NL2025231A - Controlling conversion efficiency in an extreme ultraviolet light source - Google Patents

Controlling conversion efficiency in an extreme ultraviolet light source Download PDF

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Publication number
NL2025231A
NL2025231A NL2025231A NL2025231A NL2025231A NL 2025231 A NL2025231 A NL 2025231A NL 2025231 A NL2025231 A NL 2025231A NL 2025231 A NL2025231 A NL 2025231A NL 2025231 A NL2025231 A NL 2025231A
Authority
NL
Netherlands
Prior art keywords
target
initial
light
light source
shape
Prior art date
Application number
NL2025231A
Other languages
English (en)
Dutch (nl)
Inventor
Wang Haining
Wilhelmus Driessen Theodorus
Anthony Schafgans Alexander
Jay Rafac Robert
John William Brown Daniel
Uwe Herbert Trees Dietmar
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2025231A publication Critical patent/NL2025231A/en

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05GX-RAY TECHNIQUE
    • H05G2/00Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001X-ray radiation generated from plasma
    • H05G2/008X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05GX-RAY TECHNIQUE
    • H05G2/00Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001X-ray radiation generated from plasma
    • H05G2/003X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/006X-ray radiation generated from plasma being produced from a liquid or gas details of the ejection system, e.g. constructional details of the nozzle

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
NL2025231A 2019-04-01 2020-03-30 Controlling conversion efficiency in an extreme ultraviolet light source NL2025231A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201962827521P 2019-04-01 2019-04-01

Publications (1)

Publication Number Publication Date
NL2025231A true NL2025231A (en) 2020-10-06

Family

ID=70483168

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2025231A NL2025231A (en) 2019-04-01 2020-03-30 Controlling conversion efficiency in an extreme ultraviolet light source

Country Status (6)

Country Link
EP (1) EP3949692A1 (zh)
KR (1) KR20210141483A (zh)
CN (1) CN113661789A (zh)
NL (1) NL2025231A (zh)
TW (1) TW202106116A (zh)
WO (1) WO2020205883A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114355735A (zh) * 2022-01-20 2022-04-15 广东省智能机器人研究院 极紫外光产生方法和系统

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8530871B2 (en) * 2007-07-13 2013-09-10 Cymer, Llc Laser produced plasma EUV light source
US9713240B2 (en) * 2015-08-12 2017-07-18 Asml Netherlands B.V. Stabilizing EUV light power in an extreme ultraviolet light source
JP6715332B2 (ja) * 2016-09-02 2020-07-01 ギガフォトン株式会社 ターゲット生成装置及び極端紫外光生成装置

Also Published As

Publication number Publication date
TW202106116A (zh) 2021-02-01
WO2020205883A1 (en) 2020-10-08
EP3949692A1 (en) 2022-02-09
CN113661789A (zh) 2021-11-16
KR20210141483A (ko) 2021-11-23

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