NL2025117A - Micromanipulator devices and metrology system - Google Patents

Micromanipulator devices and metrology system Download PDF

Info

Publication number
NL2025117A
NL2025117A NL2025117A NL2025117A NL2025117A NL 2025117 A NL2025117 A NL 2025117A NL 2025117 A NL2025117 A NL 2025117A NL 2025117 A NL2025117 A NL 2025117A NL 2025117 A NL2025117 A NL 2025117A
Authority
NL
Netherlands
Prior art keywords
radiation
substrate
metrology
stage
mask
Prior art date
Application number
NL2025117A
Other languages
English (en)
Dutch (nl)
Inventor
Sohrabibabaheidary Damoon
Uitterdijk Tammo
John Mason Christopher
Michael Levy Keane
Ali Akbas Mehmet
David Dawson Benjamin
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of NL2025117A publication Critical patent/NL2025117A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
    • G01Q30/02—Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL2025117A 2019-03-18 2020-03-13 Micromanipulator devices and metrology system NL2025117A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201962819873P 2019-03-18 2019-03-18
US201962954785P 2019-12-30 2019-12-30

Publications (1)

Publication Number Publication Date
NL2025117A true NL2025117A (en) 2020-09-22

Family

ID=69846428

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2025117A NL2025117A (en) 2019-03-18 2020-03-13 Micromanipulator devices and metrology system

Country Status (3)

Country Link
CN (1) CN113614642A (fr)
NL (1) NL2025117A (fr)
WO (1) WO2020187713A1 (fr)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873419B2 (en) * 2001-11-16 2005-03-29 National Research Council Of Canada Method and apparatus for three-dimensional compositional mapping of heterogeneous materials
US7151244B2 (en) * 2004-09-02 2006-12-19 Matsushita Electric Industrial Co., Ltd Method and apparatus for calibration of near-field scanning optical microscope tips for laser machining
US7511799B2 (en) 2006-01-27 2009-03-31 Asml Netherlands B.V. Lithographic projection apparatus and a device manufacturing method
JP2009003322A (ja) * 2007-06-25 2009-01-08 Sii Nanotechnology Inc フォトマスク欠陥修正装置及びフォトマスク欠陥修正方法
US20090004403A1 (en) * 2007-06-29 2009-01-01 Yonggang Li Method of Providing Patterned Embedded Conducive Layer Using Laser Aided Etching of Dielectric Build-Up Layer
US10384238B2 (en) * 2007-09-17 2019-08-20 Rave Llc Debris removal in high aspect structures
US8017905B2 (en) * 2008-08-29 2011-09-13 Wavelight Ag Method for energy calibration of a pulsed laser system
NL2004153A (en) * 2009-02-24 2010-08-25 Asml Netherlands Bv Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system.
WO2013109986A1 (fr) * 2012-01-19 2013-07-25 Jaiswal Supriya Matériaux, composants et procédés à utiliser avec un rayonnement ultraviolet extrême en lithographie et dans d'autres applications
WO2017001135A1 (fr) * 2015-07-02 2017-01-05 Asml Netherlands B.V. Support de substrat, appareil lithographique et procédé de fabrication de dispositifs
DE102017205629A1 (de) * 2017-04-03 2018-10-04 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Reparieren von Defekten einer photolithographischen Maske für den EUV-Bereich

Also Published As

Publication number Publication date
CN113614642A (zh) 2021-11-05
WO2020187713A1 (fr) 2020-09-24

Similar Documents

Publication Publication Date Title
US8120001B2 (en) Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
JP2010145993A (ja) Ｅｕｖマスク検査システム
JP6074058B2 (ja) リソグラフィ装置およびその装置で使用するためのテーブル
US20120026480A1 (en) Image-Compensating Addressable Electrostatic Chuck System
JP3583774B2 (ja) リソグラフィ装置およびデバイス製造方法
WO2023030832A1 (fr) Système métrologique, appareil lithographique et procédé
NL2020990A (en) Clearing out method, revealing device, lithographic apparatus, and device manufacturing method
NL2021333A (en) Particle suppression systems and methods
WO2020187713A1 (fr) Dispositifs micromanipulateurs et système de métrologie
US9116086B2 (en) Deposition method and apparatus
US11887881B2 (en) Lithographic apparatus, substrate table, and non-uniform coating method
US11960216B2 (en) Invariable magnification multilevel optical device with telecentric converter
US20240134289A1 (en) Operating a metrology system, lithographic apparatus, and methods thereof
NL2007367A (en) Lithographic apparatus and method.
US20230031443A1 (en) Wafer clamp hard burl production and refurbishment
WO2022268559A1 (fr) Appareil lithographique, table de substrat, et procédé de fabrication
TWI740117B (zh) 檢測系統、微影設備及檢測方法
KR20230142507A (ko) 증강 현실(ar) 보조 입자 오염 검출
WO2023285139A1 (fr) Système de lithographie, compensateur d'affaissement de substrat et procédé
WO2022243005A1 (fr) Table de tranche modulaire et ses procédés de fabrication
WO2015074816A1 (fr) Appareil, appareil lithographique et procédé de fabrication d'un dispositif
TW202142972A (zh) 用於極紫外光源之校準系統
JP2024506526A (ja) 汚染物質検出のシステム及び方法
WO2020239373A1 (fr) Appareil lithographique, table pour substrat et procédé
WO2020182488A1 (fr) Appareil lithographique, appareil de métrologie, système optique et procédé