and a second spherical lens 3. Both are arranged along an optical axis A. Optical system 1 receives a laser beam 4 along axis A and creates an interference pattern in laser beam 4 such that, after leaving optical system 1, a central focus volame contains at least a substantial percentage of the total power of the laser beam over a working range 60.

To illuminate object 6, said object may be arranged on optical axis A, in the working range of laser marking system 60. Preferably, the surface of object 6 that is to be illuminated/marked may be substantially perpendicular to optical axis A. However, in other embodiments the surface to be marked extends at an angle relative to the direction of the optical axis.

The length of the working range 60 and/or central focus volume 61 — also referred to as the focus depth — determines the margin of error with which targets may be positioned. For example, object 6 may be arranged on optical axis A such that the surface to-be illuminated is positioned about halfway of the working range (as shown in figure 1). Or, such may be the intention. Due to reasons known to the skilled person, an object to be marked may accidently be arranged closer to the optical system or farther away. In this example, object 6 may be arranged up to half the length of working range 61 forward and/or backward, relative to the intended halfway position. Object 6 would then still be illuminated by the part of laser beam 4 forming working range 61. That is, laser beam 4 would still illuminate object 6 sufficiently to apply the marking to the object's surface. In other words, as long as the object is positioned within the working range of the laser marking system, the laser beam 4 will may still illaminate area 53 of object 6 in an accurate manner.

Additionally, the length of working range 60 defines the width of the area that may be accurately marked. In an example, laser beam 4 is said to be emitted through a centre if it arrives at object 6 at a ninety-degree angle (in which case laser beam 4 coincides with optical axis A up to object 6, as is the situation shown in figure 7A). Similarly, laser beam 4 is said to be emitted ‘off centre’ if it arrives at object 6 at an angle different from ninety degrees. When the deflection angle by which laser beam 4 is deflected off-centre (i.e. away from axis A, as is the situation shown in figure 7B) increases, so does the distance between deflector 52 and illuminated area 53. A sufficiently large deflection angle will result in the distance between deflector 52 — and optical system 1 — and the illaminated area 53 becoming larger than the distance between deflector 52 and the end of working range 60. Consequently, when laser beam 4 is deflected at this sufficiently large deflection angle, object 6 is illuminated by a part of laser beam 4 outside of working range 60 and thus illuminated inaccurately.

Based on the deflection angle only, laser beam 4 can be said to be able to illaminate object 6 accurately in area 55. The skilled person will appreciate that the semi-circular arc shape of full marking area 55 may be parametrized by an inner radius and an outer radius, and that the difference between these radii corresponds to the length of the working range 60. Marking area 55 is further parametrized by a maximum angle by which deflector 52 may deflect laser beam 4. Alternatively, it may be said that providing a laser beam 4 having a longer working range (i.e. longer focus depth 61) will also provide for a larger marking area 55.

This semi-circular arc shape does not correspond to the shape of surfaces commonly illuminated such as a flat surface. Consequently, for illuminating/marking a tlat surface, not all parts of the full marking area 55 can be effectively used. That is, in a more practical sense, it may be said that working range 60 may be used over effective projection area 56, being a sub area of full projection area 55. As shown in figure 7B the effective projection area 56 may be a rectangle.

Similarly to marking area 55, the longer focus depth will provide a taller and wider effective projection area.

In this example, deflector 52 deflects laser beam 4 in just one direction, but additional deflectors may be present allowing for deflecting laser beam 4 in two dimensions. In this case, working range 60 may be used to mark a surface of object 6 over a projection volume instead.

Deflector 52 may be embodied by one or more rotatable mirrors, and/or by one or more prisms.

For this projection volume, and an effective projection volume therein, similar results can be achieved as explained for the marking areas 55, 56. In the art this effective projection volume is also called a scan-field. Systems known in the art include scanning lenses or f-theta lenses in an effort to increase the size of the scan-field however such elements are not necessary when using a laser marking system according to the invention.

Having a working range that is positioned farther from laser marking system 50, or at least farther from deflector 52, means that a surface may be marked faster. That is, for a given change in deflection angle, illuminated area 53 moves a larger distance over the surface of object 6 when object 6 is arranged farther from deflector 52. Since deflectors are commonly limited in their change in deflection angle over time (for example expressed in degree per second) the speed with which the position of illuminated area 53 may change on the surface of object 6 (for example expressed in metre per second) is larger if object 6 is arranged farther from deflector 52.

Some embodiments of laser marking system 1 may be employed to mark a surface of an object while this object is moving. Objects may for example be arranged on a conveyor. Being able to move laser beam 4 faster, as explained in the above, also allows for marking an object that is passing faster. Additionally, a wider effective marking area and/or effective volume allows for a longer time window to mark an object that is passing the laser marking system at a given speed.

Referring to figure 9, a cross-section of an interference pattern generated by optical system 1 is shown. Specifically, a side view of the interference pattern is shown. That is, the cross-section is one in a plane spanned by the optical axis A and a vector perpendicular to the optical axis A. The cross-section may be a view from the side, but really a view from any angle directly perpendicular to optical axis A. As can be seen, in this interference pattern a small and narrow waist is formed.

Referring to figures 10a-d, other cross-sections of the interference pattern are shown, approximately corresponding to planes perpendicular to and intersecting axis A as indicated in figure 9. That is, the indices a-d shown in figure 9 corresponds to correspondingly enumerated sub-figures

10a-d. As can be seen, in this interference pattern a well defined, central spot with small radius is formed.

As may be derived from the figures 9 and 10a-d, the converging laser beam results in an interference pattern that is different from a Bessel beam. Bessel beams known from the art contain a lot of rings and do not have a lot of power in the central spot. Such Bessel beams are created with an axicon lens that has steep sides. The interference pattern that is created moves with the same angle as the angle of those sides. The spherical lens causes aberrations where the angle of the light is different with respect to the distance the rays have from the optical axis.

Earlier discussed central focus volume 60 may be determined using at least the following three properties:

First, there is radius 62 of the central spot — i.e. the distance from the optical axis up to which power in the interference pattern is taken into account. This radius may for example be 50 micrometres, 100 micrometres, or 200 micrometres.

Secondly, there is an encircled power threshold — i.e. the amount of power that is considered ‘substantial’ and/or that has to be included in the central spot for the corresponding point on the optical axis to be considered part of working range 61. This threshold may be expressed in absolute units (e.g. Watt) or as percentage of the total power of the laser beam. This threshold may for example be 50%, 60%, 75% or 90%.

Thirdly, there is the length of the working range. This is also referred to as the focus depth — i.e. the distance between Pi and P2. Conceptually, PI can also be described as the first point on the optical axis where the power encircled by the central spot is larger than the encircled power threshold and P2 can also be described as the last point on the optical axis where the power encircled by the central spot is larger than the encircled power threshold. This focus depth may for example be 5 centimetres, 10 centimetres, or 25 centimetres.

The skilled person will appreciate that the abovementioned properties by which the working range can be defined are interrelated and that when two of them are chosen, the third property inherently follows from the others.

Hereafter follows an example of how an embodiment, for example one comprising the elements of optical system 1 shown in figure 1, functions.

In an exemplary embodiment, first spherical lens 2 is a positive lens and has a focal length of 35 millimetre and the second spherical lens 3 is also a positive lens and has a focal length of 20 millimetre.

First, a particular radius 62 of the central spot may be chosen. Based thereon, an amount of encircled power along the optical axis can be determined. This is shown in figure 11. Specifically, figure 11 shows, for radii of 50, 100 and 200 micrometre, what percentage of power is encircled by an approximately circular central spot having this radius, on various points on the optical axis. The distance on the x-axis refers to the distance this point has, along the optical axis, from an exit surface of the second spherical lens.

In figure 11, only the radius of the central spot is varied. For each radius, illumination area

F1 has a radius of 1.5 millimetre, and inter-lens distance D1 equals 58.5 millimetre.

From figure 11 it can be seen that considering a larger radius for the central spot results in said central spot to encompass a larger percentage of the total power of the laser beam at its highest and also encompass larger percentages of the total power of the laser beam over a longer distance along the optical axis A.

The skilled person will appreciate that this parameter is not one by which optical system 1 itself is configured but just one by which the result achieved thereby is evaluated. Other starting points are possible, but in practise the radius of the central spot is often a requirement (i.e. it has to be at most some value) and a quite stringent one at that. Therefore it cannot always be changed.

What can be used to change the (percentage) of power encircled by the central spot changes over the length of axis A are the earlier indicated parameters illumination area Fl and inter-lens distance D1.

How changing the illumination area Fl affects the encircled power is shown in figure 12 .

Specifically, figure 12 shows, for illuminating first spherical lens 2 with laser beams having approximately circular perpendicular cross-sections having radit of 1.5 millimetre, 2 millimetre or 2.5 millimetre, what percentage of power is encircled along optical axis A.

In figure 12, only the illumination area F1 is varied. For each graph, the radius of the central spot is 100 micrometre and inter-lens distance D1 equals 58.5 millimetre.

From figure 12 it can be seen that considering a smaller illumination area results in said central spot to encompass a larger percentage of the total power of the laser beam at its highest and also encompass larger percentages of the total power of the laser beam over a longer range along optical axis A.

How changing the inter-lens distance D1 affects the encircled power is shown in figures 13 and 14. Specifically, figure 13 shows, for distances D1 of 58 millimetres, 58.5 millimetres, or 59 millimetres, what percentage of power is encircled along optical axis A. Specifically, figure 14 shows the same three peaks as figure 14 (one for each inter-element distance D1) but now these peaks have been mutually displaced such that their maximum values are arranged at the same place on the X- axis.

In figures 13 and 14, only inter-lens distance D1 is varied. For each graph, the radius of the central spot is 100 micrometre and the illumination area F1 has a radius of 1.5 millimetre.

From figure 13 it can be seen that decreasing inter-lens distance D1 results in the central spot to encompass any relevant percentage of the total power of the laser beam much farther from the optical system. Meanwhile, from figure 14 it can be seen that decreasing inter-lens distance D1 results in said central spot to encompass a slightly smaller percentage of the total power of the laser beam at its highest and encompass larger percentages of the total power of the laser beam over a tonger range along optical axis A. The peak spreads-out, so to say.

Secondly, a particular enclosed power threshold may be chosen, and the determined amount ofencircled power may be compared with this threshold. A working range of a particular length will be the result.

This is shown in figure 15. Specifically, figure 15 shows what percentage of power is encircled along optical axis A in an interference pattern formed by an optical system according to the invention; as well as power encircled along the optical axis in a laser beam provided by a laser marking system comprising an optical system according to the state of the art. Such an optical system may further comprise a lens arranged to focus a laser, which is also known as a Gaussian focus.

In figure 15, for the optical system according to the invention, the radius of the central spot is 100 micrometres, the inter-lens distance D1 equals 58 millimetres, and the illumination area Fl has a radius of 2 millimetres.

In figure 15, encircled power threshold 63 may be chosen first. The points at which threshold 63 intersects the graph representing the encircled power of the optical system according to the invention are, by definition, points Pl and P2. The distance between P1 and P2 is equal to the focus depth and P1 and P2 define the working range 61 as discussed before. Using a similar approach, a second focus depth 64 of the ‘Gaussian’ focus may be determined.

Alternatively, a desired focus depth may be chosen and P1 and P2 may be defined as those two points which are the desired distance apart and which have equal encircled powers.

From figure 15 it can be seen that the exemplary embodiment of optical system 1 achieves a slight lower maximum percentage of power encircled along the optical axis and maintains this percentage over a range much longer — i.e. has a focus depth longer — than traditional systems.

In brief, these procedures can be used to directly and positively verify whether in the interference pattern generated using optical system 1 the central focus volume indeed contains at least half of the total power of the laser beam over a working range.

It is to be understood that this disclosure is not limited to particular aspects or examples described, and, as such, may vary. It is also to be understood that the terminology used herein is for the purpose of describing particular aspects only, and is not intended to be limiting, since the scope of the present disclosure will be limited only by the appended claims.

Claims

CONCLUSIONS

I. A laser marking system for marking an object, comprising: a laser source configured to generate a laser beam; an optical system comprising a first optical element configured to receive the laser beam, the laser source and the optical system configured to cause the laser beam to illuminate a predetermined area of illumination of the first optical element, the first optical element configured to introduce spherical aberrations into the received laser beam, resulting in an intermediate beam produced by the first optical element: a second optical element positioned at a predetermined distance from the first optical element and configured to receive the intermediate beam, the second optical element being formed to introduce further spherical aberrations into the received intermediate beam, resulting. in generating a substantially non-diffractive beam, wherein the substantially non-diffractive beam converges along an optical axis of the non-diffractive beam to produce a central focus volume extending over a working range along the optical axis, wherein at any position along the optical axis, within the operating range, the central focus volume contains at least half of the total power of the non-diffractive beam; and a targeting system configured to apply a mark to a target surface of the object by positioning the target surface of the object within the central focus volume of the substantially non-diffractive beam.

The laser marking system of claim 1, wherein the optical system is configured to introduce spherical aberrations into the laser beam, causing the substantially non-diffractive beam to exhibit a concentric ring pattern in the central focus volume varying over the operating range along the optical axis.

3. The laser marking system of claim | or 2, wherein the central focus volume is at least partially coincident with the target surface and/or wherein at least one of the non-diffractive beam and the target surface moves during application of the marker to the target surface.

The laser marking system of claim 1, wherein the laser source defines a first optical axis and is further configured to emit the laser beam along the first optical axis, the optical system defining a second optical axis, and wherein the first and second optical axes may be aligned with each other.

The laser marking system according to any one of the preceding claims. wherein the central focus volume is determined by the interference pattern produced in the laser beam exiting the second lens and/or wherein the optical system 1s is configured to generate an interference pattern in the central focus volume such that the concentric laser beam maintains a substantially constant intensity while reproduces.

The laser marking system according to any one of the preceding claims, wherein the second optical element is a positive lens or a concave mirror.

The laser marking system according to claim 6, wherein the first optical element is a positive lens or a concave mirror, and wherein the distance between the first optical element and the second optical element is preferably greater than the sum of the focal length of the first optical element. element and the focus length of the second optical element.

The laser marking system according to claim 6, wherein the first optical element is a negative lens or a convex mirror, and wherein the distance between the first optical element and the second optical element is preferably smaller than the difference between the focal length of the first optical element and the focus length of the second optical element.

The laser marking system according to any one of the preceding claims, wherein the distance is defined as a distance between an optical center of the first optical element and an optical center of the second optical element.

The laser marking system according to any one of the preceding claims, further comprising at least one actuator for controlling the distance, preferably by moving at least one of the first optic and the second optic.

The laser marking system of claim 10, wherein the laser beam exits the optical system through an output surface of the second optical element; and wherein the at least one actuator is configured to move the first optic along the optical axis.

The laser marking system according to any one of the preceding claims, further comprising a control unit configured to control the exposure area, the control unit preferably located in front of the first optical element.

The laser marking system of claim 12, wherein the control unit includes a configurable aperture.

The laser marking system of claim 12 or 13, wherein the controller includes a configurable beam expander.

The laser marking system of any preceding claim, wherein the laser source is configured to generate a collimated laser beam.

The laser marking system according to any one of the preceding claims, wherein, for any position on the optical axis beyond the optical system, a projection of the concentric laser beam onto a plane perpendicular to the optical axis exhibits a central spot, the central spot preferably being approximately is circular.

The laser marking system of claim 16, wherein a center of the central spot approximately coincides with the optical axis.

The laser marking system according to claim 16 or 17, wherein a radius Rs of the central spot is 1 millimeter or less, preferably 200 micrometers or less, more preferably 100 micrometers or less, even more preferably 50 micrometers or less.

The laser marking system of claim 16, 17 or 18, wherein the percentage of the total power of the laser beam in the center spot is equal to the power of the laser beam in the region of the center spot divided by the total power of the laser beam that passes through the plane where the central spot is defined.

The laser marking system according to any one of the preceding claims, wherein the substantial percentage of the total power of the laser beam is 60%, preferably 75%, and more preferably 90%.

The laser marking system according to any one of the preceding claims, wherein in front of and/or behind the working range a central spot of the concentric laser beam contains less than a substantial percentage of the total power of the laser beam.

The laser marking system according to any one of the preceding claims, wherein the length of the working range, along the optical axis, is 1 centimeter or more, preferably 5 centimeters or more, more preferably 10 centimeters or more.

The laser marking system according to any one of the preceding claims, wherein the distance from the optical system to a start of the working range, along the optical axis, is 15 centimeters or more, preferably 25 centimeters or more, more preferably 50 centimeters or more.

The laser marking system of any one of the preceding claims, wherein the aiming system is disposed, on the optical axis, between the optical system and the central focus volume.

The laser marking system of claim 24, further configured to mark a surface of an object disposed on the optical axis. farther from the optical system than a start point of the working range, but closer to the optical system than an end point of the working range.